-
公开(公告)号：WO2020099072A1
公开(公告)日：2020-05-22
申请号：PCT/EP2019/078655
申请日：2019-10-22
Applicant: ASML NETHERLANDS B.V.
Inventor： VAN ZWOL, Pieter-Jan , DONMEZ, Inci , GIESBERS, Adrianus, Johannes, Maria , HOUWELING, Zomer, Silvester , KLEIN, Alexander, Ludwig , KLOOTWIJK, Johan, Hendrik , KURGANOVA, Evgenia , NOTENBOOM, Arnoud, Willem , SI, Fai Tong , VAN DER WOORD, Ties, Wouter , VAN KRAAIJ, Markus, Gerardus, Martinus, Maria
Abstract: A pellicle for EUV lithography comprising: a frame; and a membrane supported by the frame, wherein the membrane comprises: a metallic or semimetallic layer, wherein the membrane comprises pores at a density of at least 5 per µm 2 . The membrane may have a substrate layer for supporting the metallic or semimetallic layer, the substrate layer comprising for example silicon obtained from silicon on insulator or polysilicon.
-
公开(公告)号：WO2022048854A1
公开(公告)日：2022-03-10
申请号：PCT/EP2021/071832
申请日：2021-08-05
Applicant: ASML NETHERLANDS B.V.
Inventor： VAN DER WOORD, Ties, Wouter , KLEIN, Alexander, Ludwig , HOUWELING, Zomer, Silvester , DONMEZ NOYAN, Inci , HILDENBRAND, Volker, Dirk , GIESBERS, Adrianus, Johannes, Maria , KLOOTWIJK, Johan, Hendrik
Abstract: A pellicle membrane for use in a lithographic apparatus, said pellicle membrane characterised by inplane variation in composition is described. Also described is a method of manufacturing a pellicle membrane, said method including the steps of: a) providing a sacrificial layer on a substrate: b) providing a first material layer on the sacrificial layer; c) providing a photoresist layer on the first material layer; d) patterning the photoresist layer; e) etching the first material layer to form a patterned surface; and f) either i) depositing a layer of a second material on the patterned surface and subsequently lifting off the portion of the second material deposited on the patterned photoresist layer, or ii) removing the remaining photoresist layer, depositing a layer of a second material on the patterned surface, and subsequently planarizing the surface.
-
公开(公告)号：WO2023066685A1
公开(公告)日：2023-04-27
申请号：PCT/EP2022/077941
申请日：2022-10-07
Applicant: ASML NETHERLANDS B.V.
Inventor： DONMEZ NOYAN, Inci , VAN DER WOORD, Ties, Wouter , REININK, Johan , VAN DE GOOR, Tim, Willem, Johan , KLEIN, Alexander, Ludwig , HOUWELING, Zomer, Silvester , VERMEULEN, Paul, Alexander , GIESBERS, Adrianus, Johannes, Maria , KLOOTWIJK, Johan, Hendrik , BERGERS, Lambertus, Idris, Johannes, Catharina
IPC: G03F1/62
Abstract: There is provided a pellicle membrane comprising a population of metal silicide crystals in a silicon- based matrix, wherein the pellicle membrane has an emissivity of 0.3 or more. Also provided is a method of manufacturing a pellicle membrane, a pellicle assembly, a lithographic apparatus comprising such a pellicle membrane or pellicle assembly. Also described is the use of such a pellicle membrane, pellicle assembly, or lithographic apparatus in a lithographic apparatus or method.
-
公开(公告)号：WO2022128284A1
公开(公告)日：2022-06-23
申请号：PCT/EP2021/081686
申请日：2021-11-15
Applicant: ASML NETHERLANDS B.V.
Inventor： AKBULUT, Duygu , HASPESLAGH, Luc, Roger, Simonne , PANDEY, Nitesh , VAN DER WOORD, Ties, Wouter , BRONDANI TORRI, Guilherme , GOORDEN, Sebastianus, Adrianus , KLEIN, Alexander, Ludwig , OVERKAMP, Jim, Vincent , YEGEN, Halil, Gökay YEGEN , OSORIO OLIVEROS, Edgar, Alberto
Abstract: A micromirror array comprising: a substrate; a plurality of mirrors for reflecting incident light; for each mirror of the plurality of mirrors, at least one actuator for displacing the mirror and connected to the substrate; one or more pillars connecting the mirror to the at least one actuator; and for each mirror of the plurality of mirrors, a heat diffuser for diffusing heat from the mirror, the heat diffuser comprising a heat sink and a thermally conductive post connecting the heat sink to the mirror, wherein the heat sink comprises a flexible membrane, which allows the thermally conductive post to pivot when the mirror is displaced, and wherein the flexible membrane comprises a center portion and a peripheral portion, the center portion having a thickness greater than a thickness of the peripheral portion.
-
公开(公告)号：WO2022112037A1
公开(公告)日：2022-06-02
申请号：PCT/EP2021/081689
申请日：2021-11-15
Applicant: ASML NETHERLANDS B.V.
Inventor： HASPESLAGH, Luc, Roger, Simonne , HUMBLET, Alexis , PANDEY, Nitesh , VAN DER WOORD, Ties, Wouter , YEGEN, Halil, Gökay , GOORDEN, Sebastianus, Adrianus , KLEIN, Alexander, Ludwig , OVERKAMP, Jim, Vincent , OSORIO OLIVEROS, Edgar, Alberto
Abstract: A microelectromechanical system, MEMS, comprises a MEMS wafer comprising an array of MEMS elements partitioned into a plurality of sub-arrays. A respective local control unit is provided for each sub-array a respective local control unit arranged to perform read/write communication with each MEMS element of the corresponding sub-array. The MEMS further includes a control wafer comprising a control circuit for controlling the array of MEMS elements. The control circuit is configured to transmit and receive data signals to and from each of the local control units using, for each control unit, a respective plurality of through silicon vias, TSV, in the control wafer. The control circuit is operative to control the array of MEMS elements using the data signals passed between the control circuit and the local control units, which comprise data signals relating to specific ones of the MEMS elements of the corresponding sub-array of MEMS elements.
-
Patent Agency Ranking
公开(公告)号：WO2021239337A1
公开(公告)日：2021-12-02
申请号：PCT/EP2021/060294
申请日：2021-04-21
Applicant: ASML NETHERLANDS B.V.
Inventor： HOUWELING, Zomer, Silvester , HILDENBRAND, Volker, Dirk , KLEIN, Alexander, Ludwig , VERMEULEN, Paul, Alexander
Abstract: There is described an optical element for a lithographic apparatus, said optical element comprising an anchor layer selected to support a top layer having self-terminating growth in an operating lithographic apparatus or plasma containing environment. Also described is a method of manufacturing an optical element, said method comprising the steps of: depositing a top layer on anchor layer via exposure to plasma, preferably electromagnetically induced plasma. Lithographic apparatuses comprising such optical elements are also described.
-
公开(公告)号：WO2021144097A1
公开(公告)日：2021-07-22
申请号：PCT/EP2020/086067
申请日：2020-12-15
Applicant: ASML NETHERLANDS B.V.
Inventor： VAN DER WOORD, Ties, Wouter , HILDENBRAND, Volker, Dirk , DONMEZ NOYAN, Inci , GIESBERS, Adrianus, Johannes, Maria , KLEIN, Alexander, Ludwig
IPC: G03F1/62 , G03F7/20 , G03F7/70191 , G03F7/70308
Abstract: A pellicle membrane for a lithographic apparatus, said membrane comprising a matrix including a plurality of inclusions distributed therein is provided. Also provided is a method of manufacturing said pellicle membrane, a lithographic apparatus comprising said pellicle membrane, a pellicle assembly for use in a lithographic apparatus comprising said membrane, as well as the use of the pellicle membrane in a lithographic apparatus or method.
-
公开(公告)号：WO2022112027A1
公开(公告)日：2022-06-02
申请号：PCT/EP2021/081584
申请日：2021-11-12
Applicant: ASML NETHERLANDS B.V.
Inventor： HASPESLAGH, Luc, Roger, Simonne , PANDEY, Nitesh , VAN DER WOORD, Ties, Wouter , YEGEN, Halil, Gökay YEGEN , OVERKAMP, Jim, Vincent , BRONDANI TORRI, Guilherme , GOORDEN, Sebastianus, Adrianus , KLEIN, Alexander, Ludwig , OSORIO OLIVEROS, Edgar, Alberto
IPC: G03F7/20 , G02B26/08 , H01L41/047 , H01L41/083
Abstract: A micromirror array comprises a substrate, a plurality of mirrors for reflecting incident light and, for each mirror of the plurality of mirrors, at least one multilayer piezoelectric actuator for displacing the mirror, wherein the at least one multilayer piezoelectric actuator is connected to the substrate, and wherein the at least one multilayer piezoelectric actuator comprises a plurality of piezoelectric layers of piezoelectric material interleaved with a plurality of electrode layers to form a stack of layers. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection and/or metrology apparatus.
-
公开(公告)号：WO2022111975A1
公开(公告)日：2022-06-02
申请号：PCT/EP2021/080873
申请日：2021-11-08
Applicant: ASML NETHERLANDS B.V.
Inventor： HASPESLAGH, Luc, Roger, Simonne , PANDEY, Nitesh , VAN DER WOORD, Ties, Wouter , YEGEN, Halil, Gökay , OVERKAMP, Jim, Vincent , GOORDEN, Sebastianus, Adrianus , HUMBLET, Alexis , KLEIN, Alexander, Ludwig , BRONDANI TORRI, Guilherme , OSORIO OLIVEROS, Edgar, Alberto
Abstract: A micromirror array comprises a substrate, a plurality of mirrors for reflecting incident light and, for each mirror of the plurality of mirrors, at least one piezoelectric actuator for displacing the mirror, wherein the at least one piezoelectric actuator is connected to the substrate. The micromirror array further comprises one or more pillars connecting the mirror to the at least one piezoelectric actuator. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection and/or metrology apparatus.
-
公开(公告)号：WO2020078721A1
公开(公告)日：2020-04-23
申请号：PCT/EP2019/076667
申请日：2019-10-02
Applicant: ASML NETHERLANDS B.V.
Inventor： VAN ZWOL, Pieter-Jan , BALTUSSEN, Sander , DE GRAAF, Dennis , FRANKEN, Johannes, Christiaan, Leonardus , GIESBERS, Adrianus, Johannes, Maria , KLEIN, Alexander, Ludwig , KLOOTWIJK, Johan, Hendrik , KNAPEN, Peter, Simon, Antonius , KURGANOVA, Evgenia , KUZNETSOV, Alexey, Sergeevich , NOTENBOOM, Arnoud, Willem , VALEFI, Mahdiar , VAN DE KERKHOF, Marcus, Adrianus , VAN DEN EINDEN, Wilhelmus, Theodorus, Anthonius, Johannes , VAN DER WOORD, Ties, Wouter , WONDERGEM, Hendrikus, Jan , ZDRAVKOV, Aleksandar, Nikolov
Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising: at least one membrane layer supported by a planar substrate, wherein the planar substrate comprises an inner region and a border region around the inner region; and a first sacrificial layer between the planar substrate and the membrane layer; selectively removing the inner region of the planar substrate, wherein the step of selectively removing the inner region of the planar substrate comprises using an etchant which has a similar etch rate for the membrane layer and its oxide and a substantially different etch rate for the first sacrificial layer; such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border comprising the border region of the planar substrate and the first sacrificial layer situated between the border and the membrane layer.
-
-
-
-
-
-
-
-
-
Search Results
22
records
(took 0.029 seconds)
