公开(公告)号：US10114295B2

公开(公告)日：2018-10-30

申请号：US15520193

申请日：2015-10-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Günes Nakiboglu ,  Jan Steven Christiaan Westerlaken ,  Frank Johannes Jacobus Van Boxtel ,  Maria del Carmen Mercado ,  Thibault Simon Mathieu Laurent

IPC: G03F7/20 ,  G03F9/00

Abstract: A lithographic apparatus including: a projection system to project radiation onto a substrate supported on a substrate stage, during an exposure phase; a sensing system to sense a property of the substrate on the stage during a sensing phase; and a positioning system to determine a position of the stage relative to a reference system via a radiation path between the stage and the reference system, wherein the apparatus is configured to control stage movement relative to the reference system in the sensing phase and to control other movement relative to the reference system during the exposure phase; the stage or reference system having an outlet to provide a gas curtain to reduce ingress of ambient gas into the path; and the apparatus is operative such that a characteristic of the gas curtain is different in at least part of the sensing phase compared to in the exposure phase.

公开(公告)号：US10345717B2

公开(公告)日：2019-07-09

申请号：US15959115

申请日：2018-04-20

Applicant: ASML Netherlands B.V.

Inventor： Günes Nakiboglu ,  Suzanne Johanna Antonetta Geertruda Cosijns ,  Anne Willemijn Bertine Quist ,  Lukasz Sosniak ,  Frank Johannes Jacobus Van Boxtel ,  Engelbertus Antonius Fransiscus Van Der Pasch

IPC: G03F7/20

Abstract: A lithographic apparatus includes an optical sensor, a movable body, a support, a deflector system, a first drive system and a second drive system. The movable body is moveable relative to the sensor. The support is for holding the sensor. The first drive system is arranged to move the movable body relative to the sensor. The second drive system is arranged to move the first drive system relative to the sensor. The second drive system is arranged to move the deflector system relative to the sensor. A disturbance is induced by a movement of the movable body. The deflector system is arranged to create a deflecting area for reflecting the disturbance away from the support.

公开(公告)号：US10317804B2

公开(公告)日：2019-06-11

申请号：US15781813

申请日：2016-11-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Daan Daniel Johannes Antonius Van Sommeren ,  Coen Hubertus Matheus Baltis ,  Harold Sebastiaan Buddenberg ,  Giovanni Luca Gattobigio ,  Johannes Cornelis Paulus Melman ,  Günes Nakiboglu ,  Theodorus Wilhelmus Polet ,  Walter Theodorus Matheus Stals ,  Yuri Johannes Gabriël Van De Vijver ,  Josephus Peter Van Lieshout ,  Jorge Alberto Vieyra Salas ,  Aleksandar Nikolov Zdravkov

IPC: G03F7/20

Abstract: A substrate table configured to support a substrate for exposure in an immersion lithographic apparatus, the substrate table including: a support body having a support surface configured to support the substrate; and a cover ring fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface, wherein at least a portion of the upper surface is configured so as to alter the stability of a meniscus of immersion liquid when moving along the upper surface towards the substrate.

公开(公告)号：US09977348B2

公开(公告)日：2018-05-22

申请号：US15502466

申请日：2015-06-25

Applicant: ASML Netherlands B.V.

Inventor： Günes Nakiboglu ,  Suzanne Johanna Antonetta Geertruda Cosijns ,  Anne Willemijn Bertine Quist ,  Lukasz Sosniak ,  Frank Johannes Jacobus Van Boxtel ,  Engelbertus Antonius Fransiscus Van Der Pasch

IPC: G03F7/20

CPC classification number: G03F7/7085 ,  G03F7/70775 ,  G03F7/709

Abstract: A lithographic apparatus includes an optical sensor, a movable body, a support, a deflector system, a first drive system and a second drive system. The movable body is moveable relative to the sensor. The support is for holding the sensor. The first drive system is arranged to move the movable body relative to the sensor. The second drive system is arranged to move the first drive system relative to the sensor. The second drive system is arranged to move the deflector system relative to the sensor. A disturbance is induced by a movement of the movable body. The deflector system is arranged to create a deflecting area for reflecting the disturbance away from the support.

公开(公告)号：US11579533B2

公开(公告)日：2023-02-14

申请号：US17151291

申请日：2021-01-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Günes Nakiboglu ,  Coen Hubertus Matheus Baltis ,  Siegfried Alexander Tromp ,  Yuri Johannes Gabriël Van De Vijver ,  Bert Dirk Scholten ,  Daan Daniel Johannes Antonius Van Sommeren ,  Mark Johannes Hermanus Frencken

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/687

Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including a main body having a main body surface; a plurality of burls projecting from the main body surface to support the substrate spaced apart from the main body surface; and a liquid control structure provided in a peripheral region of the main body surface and configured to cause liquid to preferentially flow toward the periphery of the main body surface.

公开(公告)号：US10895808B2

公开(公告)日：2021-01-19

申请号：US15779804

申请日：2016-11-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Günes Nakiboglu ,  Coen Hubertus Matheus Baltis ,  Siegfried Alexander Tromp ,  Yuri Johannes Gabriël Van De Vijver ,  Bert Dirk Scholten ,  Daan Daniel Johannes Antonius Van Sommeren ,  Mark Johannes Hermanus Frencken

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/687

Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including a main body having a main body surface; a plurality of burls projecting from the main body surface to support the substrate spaced apart from the main body surface; and a liquid control structure provided in a peripheral region of the main body surface and configured to cause liquid to preferentially flow toward the periphery of the main body surface.

公开(公告)号：US10222713B2

公开(公告)日：2019-03-05

申请号：US16061043

申请日：2016-11-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Laurentius Johannes Adrianus Van Bokhoven ,  Ruud Hendrikus Martinus Johannes Bloks ,  Günes Nakiboglu ,  Marinus Jan Remie ,  Johan Gertrudis Cornelis Kunnen

IPC: G03F7/20

Abstract: An apparatus and method for controlling temperature of a patterning device in a lithographic apparatus, by flowing gas across the patterning device. A patterning apparatus includes: a patterning device support structure configured to support a patterning device; a patterning device conditioning system including a first gas outlet configured to provide a gas flow over a surface of the patterning device and a second gas outlet configured to provide a gas flow over a part of a surface of the patterning device support structure not supporting the patterning device; and a control system configured to separately control the temperature of the gas exiting the first and second gas outlets such that the gas exiting the second gas outlet is at a higher temperature than the gas exiting the first gas outlet and/or to separately control the temperature and gas flow rate of the gas exiting the first and second gas outlets.

公开(公告)号：US09939740B2

公开(公告)日：2018-04-10

申请号：US15116794

申请日：2015-01-20

Applicant: ASML Netherlands B.V.

Inventor： Günes Nakiboglu ,  Martijn Van Baren ,  Frank Johannes Jacobus Van Boxtel ,  Koen Cuypers ,  Jeroen Gerard Gosen ,  Laurentius Johannes Adrianus Van Bokhoven

IPC: B60R1/06 ,  G03B27/52 ,  G03B27/58 ,  G03B27/62 ,  H02K41/02 ,  G03F7/20

CPC classification number: G03F7/70858 ,  G03F7/70358 ,  G03F7/70716 ,  G03F7/70908

Abstract: A lithographic apparatus including a barrier system and a device manufacturing method using such a lithographic apparatus. The barrier system is used to maintain a protected volume of gas within a barrier. The protected volume may be maintained when different components of the lithographic apparatus move relative to each other. The barrier system may be used in different locations within the lithographic apparatus. The geometry of the barrier affects how efficiently the protected volume is maintained, especially at high speeds. The geometry reduces the amount of ambient gas entering the protected volume from outside the barrier.

公开(公告)号：US10990025B2

公开(公告)日：2021-04-27

申请号：US16289875

申请日：2019-03-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Laurentius Johannes Adrianus Van Bokhoven ,  Ruud Hendrikus Martinus Johannes Bloks ,  Günes Nakiboglu ,  Marinus Jan Remie ,  Johan Gertrudis Cornelis Kunnen

IPC: G03F7/20

Abstract: An apparatus and method for controlling temperature of a patterning device in a lithographic apparatus, by flowing gas across the patterning device. A patterning apparatus includes: a patterning device support structure configured to support a patterning device; a patterning device conditioning system including a first gas outlet configured to provide a gas flow over a surface of the patterning device and a second gas outlet configured to provide a gas flow over a part of a surface of the patterning device support structure not supporting the patterning device; and a control system configured to separately control the temperature of the gas exiting the first and second gas outlets such that the gas exiting the second gas outlet is at a higher temperature than the gas exiting the first gas outlet and/or to separately control the temperature and gas flow rate of the gas exiting the first and second gas outlets.

公开(公告)号：US10571810B2

公开(公告)日：2020-02-25

申请号：US16407878

申请日：2019-05-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Daan Daniel Johannes Antonius Van Sommeren ,  Coen Hubertus Matheus Baltis ,  Harold Sebastiaan Buddenberg ,  Giovanni Luca Gattobigio ,  Johannes Cornelius Paulus Melman ,  Günes Nakiboglu ,  Theodorus Wilhelmus Polet ,  Walter Theodorus Matheus Stals ,  Yuri Johannes Gabriël Van De Vijver ,  Josephus Peter Van Lieshout ,  Jorge Alberto Vieyra Salas ,  Aleksandar Nikolov Zdravkov

IPC: G03F7/20

Abstract: A substrate table configured to support a substrate for exposure in an immersion lithographic apparatus, the substrate table including: a support body having a support surface configured to support the substrate; and a cover ring fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface and at least a portion of the upper surface is configured so as to alter the stability of a meniscus of immersion liquid when moving along the upper surface towards the substrate.