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    POLYMER ETCHANT AND METHOD OF USING SAME
    13.
    发明申请
    POLYMER ETCHANT AND METHOD OF USING SAME 审中-公开
    聚合物蚀刻剂及其使用方法

    公开(公告)号：WO2007064593A1

    公开(公告)日：2007-06-07

    申请号：PCT/US2006/045425

    申请日：2006-11-27

    Applicant: 3M INNOVATIVE PROPERTIES COMPANY

    Inventor： MAO, Guoping ,  YANG, Rui ,  YANG, Lizhang

    IPC: C09K13/02

    CPC classification number: H05K3/002 ,  C08J7/12 ,  C08J2367/02 ,  C08J2369/00 ,  H05K1/0393 ,  H05K2201/09036 ,  H05K2201/09063 ,  Y02P20/582

    Abstract: Provided is a composition comprising: an aqueous solution for etching a polymeric material comprising from about 30wt.% to about 55wt.% of an alkali metal salt; from about 10wt.% to about 35wt.% of a solubilizer dissolved in said solution; and from about 3wt.% to about 30wt.% ethylene glycol dissolved in said solution. Also provided is a process comprising: providing a polymeric film; contacting said polymeric film with an aqueous solution comprising from about 30wt.% to about 55wt.% of an alkali metal salt; from about 10wt.% to about 35wt.% of a solubilizer dissolved in said solution; and from about 3wt.% to about 30wt.% ethylene glycol dissolved in said solution.

    Abstract translation: 提供了一种组合物，其包含：用于蚀刻包含约30重量％至约55重量％碱金属盐的聚合物材料的水溶液; 约10重量％至约35重量％的溶解在所述溶液中的增溶剂; 和约3重量％至约30重量％的乙二醇溶解在所述溶液中。 还提供了一种方法，其包括：提供聚合物膜; 使所述聚合物膜与包含约30重量％至约55重量％碱金属盐的水溶液接触; 约10重量％至约35重量％的溶解在所述溶液中的增溶剂; 和约3重量％至约30重量％的乙二醇溶解在所述溶液中。

    LIQUID CRYSTAL POLYMERS FOR FLEXIBLE CIRCUITS
    15.
    发明申请
    LIQUID CRYSTAL POLYMERS FOR FLEXIBLE CIRCUITS 审中-公开
    用于柔性电路的液晶聚合物

    公开(公告)号：WO2003022021A1

    公开(公告)日：2003-03-13

    申请号：PCT/US2002/026030

    申请日：2002-08-15

    Applicant: 3M INNOVATIVE PROPERTIES COMPANY

    Inventor： YANG, Rui ,  MAO, Guoping

    IPC: H05K3/00

    CPC classification number: C09K13/02 ,  C08J7/12 ,  H05K3/002 ,  H05K3/381 ,  H05K2201/0141 ,  H05K2201/0397 ,  H05K2203/0786

    Abstract: A process for providing a metal-seeded liquid crystal polymer comprises the steps of providing a liquid crystal polymer substrate, applying an aqueous solution comprising an alkali metal hydroxide and a solubilizer, to etch the liquid crystal polymer substrate, and depositing an adherent metal layer on the etched liquid crystal polymer substrate using electroless metal plating or vacuum deposition of metal. When using electroless metal plating, a tin(II) solution applied to the liquid crystal polymer substrate, followed by application of a palladium(II) solution, provides a metal-seeded liquid crystal polymer. An aqueous solution, comprising from 35wt.% to 55wt.% of an alkali metal salt, and from 10wt.% to 35wt.% of a solubilizer, provides an etchant for the liquid crystal polymer at temperatures from 50°C to 120°C. A flexible circuit comprising a liquid crystal polymer film having through-holes and related shaped voids may be formed using the etchant compositions previously described.

    Abstract translation: 提供金属种子液晶聚合物的方法包括以下步骤：提供液晶聚合物基材，施加包含碱金属氢氧化物和增溶剂的水溶液以蚀刻液晶聚合物基材，并将粘附金属层沉积在 使用化学镀金属或真空沉积金属的蚀刻液晶聚合物基材。 当使用化学镀金属时，施加到液晶聚合物基底上的锡（II）溶液，然后施加钯（II）溶液，提供金属种子液晶聚合物。 包含35重量％至55重量％的碱金属盐和10重量％至35重量％的增溶剂的水溶液在50℃至120℃的温度下提供液晶聚合物的蚀刻剂 包括具有通孔的液晶聚合物膜和相关形状的空隙的柔性电路可以使用之前描述的蚀刻剂组合物形成。

    METHODS OF FORMING MOLDS AND METHODS OF FORMING ARTICLES USING SAID MOLDS
    20.
    发明公开
    METHODS OF FORMING MOLDS AND METHODS OF FORMING ARTICLES USING SAID MOLDS 有权
    使用所述模具形成模具的方法和形成物品的方法

    公开(公告)号：EP2197646A1

    公开(公告)日：2010-06-23

    申请号：EP08829215.6

    申请日：2008-09-05

    Applicant: 3M Innovative Properties Company

    Inventor： MAO, Guoping ,  DAVID, Moses M. ,  BENSON, Olester, Jr. ,  DEVOE, Robert, J. ,  SAHLIN, Jennifer, J.

    IPC: B29C33/64 ,  B29C33/38

    CPC classification number: C23C16/401 ,  B29C33/3857 ,  B29C33/405 ,  B29C33/58 ,  B29K2083/005 ,  B29K2105/0082 ,  G02B1/118

    Abstract: A method of forming a working mold including: placing a substrate (610) on an electrode in a chamber, the substrate having at least a first structured surface (620) and the substrate including a thermoset polymeric material; introducing a release (630) layer forming gas into the chamber, wherein the release layer forming gas includes silicon containing gas and oxygen gas in an atomic ratio of not greater than about 200; providing power to the electrode to create a plasma of the release layer forming gas within the chamber; and depositing a release layer formed from the release layer forming gas on at least the first structured surface of the substrate to form a working mold.

    Abstract translation: 一种形成工作模具的方法，所述工作模具包括将衬底放置在腔室中的电极附近，所述衬底（610）具有至少第一结构化表面（620）; 向电极提供能量以产生等离子体， - 将液体有机硅分子的蒸气引入等离子体中; 以及沉积剥离层630，所述剥离层630包括含有机硅的聚合物，所述剥离层630沉积在所述基底的所述第一结构化表面的至少一部分上以形成所述工作模具。

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