公开(公告)号：EP3492983A1

公开(公告)日：2019-06-05

申请号：EP17205139.3

申请日：2017-12-04

Applicant: ASML Netherlands B.V.

Inventor： BATISTAKIS, Chrysostomos ,  MIDDLEBROOKS, Scott Anderson ,  WUISTER, Sander Frederik

IPC: G03F7/20

Abstract: A method, involving obtaining a resist deformation model for simulating a deformation process of a pattern in resist, the resist deformation model being a fluid dynamics model configured to simulate an intrafluid force acting on the resist; performing, using the resist deformation model, a computer simulation of the deformation process to obtain a deformation of the developed resist pattern for an input pattern to the resist deformation model; and producing electronic data representing the deformation of the developed resist pattern for the input pattern.

公开(公告)号：EP3499311A1

公开(公告)日：2019-06-19

申请号：EP17207267.0

申请日：2017-12-14

Applicant: ASML Netherlands B.V.

Inventor： KOOIMAN, Marleen ,  WUISTER, Sander Frederik

IPC: G03F7/20 ,  G01N21/956 ,  H01L21/66

Abstract: Disclosed is a method of predicting the dominant failure mode and/or the failure rate of a plurality of features formed on a substrate, and an associated inspection apparatus. The method comprises determining a placement metric for each feature, the placement metric comprising a measure of whether the feature is in an expected position, and comparing a distribution of the placement metric to a reference (e.g., Gaussian) distribution. The placement metric may comprise a boundary metric for a plurality of boundary points on a boundary defining each feature, the boundary metric comprising a measure of whether a boundary point is in an expected position. The dominant failure mode and/or the failure rate of the plurality of features is predicted from the comparison.