公开(公告)号：WO2011101183A1

公开(公告)日：2011-08-25

申请号：PCT/EP2011/050324

申请日：2011-01-12

Applicant: ASML Netherlands B.V. ,  MENCHTCHIKOV, Boris ,  PADIY, Alexandre, Viktorovych

Inventor： MENCHTCHIKOV, Boris ,  PADIY, Alexandre, Viktorovych

IPC: G03F7/20

CPC classification number: G03F7/70258 ,  G03F7/70616

Abstract: A lithographic apparatus operates by moving a substrate and a patterning device relative to each other in a sequence of movements such that a pattern is applied at a successive portions on the substrate. Each portion of the substrate is patterned by a scanning operation in which the patterning device is scanned through the radiation beam while synchronously scanning the substrate through the patterned radiation beam so as to apply the pattern to the desired portion on the substrate. An intrafield correction is applied during each scanning operation so as to compensate for distortion effects which vary during the scanning operation. The intrafield correction includes corrective variations of one or more properties of the projection system, and optionally out-of-plane movements of the patterning device and/or substrate table.

Abstract translation: 平版印刷设备通过以一系列运动相对于彼此移动基板和图案形成装置来操作，使得在基板上的连续部分施加图案。 通过扫描操作来对衬底的每个部分进行构图，其中图案形成装置通过辐射束扫描，同时通过图案化的辐射束同步扫描衬底，以将图案施加到衬底上的期望部分。 在每次扫描操作期间应用场内校正，以补偿在扫描操作期间变化的失真效应。 场内校正包括投影系统的一个或多个特性的校正变化，以及图案形成装置和/或衬底台的任意的平面外运动。

公开(公告)号：EP3899662A1

公开(公告)日：2021-10-27

申请号：EP19801044.9

申请日：2019-11-14

Applicant: ASML Netherlands B.V.

Inventor： BRANTJES, Nicolaas Petrus Marcus ,  COX, Matthijs ,  MENCHTCHIKOV, Boris ,  TABERY, Cyrus, Emil ,  ZHANG, Youping ,  ZOU, Yi ,  LIN, Chenxi ,  CHENG, Yana ,  HASTINGS, Simon, Philip, Spencer ,  GENIN, Maxime, Philippe, Frederic

IPC: G03F7/20 ,  G03F9/00

公开(公告)号：EP3891558A1

公开(公告)日：2021-10-13

申请号：EP19798219.2

申请日：2019-10-30

Applicant: ASML Netherlands B.V.

Inventor： ZHANG, Youping ,  MENCHTCHIKOV, Boris ,  TABERY, Cyrus, Emil ,  ZOU, Yi ,  LIN, Chenxi ,  CHENG, Yana ,  HASTINGS, Simon, Philip, Spencer ,  GENIN, Maxime

IPC: G03F7/20

公开(公告)号：EP4303658A1

公开(公告)日：2024-01-10

申请号：EP22183121.7

申请日：2022-07-05

Applicant: ASML Netherlands B.V.

Inventor： MENCHTCHIKOV, Boris ,  TABERY, Cyrus, Emil

IPC: G03F7/20 ,  G03F9/00

Abstract: Disclosed is a method of correcting metrology signal data relating to a structure on a substrate. The method comprises obtaining measured metrology signal data related to a measurement of the structure on a substrate with measurement radiation; obtaining simulated metrology signal data related to a simulated measurement of a model of said structure using said measurement radiation; and using the simulated metrology signal data to correct the measured metrology signal data for at least a polarization dependent offset in the measured metrology signal data resultant from an asymmetry in said structure, to obtain corrected measured metrology signal data.

公开(公告)号：EP3891559A1

公开(公告)日：2021-10-13

申请号：EP19798274.7

申请日：2019-11-04

Applicant: ASML Netherlands B.V.

Inventor： LIN, Chenxi ,  TABERY, Cyrus Emil ,  CEKLI, Hakki Ergun ,  HASTINGS, Simon Philip Spencer ,  MENCHTCHIKOV, Boris ,  ZOU, Yi ,  CHENG, Yana ,  GENIN, Maxime Philippe Frederic ,  CHEN, Tzu-Chao ,  HARUTYUNYAN, Davit ,  ZHANG, Youping

IPC: G03F7/20 ,  H01L21/66