公开(公告)号：US10416571B2

公开(公告)日：2019-09-17

申请号：US16063583

申请日：2016-12-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Erik Henricus Egidius Catharina Eummelen ,  Giovanni Luca Gattobigio ,  Johannes Cornelis Paulus Melman ,  Han Henricus Aldegonda Lempens ,  Miao Yu ,  Cornelius Maria Rops ,  Ruud Olieslagers ,  Artunç Ulucan ,  Theodorus Wilhelmus Polet ,  Patrick Johannes Wilhelmus Spruytenburg

IPC: G03F7/20 ,  H01L21/027

Abstract: An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.

公开(公告)号：US10317804B2

公开(公告)日：2019-06-11

申请号：US15781813

申请日：2016-11-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Daan Daniel Johannes Antonius Van Sommeren ,  Coen Hubertus Matheus Baltis ,  Harold Sebastiaan Buddenberg ,  Giovanni Luca Gattobigio ,  Johannes Cornelis Paulus Melman ,  Günes Nakiboglu ,  Theodorus Wilhelmus Polet ,  Walter Theodorus Matheus Stals ,  Yuri Johannes Gabriël Van De Vijver ,  Josephus Peter Van Lieshout ,  Jorge Alberto Vieyra Salas ,  Aleksandar Nikolov Zdravkov

IPC: G03F7/20

Abstract: A substrate table configured to support a substrate for exposure in an immersion lithographic apparatus, the substrate table including: a support body having a support surface configured to support the substrate; and a cover ring fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface, wherein at least a portion of the upper surface is configured so as to alter the stability of a meniscus of immersion liquid when moving along the upper surface towards the substrate.