公开(公告)号：US09859360B2

公开(公告)日：2018-01-02

申请号：US15184261

申请日：2016-06-16

Applicant: ABB Schweiz AG

Inventor： Marina Antoniou ,  Florin Udrea ,  Iulian Nistor ,  Munaf Rahimo ,  Chiara Corvasce

IPC: H01L29/66 ,  H01L29/06 ,  H01L29/40 ,  H01L29/739 ,  H01L29/78

CPC classification number: H01L29/0619 ,  H01L29/0623 ,  H01L29/0661 ,  H01L29/0696 ,  H01L29/404 ,  H01L29/66333 ,  H01L29/66348 ,  H01L29/66712 ,  H01L29/66734 ,  H01L29/7395 ,  H01L29/7397 ,  H01L29/7811 ,  H01L29/7813

Abstract: A termination region of an IGBT is described, in which surface p-rings are combined with oxide/polysilicon-filled trenches, buried p-rings and surface field plates, so as to obtain an improved distribution of potential field lines in the termination region. The combination of surface ring termination and deep ring termination offers a significant reduction in the amount silicon area which is required for the termination region.