公开(公告)号：US12158704B2

公开(公告)日：2024-12-03

申请号：US17533947

申请日：2021-11-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Abraham Alexander Soethoudt ,  Thomas Poiesz

IPC: G03F7/00 ,  H01L21/683

Abstract: A method including: generating a first force to attract a substrate holder to a support surface, the holder including a body having opposing first and second body surfaces, first burls at the first body surface, wherein each first burl has a distal end to support a substrate, and second burls at the second body surface to support the substrate holder on the support surface through contact with distal ends of the second burls; generating a second force to attract the substrate to the substrate holder; and controlling the first force and/or second force in a release step to deform the body between the second burls such as to create a gap between the distal ends of a first subset of the plurality of first burls and the substrate and such that the substrate is supported on distal ends of a second subset of the plurality of first burls.

公开(公告)号：US10514615B2

公开(公告)日：2019-12-24

申请号：US15580806

申请日：2016-06-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Andre Bernardus Jeunink ,  Robbert De Jong ,  Martinus Hendrikus Antonius Leenders ,  Evelyn Wallis Pacitti ,  Thomas Poiesz ,  Frank Pieter Albert Van Den Berkmortel

IPC: G03B27/58 ,  G03F7/20

Abstract: A support apparatus configured to support an object, the support apparatus includes a support body including an object holder to hold an object; an opening in the support body adjacent to an edge of the object holder; a channel in fluid communication with the opening via each of a plurality of passageways in the support body; and a passageway liner mounted in at least one of the plurality of passageways, the passageway liner being thermally insulating to substantially thermally decouple the support body from fluid in the at least one of the plurality of passageways.

公开(公告)号：US11269259B2

公开(公告)日：2022-03-08

申请号：US16952371

申请日：2020-11-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Thomas Poiesz ,  Bert Dirk Scholten ,  Dirk Willem Harberts ,  Lucas Henricus Johannes Stevens ,  Laura Maria Fernandez Diaz ,  Johannes Adrianus Cornelis Maria Pijnenburg ,  Abraham Alexander Soethoudt ,  Wilhelmus Jacobus Johannes Welters ,  Jimmy Matheus Wilhelmus Van De Winkel

IPC: G03F7/20

Abstract: A substrate table for an immersion system having a projection system arranged to project an image onto a substrate and a liquid confinement system configured to confine an immersion liquid to a space between the projection system and the substrate, the substrate table including: a substrate holder configured to hold a substrate; and a current control device arranged to reduce an electric current flowing between the substrate and the substrate holder while the immersion liquid is confined to the space.

公开(公告)号：US10453734B2

公开(公告)日：2019-10-22

申请号：US15580601

申请日：2016-06-01

Applicant: ASML Netherlands B.V.

Inventor： Thomas Poiesz ,  Martijn Houben ,  Abraham Alexander Soethoudt

IPC: G03B27/52 ,  H01L21/687 ,  G03F7/20 ,  B23H7/26 ,  H01L21/027 ,  H01L21/683

Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including: a main body having a main body surface; and a plurality of burls projecting from the main body surface; wherein each burl has a distal end configured to engage with the substrate; the distal ends of the burls substantially conform to a support plane whereby a substrate can be supported in a substantially flat state on the burls; a frictional force between the distal end of each burl and a substrate engaged therewith arises in a direction parallel to the support plane in the event of a relative movement of the substrate and substrate holder in the direction; and distal end surfaces of the burls are provided with a release structure configured so that the frictional force is less than would arise in the absence of the release structure.

公开(公告)号：US10310393B2

公开(公告)日：2019-06-04

申请号：US15737399

申请日：2016-04-28

Applicant: ASML Netherlands B.V.

Inventor： Thomas Poiesz

IPC: G03F7/20

Abstract: The present invention relates to a substrate support (1), comprising: a support body (2) forming a support surface configured to support a substrate, wherein said support surface comprises a support surface part configured to support a substrate area of the substrate, at least one actuator (6) arranged on the support body at a location aligned with the support surface part and configured to contract or extend in a direction substantially parallel to a main plane of the support surface.

公开(公告)号：US20240385536A1

公开(公告)日：2024-11-21

申请号：US18696657

申请日：2022-10-14

Applicant: ASML Netherlands B.V.

Inventor： Thomas Poiesz ,  René Adrianus Van Rooij ,  Alexander Stein

IPC: G03F7/00 ,  G03F7/16 ,  H01L21/683

Abstract: The disclosure provides a clamp comprising a dielectric member; a conductive element disposed on the dielectric member and comprised of a first conductive material; and a number of burls arranged on the conductive element for supporting the object, each burl comprising a second conductive material, wherein the clamp comprises a stack of alternating layers of etch resistant material and a third conductive material arranged between the conductive element and the number of burls.

公开(公告)号：US10719019B2

公开(公告)日：2020-07-21

申请号：US16315125

申请日：2017-07-06

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Thomas Poiesz ,  Satish Achanta ,  Mehmet Ali Akbas ,  Pavlo Antonov ,  Jeroen Bouwknegt ,  Joost Wilhelmus Maria Frenken ,  Evelyn Wallis Pacitti ,  Nicolaas Ten Kate ,  Bruce Tirri ,  Jan Verhoeven

IPC: G03F7/20 ,  H01L21/687

Abstract: There is disclosed a substrate holder, a method of manufacturing a substrate holder, a lithographic apparatus comprising the substrate holder, and a method of manufacturing devices using the lithographic apparatus. In one arrangement, there is provided a substrate holder for use in a lithographic apparatus. The substrate holder supports a substrate. The substrate holder comprises a main body. The main body has a main body surface. A plurality of burls are provided projecting from the main body surface. Each burl has a burl side surface and a distal end surface. The distal end surface of each burl engages with the substrate. The distal end surfaces of the burls substantially conform to a support plane and support the substrate. A layer of carbon based material is provided in a plurality of separated regions of carbon based material. The layer of carbon based material provides a surface with a lower coefficient of friction than a part of the main body surface outside the plurality of separated regions of carbon based material. The layer of carbon based material covers only part of the distal end surface of at least one of the burls. Alternatively, the layer of carbon based material covers the distal end surface and at least a portion of the burl side surface of at least one of the burls.

公开(公告)号：US10353303B2

公开(公告)日：2019-07-16

申请号：US15569135

申请日：2016-05-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Abraham Alexander Soethoudt ,  Thomas Poiesz

IPC: G03B27/58 ,  G03F7/20 ,  B01D53/34 ,  B01D53/56 ,  B01D53/79 ,  B05B13/02 ,  B05B13/04 ,  F23J15/00 ,  B05B15/656 ,  B05B15/68 ,  B05B13/06

Abstract: A lithographic apparatus includes a support table and a gas extraction system. The gas extraction system is configured to extract gas from a gap between a base surface of the support table and a substrate through at least one gas extraction opening when the substrate is being lowered onto the support table. The lithographic apparatus is configured such that gas is extracted from the gap at a first loading flow rate when the distance between the substrate and the support plane is greater than a threshold distance and gas is extracted from the gap at a second loading flow rate when the distance between the substrate and the support plane is less than the threshold distance, wherein the second loading flow rate is lower than the first loading flow rate.

公开(公告)号：US09798253B2

公开(公告)日：2017-10-24

申请号：US15306676

申请日：2015-03-25

Applicant: ASML Netherlands B.V.

Inventor： Daan Daniel Johannes Antonius Van Sommeren ,  Thomas Poiesz

IPC: G03F7/20 ,  H01L21/67 ,  H01L21/687

CPC classification number: G03F7/70875 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70866 ,  H01L21/67028 ,  H01L21/67051 ,  H01L21/6875

Abstract: A support table having: a base surface configured to be substantially parallel to a lower surface of a substrate, a plurality of burls each having a respective distal end and a first height above the base surface, the burls arranged to support the substrate by the respective distal ends, and a plurality of elongate raised protrusions protruding above the base surface, each elongate raised protrusion having a second height above the base surface that is less than the first height. The base surface has a plurality of regions within each of which some of the elongate raised protrusions are located. All of the elongate raised protrusions located within each region have substantially the same direction of elongation such that they are substantially parallel to each other so as to form between the elongate raised protrusions at least one gas flow path substantially parallel to the elongate raised protrusions.

公开(公告)号：US11187998B2

公开(公告)日：2021-11-30

申请号：US16761608

申请日：2018-10-24

Applicant: ASML NETHERLANDS B.V.

Inventor： Abraham Alexander Soethoudt ,  Thomas Poiesz

IPC: G03F7/20 ,  H01L21/683

Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member; and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.