公开(公告)号：US20180299770A1

公开(公告)日：2018-10-18

申请号：US15769337

申请日：2016-09-27

Applicant: ASML NETHERLANDS B.V.

Inventor： Peter TEN BERGE ,  Johannes Catharinus Hubertus MULKENS ,  Bernardo KASTRUP ,  Richard Johannes Franciscus VAN HAREN

IPC: G03F1/72 ,  G03F1/36 ,  G06F17/50

Abstract: A method including identifying that an area of a first substrate includes a hotspot based on a measurement and/or simulation result pertaining to a patterning device in a patterning system, determining first error information at the hotspot, and creating first modification information for modifying the patterning device (e.g., the information to be transmitted with the patterning device to a patterning modification tool) based on the first error information to obtain a modified patterning device.