公开(公告)号：US20190227445A1

公开(公告)日：2019-07-25

申请号：US16326948

申请日：2017-08-11

Applicant: ASML Netherlands B.V.

Inventor： Frits VAN DER MEULEN ,  Erik Johan ARLEMARK ,  Hendrikus Herman Marie COX ,  Martinus Agnes Willem CUIJPERS ,  Joost DE HOOGH ,  Gosse Charles DE VRIES ,  Paul Comé Henri DE WIT ,  Sander Catharina Reinier DERKS ,  Ronald Comelis Gerardus GIJZEN ,  Dries Vaast Paul HEMSCHOOTE ,  Christiaan Alexander HOOGENDAM ,  Adrianus Hendrik KOEVOETS ,  Raymond Wilhelmus Louis LAFARRE ,  Alain Louis Claude LEROUX ,  Patrick Willem Paul LIMPENS ,  Jim Vincent OVERKAMP ,  Christiaan Louis VALENTIN ,  Koos VAN BERKEL ,  Stan Henricus VAN DER MEULEN ,  Jacobus Comelis Gerardus VAN DER SANDEN ,  Harmen Klaas VAN DER SCHOOT ,  David Ferdinand VLES ,  Evert Auke Rinze WESTERHUIS

IPC: G03F7/20

Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.

公开(公告)号：US20190033499A1

公开(公告)日：2019-01-31

申请号：US16072399

申请日：2017-02-17

Applicant: ASML Netherlands B.V.

Inventor： Koos VAN BERKEL ,  Adrianus HENDRIK

IPC: G02B5/08 ,  G02B7/18 ,  G03F1/24 ,  G03F7/20

Abstract: A reflector for EUV radiation, the reflector comprising a reflector substrate and a reflective surface, the reflector substrate having a plurality of coolant channels formed therein, the coolant channels being substantially straight, substantially parallel to each other and substantially parallel to the reflective surface and configured so that coolant flows in parallel through the coolant channels and in contact with the reflector substrate.

公开(公告)号：US20160246189A1

公开(公告)日：2016-08-25

申请号：US15052201

申请日：2016-02-24

Applicant: ASML NETHERLANDS B.V.

Inventor： Koos VAN BERKEL ,  Duygu AKBULUT ,  Jeroen Johan Maarten VAN DE WIJDEVEN ,  Ferry ZIJP

IPC: G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70775 ,  G01N21/956 ,  G02B21/0016 ,  G03F7/70625 ,  G03F7/70633 ,  G03F9/7019

Abstract: A method and apparatus for position control of a component relative to a surface is disclosed. The method may include calculating an estimated effect of, or derived from, Casimir force acting between the component and the surface, and compensating positioning of the component relative to the surface using the estimated effect.

Abstract translation: 公开了一种用于相对于表面的部件的位置控制的方法和装置。 该方法可以包括计算在组件和表面之间作用的卡西米力的估计效果或来自其的估计效果，以及使用估计效果来补偿部件相对于表面的定位。