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11.发明申请公开(公告)号：US20150168852A1
公开(公告)日：2015-06-18
申请号：US14407038
申请日：2013-06-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Ruud Antonius Catharina Maria Beerens , Andre Bernardus Jeunink , Marinus Maria Johannes Van De Wal , Wilhelmus Henricus Theodorus Maria Aangenent , Richard Henricus Adrianus Van Lieshout , Henricus Martinus Johannes Van De Groes , Saartje Willemijn Van Der Hoeven
IPC: G03F7/20
CPC classification number: G03F7/70775 , G03F7/70783
Abstract: There is provided a positioning system for positioning an object in a lithographic apparatus. The positioning system includes a support, a position measurement device, a deformation sensor and a processor. The support is constructed to hold the object. The position measurement device is configured to measure a position of the support. The position measurement device includes at least one position sensor target and a plurality of position sensors to cooperate with the at least one position sensor target to provide a redundant set of position signals representing the position of the support. The deformation sensor is arranged to provide a deformation signal representing a deformation of one of the support and the position measurement device. The processor is configured to calibrate one of the position measurement device and the deformation sensor based on the deformation signal and the redundant set of position signals.
Abstract translation: 提供了一种用于在光刻设备中定位物体的定位系统。 定位系统包括支撑件，位置测量装置，变形传感器和处理器。 构造支撑件来保持对象。 位置测量装置被配置为测量支撑件的位置。 所述位置测量装置包括至少一个位置传感器目标和多个位置传感器，以与所述至少一个位置传感器目标配合，以提供代表所述支撑件的位置的冗余的一组位置信号。 变形传感器被布置成提供表示支撑件和位置测量装置之一的变形的变形信号。 处理器被配置为基于变形信号和冗余的位置信号集来校准位置测量装置和变形传感器之一。
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12.发明授权公开(公告)号：US11664264B2
公开(公告)日：2023-05-30
申请号：US16075754
申请日：2016-12-22
Applicant: ASML NETHERLANDS B.V.
Inventor： Andre Bernardus Jeunink , Robby Franciscus Josephus Martens , Youssef Karel Maria De Vos , Ringo Petrus Cornelis Van Dorst , Gerhard Albert Ten Brinke , Dirk Jerome Andre Senden , Coen Hubertus Matheus Baltis , Justin Johannes Hermanus Gerritzen , Jelmer Mattheüs Kamminga , Evelyn Wallis Pacitti , Thomas Poiesz , Arie Cornelis Scheiberlich , Bert Dirk Scholten , André Schreuder , Abraham Alexander Soethoudt , Siegfried Alexander Tromp , Yuri Johannes Gabriël Van De Vijver
IPC: H01L21/683 , H01L21/687 , G03F7/20 , B25B11/00
CPC classification number: H01L21/6838 , B25B11/005 , G03F7/707 , G03F7/70733 , H01L21/68742
Abstract: A method for unloading a substrate from a support table configured to support the substrate, the method including: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.
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公开(公告)号：US10571814B2
公开(公告)日：2020-02-25
申请号：US16318191
申请日：2017-06-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Andre Bernardus Jeunink , Laurentius Johannes Adrianus Van Bokhoven , Stan Henricus Van Der Meulen , Yang-Shan Huang , Federico La Torre , Bearrach Moest , Stefan Carolus Jacobus Antonius Keij , Enno Van Den Brink , Christine Henriette Schouten , Hoite Pieter Theodoor Tolsma
Abstract: A lithographic apparatus has a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.
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公开(公告)号：US20160195823A1
公开(公告)日：2016-07-07
申请号：US15046284
申请日：2016-02-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Yvonne Wendela KRUIJT-STEGEMAN , Andre Bernardus Jeunink , Arie Jeffrey Den Boef , Vadim Yevgenyevich Banine , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Johan Frederik Dijksman , Carolus Johannes Catharina Schoormans , Adrianus Hendrik Koevoets , Catharinus De Schiffart , Sander Frederik Wuister
Abstract: An imprint lithography apparatus is disclosed that includes an imprint template holder arranged to hold an imprint template, and a plurality of position sensors configured to measure change of the size and/or shape of the imprint template, wherein the position sensors are mechanically isolated from the imprint template. Also disclosed is a lithography method that includes using an imprint template to imprint a pattern onto a substrate, and measuring changes of the size and/or shape of the imprint template while imprinting the pattern onto the substrate.
Abstract translation: 公开了一种压印光刻设备，其包括布置成保持压印模板的压印模板保持器和被配置为测量压印模板的尺寸和/或形状的变化的多个位置传感器，其中位置传感器与 印记模板 还公开了一种光刻方法，其包括使用压印模板将图案印刷到基板上，以及在将图案压印到基板上的同时测量压印模板的尺寸和/或形状的变化。
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公开(公告)号：US10908510B2
公开(公告)日：2021-02-02
申请号：US16550451
申请日：2019-08-26
Applicant: ASML NETHERLANDS B.V.
Inventor： Catharinus De Schiffart , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Andre Bernardus Jeunink , Gregor Edward Van Baars , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Norbert Erwin Therenzo Jansen , Toon Hardeman , George Arie Jan De Fockert , Johan Frederik Dijksman
Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.
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Patent Agency Ranking
公开(公告)号：US09377697B2
公开(公告)日：2016-06-28
申请号：US14648620
申请日：2013-12-20
Applicant: ASML Netherlands B.V.
Inventor： Mark Johannes Hermanus Frencken , Andre Bernardus Jeunink , Frederikus Johannes Maria De Vreede , Gijs Kramer
CPC classification number: G03F7/70341 , G03F7/70733
Abstract: An immersion lithographic apparatus includes a projection system, a first table with a first planar surface and a second table with a second planar surface, the first and second planar surfaces being substantially coplanar, a liquid confinement system configured to spatially confine an immersion liquid to a volume with a first surface area that is coplanar with the first and second planar surfaces, and is substantially smaller than a second surface area of the top surface of the substrate, and a swap bridge member attached to the first table, the swap bridge member having an upper surface that is substantially coplanar with the first and second planar surfaces, wherein the upper surface of the swap bridge member is configured to serve as part of the liquid confinement system and to deform when the swap bridge member collides with the second table and to remain attached to the first table.
Abstract translation: 浸没式光刻设备包括投影系统，具有第一平面表面的第一工作台和具有第二平面表面的第二工作台，第一和第二平面表面基本上共面;液体限制系统构造成将浸没液体空间地限制在 体积，其具有与第一和第二平坦表面共面的第一表面区域，并且基本上小于衬底的顶表面的第二表面区域，以及附接到第一工作台的交换桥接构件，交换桥接构件具有 与第一和第二平面基本上共面的上表面，其中交换桥接件的上表面构造成用作液体限制系统的一部分，并且当交换桥件与第二工作台碰撞时变形， 留在第一张桌子上。
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公开(公告)号：US12147162B2
公开(公告)日：2024-11-19
申请号：US18124350
申请日：2023-03-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Catharinus De Schiffart , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Andre Bernardus Jeunink , Gregor Edward Van Baars , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Norbert Erwin Therenzo Jansen , Toon Hardeman , George Arie Jan De Fockert , Johan Frederik Dijksman
Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.
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公开(公告)号：US10890851B2
公开(公告)日：2021-01-12
申请号：US15828523
申请日：2017-12-01
Applicant: ASML NETHERLANDS B.V.
Inventor： Catharinus De Schiffart , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Andre Bernardus Jeunink , Gregor Edward Van Baars , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Norbert Erwin Therenzo Jansen , Toon Hardeman , George Arie Jan De Fockert , Johan Frederik Dijksman
Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.
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公开(公告)号：US10768535B2
公开(公告)日：2020-09-08
申请号：US16722397
申请日：2019-12-20
Applicant: ASML NETHERLANDS B.V.
Inventor： Andre Bernardus Jeunink , Robbert De Jong , Martinus Hendrikus Antonius Leenders , Evelyn Wallis Pacitti , Thomas Poiesz , Frank Pieter Albert Van Den Berkmortel
Abstract: A support apparatus configured to support an object, the support apparatus includes a support body including an object holder to hold an object; an opening in the support body adjacent to an edge of the object holder; a channel in fluid communication with the opening via each of a plurality of passageways in the support body; and a passageway liner mounted in at least one of the plurality of passageways, the passageway liner being thermally insulating to substantially thermally decouple the support body from fluid in the at least one of the plurality of passageways.
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公开(公告)号：US10712678B2
公开(公告)日：2020-07-14
申请号：US15046284
申请日：2016-02-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Yvonne Wendela Kruijt-Stegeman , Andre Bernardus Jeunink , Arie Jeffrey Den Boef , Vadim Yevgenyevich Banine , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Johan Frederik Dijksman , Carolus Johannes Catharina Schoormans , Adrianus Hendrik Koevoets , Catharinus De Schiffart , Sander Frederik Wuister
IPC: B29C43/58 , G03F9/00 , B82Y10/00 , B82Y40/00 , G03F7/00 , G03F7/20 , B29C43/02 , B29C59/02 , B29C59/16
Abstract: An imprint lithography apparatus is disclosed that includes an imprint template holder arranged to hold an imprint template, and a plurality of position sensors configured to measure change of the size and/or shape of the imprint template, wherein the position sensors are mechanically isolated from the imprint template. Also disclosed is a lithography method that includes using an imprint template to imprint a pattern onto a substrate, and measuring changes of the size and/or shape of the imprint template while imprinting the pattern onto the substrate.
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