公开(公告)号：US20190113853A1

公开(公告)日：2019-04-18

申请号：US16092021

申请日：2017-03-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Johannes ONVLEE ,  Antonius Franciscus Johannes DE GROOT ,  Wim SYMENS ,  David Ferdinand VLES

IPC: G03F7/20

Abstract: A substrate support for supporting a substrate. The substrate support comprises a main body, a clamping device and a dither device. The main body comprises a support surface for supporting the substrate. The clamping device is arranged to provide the clamping force to clamp the substrate on the support surface. The dither device is configured to dither the clamping force. The dither device may be configured to dither the clamping force while the substrate W is being loaded onto the support surface.

公开(公告)号：US20150370177A1

公开(公告)日：2015-12-24

申请号：US14839663

申请日：2015-08-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Erwin John VAN ZWET ,  Pieter Willem Herman DE JAGER ,  Johannes ONVLEE ,  Erik Christiaan FRITZ

IPC: G03F7/20

CPC classification number: G03F7/70366 ,  G03F7/70275 ,  G03F7/70391 ,  G03F7/704 ,  G03F7/70491 ,  G03F7/70883

Abstract: A lithographic apparatus having an optical column capable of creating a pattern on a target portion of a substrate is disclosed. The optical column may have a self-emissive contrast device configured to emit a beam, and a projection system configured to project the beam onto the target portion. The apparatus may also have an actuator to move the optical column or a part thereof with respect to the substrate. The apparatus may be constructed to reduce the optical effect of density variation in a medium around the moving part of the optical column on the beam.

Abstract translation: 公开了一种具有能够在基板的目标部分上形成图案的光学柱的光刻设备。 光学柱可以具有被配置为发射光束的自发射对比度装置，以及被配置为将光束投射到目标部分上的投影系统。 该装置还可以具有致动器以相对于基板移动光学柱或其一部分。 该装置可以被构造成减小在光束上的光学柱的移动部分周围的介质中的密度变化的光学效应。

公开(公告)号：US20190219936A1

公开(公告)日：2019-07-18

申请号：US16307512

申请日：2017-06-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Franciscus Godefridus Casper BIJNEN ,  Augustinus Hubert Maria BOSHOUWERS ,  Johannes ONVLEE

IPC: G03F9/00 ,  H01L21/68

CPC classification number: G03F9/7046 ,  G03F9/7049 ,  G03F9/7084 ,  G03F9/7088 ,  H01L21/681 ,  H01L21/682

Abstract: A target structure such as an alignment mark on a semiconductor substrate becomes obscured by an opaque layer so that it cannot be located by an alignment sensor. A position for the mark is determined using an edge position sensor and relative position information that defines the position of the mark relative to one or more edge portions of the substrate is stored prior to formation of the opaque layer. A window can be opened in the opaque layer, based on the determined position. After revealing the target structure, the alignment sensor can, if desired, measure more accurately the position of the target structure, for use in controlling a further lithographic step. The edge position sensor may be a camera having an angle-selective behavior. The edge position sensor may be integrated within the alignment sensor hardware.

公开(公告)号：US20180095369A1

公开(公告)日：2018-04-05

申请号：US15565082

申请日：2016-03-24

Applicant: ASML Netherlands B.V.

Inventor： Kevin VAN DE RUIT ,  Bart Dinand PAARHUIS ,  Jean-Philippe Xavier VAN DAMME ,  Johannes ONVLEE ,  Cornelis Melchior BROUWER ,  Pieter Jacob KRAMER

IPC: G03F7/20 ,  G03F1/62

CPC classification number: G03F7/70983 ,  G01B2210/56 ,  G03F1/62 ,  G03F7/2002 ,  G03F7/70258 ,  G03F7/7085

Abstract: A lithographic apparatus including a support to support a patterning device, a substrate table to hold a substrate, and a projection system to project a radiation beam patterned by the patterning device onto a target portion of the substrate. A transparent layer is provided to protect the pattering device. The apparatus further includes a transparent layer deformation-determining device to determine a deformation profile of the transparent layer, the deformation profile of the transparent layer expressing a deformation of the transparent layer during a scanning movement of the lithographic apparatus, and a compensator device which is configured to control the projection system, the substrate table and/or the support in response to the deformation profile of the transparent layer to compensate for the deformation of the transparent layer during the scanning movement of the apparatus.