公开(公告)号：EP3688529A1

公开(公告)日：2020-08-05

申请号：EP18759092.2

申请日：2018-08-22

Applicant: ASML Netherlands B.V.

Inventor： TEL, Wim Tjibbo ,  MASLOW, Mark John ,  VAN INGEN SCHENAU, Koenraad ,  WARNAAR, Patrick ,  SLACHTER, Abraham ,  ANUNCIADO, Roy ,  VAN GORP, Simon Hendrik Celine ,  STAALS, Frank ,  JOCHEMSEN, Marinus

IPC: G03F7/20

公开(公告)号：EP3650941A1

公开(公告)日：2020-05-13

申请号：EP18205693.7

申请日：2018-11-12

Applicant: ASML Netherlands B.V.

Inventor： ANUNCIADO, Roy

IPC: G03F7/20

Abstract: Disclosed is a method for determining a contribution of a processing apparatus to a fingerprint of a parameter across a first substrate, the method comprising: obtaining a delta image which relates to the difference between a first pupil image associated with inspection of a first feature on the substrate and a second pupil image associated with inspection of a second feature on the substrate, wherein the first and second features have different dose sensitivities; determining a rate of change of the difference in response to a variation of a dose used to form said first and second features; and determining the contribution using the determined rate of change and the delta image.