公开(公告)号：WO2019243009A1

公开(公告)日：2019-12-26

申请号：PCT/EP2019/063895

申请日：2019-05-29

Applicant: ASML NETHERLANDS B.V.

Inventor： NASALEVICH, Maxim, Aleksandrovich ,  KLEIN, Alexander, Ludwig ,  KURGANOVA, Evgenia ,  NOTENBOOM, Arnoud, Willem ,  VAN ZWOL, Pieter-Jan ,  VLES, David, Ferdinand

IPC: G03F1/62 ,  G03F1/22 ,  G03F7/20

Abstract: A pellicle comprising a core comprising a material other than silicon carbide, a silicon carbide adhesion layer, and a ruthenium capping layer, the ruthenium capping layer being in contact with the silicon carbide adhesion layer. Also described is a method of preparing a pellicle comprising the steps of: (i) providing a pellicle core; (ii) providing a silicon carbide adhesion layer on the pellicle core; and (iii) providing a ruthenium capping layer in contact with the silicon carbide adhesion layer. Also provided is the use of silicon carbide as an adhesion layer in an EUV pellicle as well as an assembly.

公开(公告)号：EP4419966A1

公开(公告)日：2024-08-28

申请号：EP22800236.6

申请日：2022-10-07

Applicant: ASML Netherlands B.V.

Inventor： DONMEZ NOYAN, Inci ,  VAN DER WOORD, Ties, Wouter ,  REININK, Johan ,  VAN DE GOOR, Tim, Willem, Johan ,  KLEIN, Alexander, Ludwig ,  HOUWELING, Zomer, Silvester ,  VERMEULEN, Paul, Alexander ,  GIESBERS, Adrianus, Johannes, Maria ,  KLOOTWIJK, Johan, Hendrik ,  BERGERS, Lambertus, Idris, Johannes, Catharina

IPC: G03F1/62

CPC classification number: G03F1/62

公开(公告)号：EP4260121A1

公开(公告)日：2023-10-18

申请号：EP21811329.8

申请日：2021-11-15

Applicant: ASML Netherlands B.V.

Inventor： AKBULUT, Duygu ,  HASPESLAGH, Luc, Roger, Simonne ,  PANDEY, Nitesh ,  VAN DER WOORD, Ties, Wouter ,  BRONDANI TORRI, Guilherme ,  GOORDEN, Sebastianus, Adrianus ,  KLEIN, Alexander, Ludwig ,  OVERKAMP, Jim, Vincent ,  YEGEN, Halil, Gökay YEGEN ,  OSORIO OLIVEROS, Edgar, Alberto

IPC: G02B26/08 ,  G02B5/08 ,  G02B5/09 ,  G02B26/12 ,  G03F7/20

公开(公告)号：EP4469860A1

公开(公告)日：2024-12-04

申请号：EP23700075.7

申请日：2023-01-05

Applicant: ASML Netherlands B.V.

Inventor： TE SLIGTE, Edwin ,  KLEIN, Alexander, Ludwig ,  VERMEULEN, Paul, Alexander ,  WOLF, Abraham, Jan ,  GRISIN, Ilja

IPC: G03F1/82 ,  G03F7/20

公开(公告)号：EP4437381A1

公开(公告)日：2024-10-02

申请号：EP22814418.4

申请日：2022-11-11

Applicant: ASML Netherlands B.V.

Inventor： HOUWELING, Zomer, Silvester ,  VERMEULEN, Paul, Alexander ,  KLEIN, Alexander, Ludwig

IPC: G03F1/62

CPC classification number: G03F1/62

公开(公告)号：EP4158423A1

公开(公告)日：2023-04-05

申请号：EP21720459.3

申请日：2021-04-21

Applicant: ASML Netherlands B.V.

Inventor： HOUWELING, Zomer, Silvester ,  HILDENBRAND, Volker, Dirk ,  KLEIN, Alexander, Ludwig ,  VERMEULEN, Paul, Alexander

IPC: G03F1/62 ,  G02B5/20 ,  G03F7/20 ,  G21K1/06

公开(公告)号：EP3811151A1

公开(公告)日：2021-04-28

申请号：EP19728916.8

申请日：2019-05-29

Applicant: ASML Netherlands B.V.

Inventor： NASALEVICH, Maxim, Aleksandrovich ,  KLEIN, Alexander, Ludwig ,  KURGANOVA, Evgenia ,  NOTENBOOM, Arnoud, Willem ,  VAN ZWOL, Pieter-Jan ,  VLES, David, Ferdinand

IPC: G03F1/62 ,  G03F1/22 ,  G03F7/20

公开(公告)号：EP4252074A1

公开(公告)日：2023-10-04

申请号：EP21807070.4

申请日：2021-11-08

Applicant: ASML Netherlands B.V.

Inventor： HASPESLAGH, Luc, Roger, Simonne ,  PANDEY, Nitesh ,  VAN DER WOORD, Ties, Wouter ,  YEGEN, Halil, Gökay ,  OVERKAMP, Jim, Vincent ,  GOORDEN, Sebastianus, Adrianus ,  HUMBLET, Alexis ,  KLEIN, Alexander, Ludwig ,  BRONDANI TORRI, Guilherme ,  OSORIO OLIVEROS, Edgar, Alberto

IPC: G03F7/20 ,  B81B7/00 ,  G02B26/08 ,  H01L41/09

公开(公告)号：EP4231097A1

公开(公告)日：2023-08-23

申请号：EP22157906.3

申请日：2022-02-22

Applicant: ASML Netherlands B.V.

Inventor： KLEIN, Alexander, Ludwig ,  VAN DER WOORD, Ties, Wouter

IPC: G03F7/20 ,  G01N21/15 ,  G01N21/956

Abstract: A sample inspection tool is described. The inspection tool includes a light source configured to produce effective inspection radiation below 200nm, a sample holder, an imaging sub-system containing sub-system components that delivers light along an optical path from the light source to a sample to be held by the sample holder, and a barrier positioned between the last sub-system component in the optical path and the sample to be held by the sample holder. The barrier permits the radiation to pass therethrough while inhibiting impurities from reaching the sample to be held by the sample holder. In another embodiment, a barrier is provided for use in an inspection tool.

公开(公告)号：EP4208755A1

公开(公告)日：2023-07-12

申请号：EP21755471.6

申请日：2021-08-05

Applicant: ASML Netherlands B.V.

Inventor： VAN DER WOORD, Ties, Wouter ,  KLEIN, Alexander, Ludwig ,  HOUWELING, Zomer, Silvester ,  DONMEZ NOYAN, Inci ,  HILDENBRAND, Volker, Dirk ,  GIESBERS, Adrianus, Johannes, Maria ,  KLOOTWIJK, Johan, Hendrik

IPC: G03F1/62 ,  G03F7/20