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公开(公告)号：US20230273527A1
公开(公告)日：2023-08-31
申请号：US18016226
申请日：2021-06-17
Applicant: ASML Netherlands B.V.
Inventor： Mauritius Gerardus Elisabeth SCHNEIDERS , Koos VAN BERKEL , Wenjie JIN
CPC classification number: G03F7/70266 , G03F7/70891 , G03F7/70504 , G03F7/706 , G03F7/706839 , G03F7/70508 , G06F17/12
Abstract: A method for calculating a spatial map associated with a component, the spatial map indicating spatial variations of thermal expansion parameters in the component, the method comprising: providing or determining a temperature distribution in the component as a function of time; calculating the spatial map associated with the component using the provided or determined temperature distribution in the component and optical measurements of a radiation beam that has interacted directly or indirectly with the component, the optical measurements being time synchronized with the provided or determined temperature distribution in the component.
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公开(公告)号：US20180120714A1
公开(公告)日：2018-05-03
申请号：US15569086
申请日：2016-04-19
Applicant: ASML Netherlands B.V.
Inventor： Ferry ZIJP , Duygu AKBULUT , Peter Danny VAN VOORST , Jeroen Johan Maarten VAN DE WIJDEVEN , Koos VAN BERKEL
CPC classification number: G03F7/70641 , G01B11/14 , G01N21/956 , G02B5/3025 , G02B21/0016 , G03F7/70308 , G03F7/70591 , G03F7/70625 , G03F7/70633
Abstract: A method involving providing incident radiation of a first polarization state by an optical component into an interface of an object with an external environment, wherein a surface is provided adjacent the interface and separated by a gap from the interface, detecting, from incident radiation reflected from the interface and from the surface, radiation of a second different polarization state arising from the reflection of incident radiation of the first polarization at the interface as distinct from the radiation of the first polarization state in the reflected radiation, and producing a position signal representative of a relative position between the focus of the optical component and the object.
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公开(公告)号：US20230384694A1
公开(公告)日：2023-11-30
申请号：US18269387
申请日：2021-12-02
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Abdullah ALIKHAN , Tammo UITTERDIJK , Johannes Bernardus Charles ENGELEN , Daniel KAMIENIECKI , Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN , Thomas POIESZ , Leon Martin LEVASIER , Jim Vincent OVERKAMP , Johannes Adrianus Cornelis Maria PIJNENBURG , Koos VAN BERKEL , Gregory James DIGUIDO , Anthony C. SOCCI, JR. , Iliya SIGAL , Bram Antonius Gerardus LOMANS , Michel Ben Isel HABETS
IPC: G03F7/00 , H01L21/683 , H01L21/687
CPC classification number: G03F7/70708 , G03F7/7095 , G03F7/70783 , H01L21/6838 , H01L21/68757
Abstract: Systems, apparatuses, and methods are provided for manufacturing a substrate table. An example method can include forming a vacuum sheet including a plurality of vacuum connections and a plurality of recesses configured to receive a plurality of burls disposed on a core body for supporting an object such as a wafer. Optionally, at least one burl can be surrounded, partially or wholly, by a trench. The example method can further include using the vacuum sheet to mount the core body to an electrostatic sheet including a plurality of apertures configured to receive the plurality of burls. Optionally, the example method can include using the vacuum sheet to mount the core body to the electrostatic sheet such that the plurality of recesses of the vacuum sheet line up with the plurality of burls of the core body and the plurality of apertures of the electrostatic sheet.
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公开(公告)号：US20230273529A1
公开(公告)日：2023-08-31
申请号：US18012222
申请日：2021-06-14
Applicant: ASML NETHERLANDS B.V.
Inventor： Satej Subhash KHEDEKAR , Henricus Jozef CASTELIJNS , Anjan Prasad GANTAPARA , Stephen Henry BOND , Seyed Iman MOSSAVAT , Alexander YPMA , Gerald DICKER , Ewout Klaas STEINMEIER , Chaoqun GUO , Chenxi LIN , Hongwei CHEN , Zhaoze LI , Youping ZHANG , Yi ZOU , Koos VAN BERKEL , Joost Johan BOLDER , Arnaud HUBAUX , Andriy Vasyliovich HLOD , Juan Manuel GONZALEZ HUESCA , Frans Bernard AARDEN
IPC: G03F7/20
CPC classification number: G03F7/70525 , G03F7/70633 , G03F7/7065
Abstract: Generating a control output for a patterning process is described. A control input is received. The control input is for controlling the patterning process. The control input includes one or more parameters used in the patterning process. The control output is generated with a trained machine learning mod& based on the control input, The machine learning model is trained with training data generated from simulation of the patterning process and/or actual process data, The training data includes 1) a plurality of training control inputs corresponding to a plurality of operational conditions of the patterning process, where the plurality of operational conditions of the patterning process are associated with operational condition specific behavior of the patterning process over time, and 2) training control outputs generated using a physical model based on the training control inputs.
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公开(公告)号：US20190107786A1
公开(公告)日：2019-04-11
申请号：US16144013
申请日：2018-09-27
Applicant: ASML Netherlands B.V.
Inventor： Johan Maria VAN BOXMEER , Marinus Johannes Maria VAN DAM , Koos VAN BERKEL , Sietse Thijmen VAN DER POST , Johannes Hubertus Antonius VAN DE RIJDT
Abstract: Disclosed is a method of optimizing within an inspection apparatus, the position and/or size (and therefore focus) of a measurement illumination spot relative to a target on a substrate. The method comprises detecting scattered radiation from at least the target resultant from illuminating the target, for different sizes and/or positions of said illumination spot relative to the target; and optimizing said position and/or size of the measurement illumination spot relative to the target based on a characteristic of the detected scattered radiation for the different sizes and/or positions of said illumination spot relative to the target.
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Patent Agency Ranking
公开(公告)号：US20240077380A1
公开(公告)日：2024-03-07
申请号：US18262511
申请日：2022-01-05
Applicant: ASML Netherlands B.V.
Inventor： Marinus Maria Johannes VAN DE WAL , Koos VAN BERKEL , Victor Sebastiaan DOLK , Stijn Clyde Natalia THISSEN , Mauritius Gerardus Elisabeth SCHNEIDERS , Adrianus Hendrik KOEVOETS
CPC classification number: G01M11/0242 , G01K1/026 , G03F7/705 , G03F7/706 , G03F7/70891
Abstract: A method of predicting thermally induced aberrations of a projection system for projecting a radiation beam, the method comprising: calculating an irradiance profile for at least one optical element of the projection system from a power and illumination source pupil of the radiation beam, estimating a temperature distribution as a function of time in the at least one optical element of the projection system using the calculated irradiance profile for the at least one optical element of the projection system; calculating the thermally induced aberrations of the projection system based on the estimated temperature distribution and a thermal expansion parameter map associated with the at least one optical element of the projection system, wherein the thermal expansion parameter map is a spatial map indicating spatial variations of thermal expansion parameters in the at least one optical element of the projection system or a uniform map.
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公开(公告)号：US20230315027A1
公开(公告)日：2023-10-05
申请号：US18013154
申请日：2021-06-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Koos VAN BERKEL , Joost Johan BOLDER , Stijn BOSMA
CPC classification number: G05B13/027 , G03F7/706841 , G06N3/084
Abstract: Variable setpoints and/or other factors may limit iterative learning control for moving components of an apparatus. The present disclosure describes a processor configured to control movement of a component of an apparatus with at least one prescribed movement. The processor is configured to receive a control input such as and/or including a variable setpoint. The control input indicates the at least one prescribed movement for the component. The processor is configured to determine, with a trained artificial neural network, based on the control input, a feedforward output for the component. The artificial neural network is pretrained with a training data set such that the artificial neural network determines the output regardless of whether or not the control input falls outside the training data set. The processor controls the component based on at least the output.
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公开(公告)号：US20230236518A1
公开(公告)日：2023-07-27
申请号：US18008283
申请日：2021-06-09
Applicant: ASML Netherlands B.V. , ASML HOLDING N.V.
Inventor： Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN , Koos VAN BERKEL , Marcus Adrianus VAN DE KERKHOF , Roger Franciscus Mattheus Maria HAMELINCK , Shahab SHERVIN , Marinus Augustinus Christiaan VERSCHUREN , Johannes Bernardus Charles ENGELEN , Matthias KRUIZINGA , Tammo UITTERDIJK , Oleksiy Sergiyovich GALAKTIONOV , Kjeld Gertrudus Hendrikus JANSSEN , Johannes Adrianus Cornelis Maria PIJNENBURG , Peter VAN DELFT
IPC: G03F7/00
CPC classification number: G03F7/70825 , G03F7/70708
Abstract: An object holder configured to support an object, the object holder comprising: a core body comprising a plurality of burls having distal ends in a support plane for supporting the object; an electrostatic sheet between the burls, the electrostatic sheet comprising an electrode sandwiched between dielectric layers; and a circumferential barrier for reducing outflow of gas escaping from space between the object and the core body.
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公开(公告)号：US20230176492A1
公开(公告)日：2023-06-08
申请号：US18161140
申请日：2023-01-30
Applicant: Carl Zeiss SMT GmbH , ASML NETHERLANDS B.V.
Inventor： Toralf GRUNER , Norman BAER , Koos VAN BERKEL , Laurentius Johannes Adrianus VAN BOKHOVEN , Maike LORENZ , Thomas MONZ , Eva SCHNEIDER , Hans-Michael STIEPAN , Bob STREEFKERK , André DIRAUF
CPC classification number: G03F7/70891 , G02B7/1815 , G02B2207/101 , G03F7/707
Abstract: Disclosed are an optical system, in particular for microlithography, and a method for operating an optical system. According to one disclosed aspect, the optical system includes at least one mirror (100, 500, 600) having an optical effective surface (101, 501, 601) and a mirror substrate (110, 510, 610), wherein at least one cooling channel (115, 515, 615) in which a cooling fluid is configured to flow is arranged in the mirror substrate, for dissipating heat that is generated in the mirror substrate due to absorption of electromagnetic radiation incident from a light source on the optical effective surface, and a unit (135, 535, 635) to adjust the temperature and/or the flow rate of the cooling fluid either dependent on a measured quantity that characterizes the thermal load in the mirror substrate or dependent on an estimated/expected thermal load in the mirror substrate for a given power of the light source.
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10.发明申请公开(公告)号：US20190361360A1
公开(公告)日：2019-11-28
申请号：US16331601
申请日：2017-08-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Sietse Thijmen VAN DER POST , Koos VAN BERKEL
IPC: G03F7/20 , G01N21/956
Abstract: An optical system and detector capture a distribution of radiation modified by interaction with a target structure. The observed distribution is used to calculate a property of the structure (e.g. CD or overlay). A condition error (e.g. focus error) associated with the optical system is variable between observations. The actual condition error specific to each capture is recorded and used to apply a correction for a deviation of the observed distribution due to the condition error specific to the observation. The correction in one practical example is based on a unit correction previously defined with respect to a unit focus error. This unit correction can be scaled linearly, in accordance with a focus error specific to the observation.
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