公开(公告)号：EP3789826A1

公开(公告)日：2021-03-10

申请号：EP19195527.7

申请日：2019-09-05

Applicant: ASML Netherlands B.V.

Inventor： KOOIMAN, Marleen ,  PISARENCO, Maxim ,  SLACHTER, Abraham ,  MASLOW, Mark, John

IPC: G03F7/20 ,  H01L21/02

Abstract: Described herein is a method of training a model configured to predict whether a feature associated with an imaged substrate will be defective after etching of the imaged substrate and determining etch conditions based on the trained model. The method includes obtaining, via a metrology tool, (i) an after development image of the imaged substrate at a given location, the after development image including a plurality of features, and (ii) an after etch image of the imaged substrate at the given location; and training, using the after development image and the after etch image, the model configured to determine defectiveness of a given feature of the plurality of features in the after development image. In an embodiment, the determining of defectiveness is based on comparing the given feature in the after development image with a corresponding etch feature in the after etch image.

公开(公告)号：EP3499311A1

公开(公告)日：2019-06-19

申请号：EP17207267.0

申请日：2017-12-14

Applicant: ASML Netherlands B.V.

Inventor： KOOIMAN, Marleen ,  WUISTER, Sander Frederik

IPC: G03F7/20 ,  G01N21/956 ,  H01L21/66

Abstract: Disclosed is a method of predicting the dominant failure mode and/or the failure rate of a plurality of features formed on a substrate, and an associated inspection apparatus. The method comprises determining a placement metric for each feature, the placement metric comprising a measure of whether the feature is in an expected position, and comparing a distribution of the placement metric to a reference (e.g., Gaussian) distribution. The placement metric may comprise a boundary metric for a plurality of boundary points on a boundary defining each feature, the boundary metric comprising a measure of whether a boundary point is in an expected position. The dominant failure mode and/or the failure rate of the plurality of features is predicted from the comparison.

公开(公告)号：EP4104019A1

公开(公告)日：2022-12-21

申请号：EP21702511.3

申请日：2021-02-05

Applicant: ASML Netherlands B.V.

Inventor： KOOIMAN, Marleen

IPC: G03F7/20

公开(公告)号：EP3862814A1

公开(公告)日：2021-08-11

申请号：EP20156290.7

申请日：2020-02-10

Applicant: ASML Netherlands B.V.

Inventor： KOOIMAN, Marleen

IPC: G03F7/20

Abstract: An image analysis method for identifying features in an image of a part of an array of features formed by a multi-step process, the method comprising:
analyzing variations in features visible in the image; and
associating features of the image with steps of the multi-step process based at least in part on results of the analyzing.

公开(公告)号：EP3531206A1

公开(公告)日：2019-08-28

申请号：EP18158448.3

申请日：2018-02-23

Applicant: ASML Netherlands B.V.

Inventor： KOOIMAN, Marleen

IPC: G03F7/20

Abstract: A method, involving computing a first intensity of a first aerial image and a second intensity of a second aerial image, the first aerial image corresponding to a first location within a resist layer and the second aerial image corresponding to a second location within the resist layer. The method further involves, performing, by a hardware computer system using a resist model, a computer simulation of the resist layer to obtain a value of a parameter for a resist layer feature based on a difference between the first and second intensities or on a difference between a resist model result for the first intensity and a resist model result for the second intensity.