公开(公告)号：US20170160653A1

公开(公告)日：2017-06-08

申请号：US15325987

申请日：2015-06-08

Applicant: ASML Netherlands B.V.

Inventor： Günes NAKIBOGLU ,  Frank Johannes Jacobus VAN BOXTEL ,  Thomas Petrus Hendricus WARMERDAM ,  Jan Steven Christiaan WESTERLAKEN ,  Johannes Pieter KROES

IPC: G03F7/20

CPC classification number: G03F7/70933 ,  G03F7/70716 ,  G03F7/70858 ,  G03F7/70866

Abstract: A lithographic apparatus including: a projection system with an optical axis; an enclosure with an ambient gas; and a physical component accommodated in the enclosure, wherein: the lithographic apparatus is configured to cause the physical component to undergo movement relative to the enclosure, in a predetermined direction and in a plane perpendicular to the optical axis; the lithographic apparatus is configured to let the physical component maintain a predetermined orientation with respect to the enclosure during the movement; the movement induces a flow of the ambient gas relative to the component; the physical component has a surface oriented perpendicularly to the optical axis; the component includes a flow direction system configured to direct the flow of ambient gas away from the surface.