公开(公告)号：DE2349948A1

公开(公告)日：1974-05-02

申请号：DE2349948

申请日：1973-10-04

Applicant: AGENCY IND SCIENCE TECHN

Inventor： ICHIMURA KUNIHIRO ,  OCHI HIDEO

IPC: C08F8/46 ,  C08G73/12 ,  G03F7/038 ,  C08F27/00 ,  G03C1/72

公开(公告)号：DE3610958A1

公开(公告)日：1986-11-06

申请号：DE3610958

申请日：1986-04-02

Applicant: AGENCY IND SCIENCE TECHN ,  OJI PAPER CO

Inventor： ICHIMURA KUNIHIRO ,  ITO MASATAKA ,  YAMANA MASAHIRO ,  ITO HIROSHI

IPC: C08F2/48 ,  C08F8/44 ,  G03F7/038 ,  G03F7/12 ,  H01J9/227 ,  G03F7/10 ,  G03C1/72

公开(公告)号：DE68917880T2

公开(公告)日：1995-01-05

申请号：DE68917880

申请日：1989-12-08

Applicant: AGENCY IND SCIENCE TECHN ,  TOYO GOSEI KOGYO KK

Inventor： ICHIMURA KUNIHIRO ,  TOCHIZAWA NORIAKI PHOTOSENSITI ,  KIKUCHI HIDEO PHOTOSENSITIVE M

IPC: G03F7/027 ,  C08F8/30 ,  C08F8/44 ,  C08F16/38 ,  G03F7/038

Abstract: A photosensitive poly(vinyl alcohol) derivative comprising units of the formula wherein R1 is alkylene, R2 is hydrogen or a lower alkoxy, is a quaternary aromatic nitrogen-containing heterocycle, X is SO3 or CO2 , m is 0 or 1, and n is an integer of 1 to 6 capable of being developed with an aqueous developing solution.

公开(公告)号：DE68917880D1

公开(公告)日：1994-10-06

申请号：DE68917880

申请日：1989-12-08

Applicant: AGENCY IND SCIENCE TECHN ,  TOYO GOSEI KOGYO KK

Inventor： ICHIMURA KUNIHIRO ,  TOCHIZAWA NORIAKI PHOTOSENSITI ,  KIKUCHI HIDEO PHOTOSENSITIVE M

IPC: G03F7/027 ,  C08F8/30 ,  C08F8/44 ,  C08F16/38 ,  G03F7/038

Abstract: A photosensitive poly(vinyl alcohol) derivative comprising units of the formula wherein R1 is alkylene, R2 is hydrogen or a lower alkoxy, is a quaternary aromatic nitrogen-containing heterocycle, X is SO3 or CO2 , m is 0 or 1, and n is an integer of 1 to 6 capable of being developed with an aqueous developing solution.

公开(公告)号：DE3689940D1

公开(公告)日：1994-08-04

申请号：DE3689940

申请日：1986-04-14

Applicant: AGENCY IND SCIENCE TECHN ,  SONY CORP ,  AJINOMOTO KK

Inventor： IGUCHI MASATOSHI ,  MITSUHASHI SHIGENOBU ,  ICHIMURA KUNIHIRO ,  NISHI YOSHIO ,  URYU MASARU ,  YAMANAKA SHIGERU ,  WATANABE KUNIHIKO

IPC: C08L1/00 ,  C08L1/02 ,  C12P19/04 ,  D01F2/00 ,  D21H13/02 ,  G10D13/02 ,  G10K13/00 ,  H04R31/00 ,  D21H11/00

Abstract: Cellulose which is produced by bacteria and which comprises ribbon-like microfibrils is used as a component of moulded materials having high dynamic strength as compared to conventional moulded materials.

公开(公告)号：DE3114468A1

公开(公告)日：1982-03-04

申请号：DE3114468

申请日：1981-04-09

Applicant: AGENCY IND SCIENCE TECHN ,  SONY CORP ,  OJI PAPER CO

Inventor： ICHIMURA KUNIHIRO ,  TAKEUCHI OSAMU ,  KUSAMA HIDEO ,  YAMAZAKI KAZUO ,  SAKA AKIRA ,  ITO HIROSHI ,  TOYOFUKU KUNITAKA

IPC: C08F8/00 ,  C08F8/30 ,  C08F8/44 ,  G03F7/038 ,  C08F8/28 ,  G03C1/68 ,  G03F7/26 ,  H01J9/227

公开(公告)号：JPH11160708A

公开(公告)日：1999-06-18

申请号：JP25983898

申请日：1998-09-14

Applicant: AGENCY IND SCIENCE TECHN ,  ICHIMURA KUNIHIRO

Inventor： ICHIMURA KUNIHIRO

IPC: G02F1/1337

Abstract: PROBLEM TO BE SOLVED: To improve stability and to increase the area with a uniform film thickness by a simple method by subjecting a resin film including dichromatic photoreactive constitution units to irradiation with light of linearly polarized light or the irradiation with non-polarized light from a diagonal direction and a heat treatment. SOLUTION: The alignment film is formed by subjecting the resin film including the dichromatic photoreactive constitution units, more preferably the latently liquid crystalline or crystalline resin film to the irradiation with the light of the linearly polarized light or the irradiation with the non-polarized light from the diagonal direction and the heat treatment. The dichromatic photoreactive constitution units included in the resin film are particularly preferably the liquid crystalline or crystalline units substituted with the azobenzene expressed by the formula. In the formula, X is a bivalent residue bonded to a high polymer main chain; Y denotes a hydrogen atom, up to 8C alkyl group, cycloalkyl group, cyano group, nitro group, up to 6C alkoxy group, up to 6C alkoxycarbonyl group, halogen group, trifluoromethyl group or trifluoromethoxy group.

公开(公告)号：JPH0667429A

公开(公告)日：1994-03-11

申请号：JP28083891

申请日：1991-09-30

Applicant: AGENCY IND SCIENCE TECHN ,  GOO KAGAKU KOGYO KK

Inventor： ICHIMURA KUNIHIRO ,  MORIGAKI TOSHIO ,  NAKANISHI NOBUO

IPC: G03F7/004 ,  G03F7/021 ,  G03F7/027 ,  G03F7/028 ,  G03F7/032 ,  G03F7/038 ,  G03F7/04 ,  G03F7/12

Abstract: PURPOSE:To obtain a screen printing plate having good printing property, solvent resistnace, water resistance, and printing durability, to prevent contamination of the printing plate due to blot of the ink or oozing into the back of the plate, to enable printing of super fine lines and good printing on a rough surface, and to improve the life of the printing plate. CONSTITUTION:The photosensitive resin compsn. for a screen printing plate consists of at least (A) fine powder of polymers consisting of fluorine-contg. alkylene groups or polymers containing fluorine-contg. alkyl groups in side chains, or at least one of these polymers dispersed in water and/or solvent, and (B) polyvinylalcohol and/or water-dispersible polymer. This compsn. is applied on a plastic film and dried to obtain a photosensitive film. The screen printing plate is made by using this film.

公开(公告)号：JPH04284421A

公开(公告)日：1992-10-09

申请号：JP7206591

申请日：1991-03-13

Applicant: AGENCY IND SCIENCE TECHN

Inventor： KAWANISHI YUJI ,  TAMAOKI TAKASHI ,  SEKI TAKAHIRO ,  ICHIMURA KUNIHIRO

IPC: G02F1/13 ,  G02F1/1337 ,  G03C1/685 ,  G03C1/725 ,  G03C1/73 ,  G03C5/56

Abstract: PURPOSE:To allow the inpartation of prescribed homogeneous orientation to a liquid crystal layer by diagonally irradiating this layer with reaction light and to allow the application of the fresh homogeneous orientation thereto by reirradiating the layer with the reaction light entering in different optical paths. CONSTITUTION:The liquid crystal material formed by successively laminating a photochromic compd. layer and a liquid crystal layer on a transparent substrate is irradiated diagonally with the reaction light from the transparent substrate side, by which the homogeneous orientation in a prescribed direction is obtd.

公开(公告)号：JPH03278082A

公开(公告)日：1991-12-09

申请号：JP7849090

申请日：1990-03-27

Applicant: AGENCY IND SCIENCE TECHN ,  TOYO INK MFG CO

Inventor： ICHIMURA KUNIHIRO ,  YAMAOKA TSUGIO ,  KOSEKI KENICHI ,  IKUI SHUICHI ,  YASUIKE MADOKA ,  TOBA YASUMASA

IPC: G03F7/031 ,  G03H1/02

Abstract: PURPOSE:To provide the photosensitive material which has excellent chemical stability, high resolution, high diffraction efficiency, etc., and has an excellent photosensitive characteristic to long-wavelength laser beams by combining poly-N-vinyl carbazole, a compd. having polymerizable ethylenic unsatd. bonds and a specific photopolymn. initiator. CONSTITUTION:The photopolymn. initiator, consisting of the combination of the tetrabenzoporphyrins expressed by formula I or metal complex thereof and an electron-accepting radical generator, the poly-N-vinyl carbazole as a supporting material having a refractive index as high as 1.68 and the compd. having at least >=1 pieces of the polymerizable ethylenic unsatd. bonds are combined. In the formula I, R denotes a hydrogen atom, alkyl group or a residual arom. group which may have a substituent; the respective benzene rings may have an alkyl group or alkoxy group as a substituent. The photosensitive material for hologram recording which has the excellent chemical stability, the high resolution and the high diffraction efficiency based on high-refractive index modulation and has the excellent photosensitive material to the long- wavelength laser beams of >=600nm is obtd. in this way.