公开(公告)号：US20170307986A1

公开(公告)日：2017-10-26

申请号：US15649161

申请日：2017-07-13

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Earl William EBERT ,  Johannes ONVLEE ,  Samir A. NAYFEH ,  Mark Josef SCHUSTER ,  Peter A. DELMASTRO ,  Christopher Charles WARD ,  Frank Johannes Jacobus VAN BOXTEL ,  Abdullah ALIKHAN ,  Daniel Nathan BURBANK ,  Daniel Nicholas GALBURT ,  Justin Matthew VERDIRAME

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70808 ,  G03F7/70858 ,  G03F7/70866

Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.

公开(公告)号：US20170219930A1

公开(公告)日：2017-08-03

申请号：US15502466

申请日：2015-06-25

Applicant: ASML Netherlands B.V.

Inventor： Günes NAKIBOGLU ,  Suzanne Johanna Antonetta Geertruda GOSIJNS ,  Anne Willemijn Bertine QUIST ,  Lukasz SOSNIAK ,  Frank Johannes Jacobus VAN BOXTEL ,  Engelbertus Antonius Fransiscu VAN DER PASCH

IPC: G03F7/20

CPC classification number: G03F7/7085 ,  G03F7/70775 ,  G03F7/709

Abstract: A lithographic apparatus includes an optical sensor, a movable body, a support, a deflector system, a first drive system and a second drive system. The movable body is moveable relative to the sensor. The support is for holding the sensor. The first drive system is arranged to move the movable body relative to the sensor. The second drive system is arranged to move the first drive system relative to the sensor. The second drive system is arranged to move the deflector system relative to the sensor. A disturbance is induced by a movement of the movable body. The deflector system is arranged to create a deflecting area for reflecting the disturbance away from the support.

公开(公告)号：US20170160653A1

公开(公告)日：2017-06-08

申请号：US15325987

申请日：2015-06-08

Applicant: ASML Netherlands B.V.

Inventor： Günes NAKIBOGLU ,  Frank Johannes Jacobus VAN BOXTEL ,  Thomas Petrus Hendricus WARMERDAM ,  Jan Steven Christiaan WESTERLAKEN ,  Johannes Pieter KROES

IPC: G03F7/20

CPC classification number: G03F7/70933 ,  G03F7/70716 ,  G03F7/70858 ,  G03F7/70866

Abstract: A lithographic apparatus including: a projection system with an optical axis; an enclosure with an ambient gas; and a physical component accommodated in the enclosure, wherein: the lithographic apparatus is configured to cause the physical component to undergo movement relative to the enclosure, in a predetermined direction and in a plane perpendicular to the optical axis; the lithographic apparatus is configured to let the physical component maintain a predetermined orientation with respect to the enclosure during the movement; the movement induces a flow of the ambient gas relative to the component; the physical component has a surface oriented perpendicularly to the optical axis; the component includes a flow direction system configured to direct the flow of ambient gas away from the surface.

公开(公告)号：US20160179015A1

公开(公告)日：2016-06-23

申请号：US15054010

申请日：2016-02-25

Applicant: ASML NETHERLANDS B.V.

Inventor： Theodorus Wilhelmus POLET ,  Henrikus Herman Marie COX ,  Ronald VAN DER HAM ,  Wilhelmus Franciscus Johannes SIMONS ,  Jimmy Matheus Wilhelmus VAN DE WINKEL ,  Gregory Martin Mason CORCORAN ,  Frank Johannes Jacobus VAN BOXTEL

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  G03F7/70758 ,  G03F7/70783

Abstract: A lithographic apparatus having: a substrate table constructed to hold a substrate; a projection system configured to project a patterned radiation beam onto a target portion of the substrate; a substrate surface actuator including a fluid opening for fluid flow therethrough from/onto a facing surface facing the substrate surface actuator to generate a force between the substrate surface actuator and the facing surface, the facing surface being a top surface of the substrate or a surface substantially co-planar with the substrate; and a position controller to control the position and/or orientation of a part of the facing surface by varying fluid flow through the fluid opening to displace the part of the facing surface relative to the projection system.

公开(公告)号：US20150241796A1

公开(公告)日：2015-08-27

申请号：US14699468

申请日：2015-04-29

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Earl William EBERT, JR. ,  Johannes ONVLEE ,  Samir A. NAYFEH ,  Mark Josef SCHUSTER ,  Peter A. DELMASTRO ,  Christopher Charles WARD ,  Frank Johannes Jacobus VAN BOXTEL ,  Abdullah ALIKHAN ,  Daniel Nathan BURBANK ,  Daniel Nicholas GALBURT ,  Justin Matthew VERDIRAME ,  Thomas VENTURINO

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70808 ,  G03F7/70858 ,  G03F7/70866

Abstract: A system for controlling temperature of a patterning device in a lithographic apparatus is discussed. The system includes a patterning device support configured to support a patterning device and a reticle cooling system configured to provide substantially uniform temperature distribution across the patterning device. The reticle cooling system includes a first and second array of gas inlets configured to provide a first and second gas flow along a first and second direction across a surface of the patterning device, respectively, where first and second directions are opposite to each other. The reticle cooling system further includes a switching control system configured to control operation of the first and second arrays of gas inlets.

Abstract translation: 讨论了用于控制光刻设备中的图案形成装置的温度的系统。 该系统包括构造成支撑图案形成装置的图案形成装置支撑件和被配置为在图案形成装置上提供基本均匀的温度分布的掩模版冷却系统。 标线冷却系统包括第一和第二气体入口阵列，其被配置为分别在第一和第二方向彼此相对的情况下分别跨越图案形成装置的表面沿着第一和第二方向提供第一和第二气流。 标线冷却系统还包括配置成控制气体入口的第一和第二阵列的操作的开关控制系统。