公开(公告)号：US10241422B2

公开(公告)日：2019-03-26

申请号：US15557864

申请日：2016-02-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Günes Nakiboglu

IPC: G03F7/20

Abstract: A lithography apparatus includes: a projection system configured to project a desired image onto a substrate; an active module that generates a time-varying heat load; a temperature conditioning system configured to maintain a component of the lithography apparatus at a predetermined target temperature; and a heat buffer including a phase change material in thermal contact with the active module, the phase change material having a phase change temperature such that the phase change material is caused to undergo a phase change by the time-varying heat load, and wherein the phase change material is stationary relative to the projection system during critical operations of the lithography apparatus.

公开(公告)号：US10133197B2

公开(公告)日：2018-11-20

申请号：US15325987

申请日：2015-06-08

Applicant: ASML Netherlands B.V.

Inventor： Günes Nakiboglu ,  Frank Johannes Jacobus Van Boxtel ,  Thomas Petrus Hendricus Warmerdam ,  Jan Steven Christiaan Westerlaken ,  Johannes Pieter Kroes

IPC: G03B27/42 ,  G03F7/20

Abstract: A lithographic apparatus including: a projection system with an optical axis; an enclosure with an ambient gas; and a physical component accommodated in the enclosure, wherein: the lithographic apparatus is configured to cause the physical component to undergo movement relative to the enclosure, in a predetermined direction and in a plane perpendicular to the optical axis; the lithographic apparatus is configured to let the physical component maintain a predetermined orientation with respect to the enclosure during the movement; the movement induces a flow of the ambient gas relative to the component; the physical component has a surface oriented perpendicularly to the optical axis; the component includes a flow direction system configured to direct the flow of ambient gas away from the surface.

公开(公告)号：US10114299B2

公开(公告)日：2018-10-30

申请号：US15311544

申请日：2015-05-07

Applicant: ASML Netherlands B.V.

Inventor： Günes Nakiboglu ,  Mark Constant Johannes Baggen ,  Gerard Johannes Boogaard ,  Nicolaas Rudolf Kemper ,  Sander Kerssemakers ,  Robertus Mathijs Gerardus Rijs ,  Frank Johannes Jacobus Van Boxtel ,  Erwin Antonius Henricus Franciscus Van Den Boogaert ,  Marc Wilhelmus Maria Van Der Wijst ,  Martinus Van Duijnhoven ,  Jessica Henrica Anna Verdonschot ,  Hendrikus Herman Marie Cox

IPC: G10K11/168 ,  G03F7/20 ,  G10K11/16

Abstract: A lithographic apparatus has a compartment which accommodates a movable object. Movements of the movable object cause acoustic disturbances in the compartment. An acoustic damper is arranged to damp the acoustic disturbances in the compartment and comprises a chamber (100) in communication with the compartment and a perforated plate (101), having a plurality of through-holes (102), between the chamber and the compartment.