公开(公告)号：US11009803B2

公开(公告)日：2021-05-18

申请号：US16587483

申请日：2019-09-30

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Matthias Kruizinga ,  Maarten Mathijs Marinus Jansen ,  Jorge Manuel Azeredo Lima ,  Erik Willem Bogaart ,  Derk Servatius Gertruda Brouns ,  Marc Bruijn ,  Richard Joseph Bruls ,  Jeroen Dekkers ,  Paul Janssen ,  Mohammad Reza Kamali ,  Ronald Harm Gunther Kramer ,  Robert Gabriël Maria Lansbergen ,  Martinus Hendrikus Antonius Leenders ,  Matthew Lipson ,  Erik Roelof Loopstra ,  Joseph H. Lyons ,  Stephen Roux ,  Gerrit Van Den Bosch ,  Sander Van Den Heijkant ,  Sandra Van Der Graaf ,  Frits Van Der Meulen ,  Jérôme François Sylvain Virgile Van Loo ,  Beatrijs Louise Marie-Joseph Katrien Verbrugge

IPC: G03F1/64 ,  G03F7/20

Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

公开(公告)号：US11003098B2

公开(公告)日：2021-05-11

申请号：US16687535

申请日：2019-11-18

Applicant: ASML Netherlands B.V.

Inventor： Frits Van Der Meulen ,  Maarten Mathijs Marinus Jansen ,  Jorge Manuel Azeredo Lima ,  Derk Servatius Gertruda Brouns ,  Marc Bruijn ,  Jeroen Dekkers ,  Paul Janssen ,  Ronald Harm Gunther Kramer ,  Matthias Kruizinga ,  Robert Gabriël Maria Lansbergen ,  Martinus Hendrikus Antonius Leenders ,  Erik Roelof Loopstra ,  Gerrit Van Den Bosch ,  Jérôme François Sylvain Virgile Van Loo ,  Beatrijs Louise Marie-Joseph Katrien Verbrugge ,  Angelo Cesar Peter De Klerk ,  Jacobus Maria Dings ,  Maurice Leonardus Johannes Janssen ,  Roland Jacobus Johannes Kerstens ,  Martinus Jozef Maria Kester ,  Michel Loos ,  Geert Middel ,  Silvester Matheus Reijnders ,  Frank Johannes Christiaan Theuerzeit ,  Anne Johannes Wilhelmus Van Lievenoogen

IPC: G03F7/20 ,  G03F1/64

Abstract: Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

公开(公告)号：US20210109438A1

公开(公告)日：2021-04-15

申请号：US17130537

申请日：2020-12-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Maxim Aleksandrovich Nasalevich ,  Erik Achilles Abegg ,  Nirupam Banerjee ,  Michiel Alexander Blauw ,  Derk Servatius Gertruda Brouns ,  Paul Janssen ,  Matthias Kruizinga ,  Egbert Lenderink ,  Nicolae Maxim ,  Andrey Nikipelov ,  Arnoud Willem Notenboom ,  Claudia Piliego ,  Mária Péter ,  Gijsbert Rispens ,  Nadja Schuh ,  Marcus Adrianus Van De Kerkhof ,  Willem Joan Van Der Zande ,  Pieter-Jan Van Zwol ,  Antonius Willem Verburg ,  Johannes Petrus Martinus Bernardus Vermeulen ,  David Ferdinand Vles ,  Willem-Pieter Voorthuijzen ,  Aleksandar Nikolov Zdravkov

IPC: G03F1/62 ,  G03F7/20 ,  G03F1/82 ,  G02B5/20 ,  G02B5/28

Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.

公开(公告)号：US20200012204A1

公开(公告)日：2020-01-09

申请号：US16572156

申请日：2019-09-16

Applicant: ASML Netherlands B.V.

Inventor： Frits Van Der Meulen ,  Maarten Mathijs Marinus Jansen ,  Jorge Manuel Azeredo Lima ,  Derk Servatius Gertruda Brouns ,  Marc Bruijn ,  Jeroen Dekkers ,  Paul Janssen ,  Ronald Harm, Gunther Kramer ,  Matthias Kruizinga ,  Robert Gabriël Maria Lansbergen ,  Martinus Hendrikus Antonius Leenders ,  Erik Roelof Loopstra ,  Gerrit Van Den Bosch ,  Jérôme François Sylvain Virgile Van Loo ,  Beatrijs Louise Marie-Joseph Katrien Verbrugge ,  Angelo Cesar Peter De Klerk ,  Jacobus Maria Dings ,  Maurice Leonardus Johannes Janssen ,  Roland Jacobus Johannes Kerstens ,  Martinus Jozef Maria Kesters ,  Michel Loos ,  Geert Middel ,  Silvester Matheus Reijnders ,  Frank Johannes Christiaan Theuerzeit ,  Anne Johannes Wilhelmus Van Lievenoogen

IPC: G03F7/20 ,  G03F1/22 ,  G03F1/64

Abstract: Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.