Inspection apparatus
    8.
    发明授权

    公开(公告)号:US12124176B2

    公开(公告)日:2024-10-22

    申请号:US17943809

    申请日:2022-09-13

    CPC classification number: G03F7/7065 G03F1/62

    Abstract: An inspection apparatus for inspecting an object such as a pellicle for use in an EUV lithographic apparatus, the inspection apparatus including: a vacuum chamber; a load lock forming an interface between the vacuum chamber and an ambient environment; and a stage apparatus configured to receive the object from the load lock and displace the object inside the vacuum chamber, wherein the vacuum chamber comprises a first parking position and a second parking position for temporarily storing the object.

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