公开(公告)号：US20240241454A1

公开(公告)日：2024-07-18

申请号：US18619839

申请日：2024-03-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Simon Reinald HUISMAN ,  Sebastianus Adrianus GOORDEN ,  Harm Jan Willem BELT ,  Filippo ALPEGGIANI ,  Irwan Dani SETIJA ,  Henricus Petrus Maria PELLEMANS

IPC: G03F9/00 ,  G03F7/00

CPC classification number: G03F9/7019 ,  G03F7/70633 ,  G03F7/70641 ,  G03F7/706839 ,  G03F7/70725 ,  G03F9/7049 ,  G03F9/7088

Abstract: Disclosed is a method for measuring a parameter of interest from a target and associated apparatuses. The method comprises obtaining measurement acquisition data relating to measurement of a target on a production substrate during a manufacturing phase; obtaining a calibration correction database and/or a trained model having been trained on said calibration correction database, operable to correct for effects in the measurement acquisition data; correcting for effects in the measurement acquisition data using first correction data from said calibration correction database and/or using said trained model so as to obtain corrected measurement data and/or a corrected parameter of interest which is/are corrected for at least said effects; and updating said calibration correction data and/or said trained model with said corrected measurement data and/or corrected parameter of interest.

公开(公告)号：US20240094643A1

公开(公告)日：2024-03-21

申请号：US18269983

申请日：2021-12-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Filippo ALPEGGIANI ,  Harm Jan Willem BELT ,  Sebatianus Adrianus GOORDEN ,  Irwan Dani SETIJA ,  Simon Reinald HUISMAN ,  Henricus Petrus Maria PELLEMANS

IPC: G03F7/00

CPC classification number: G03F7/706845 ,  G03F7/70633 ,  G03F7/70641 ,  G03F7/706839

Abstract: A method for measuring a parameter of interest from a target and associated apparatuses. The method includes obtaining measurement acquisition data relating to measurement of the target and finite-size effect correction data and/or a trained model operable to correct for at least finite-size effects in the measurement acquisition data. At least finite-size effects in the measurement acquisition data is corrected for using the finite-size effect correction data and/or the trained model to obtain corrected measurement data and/or obtain a parameter of interest; and where the correcting does not directly determine the parameter of interest, determining the parameter of interest from the corrected measurement data.

公开(公告)号：US20220397832A1

公开(公告)日：2022-12-15

申请号：US17773384

申请日：2020-10-19

Applicant: ASML Netherlands B.V.

Inventor： Filippo ALPEGGIANI ,  Henricus Petrus Maria PELLEMANS ,  Sebastianus Adrianus GOORDEN ,  Simon Reinald HUISMAN

IPC: G03F9/00 ,  G03F7/20

Abstract: Disclosed is a method of metrology such as alignment metrology. The method comprises obtaining pupil plane measurement dataset at a pupil plane relating to scattered radiation resultant from a measurement of a structure. The method comprises determining a measurement value or correction therefor using the pupil plane measurement dataset and a sensor term relating to sensor optics used to perform said measurement.

公开(公告)号：US20220100109A1

公开(公告)日：2022-03-31

申请号：US17415682

申请日：2019-12-12

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY ,  Franciscus BIJNEN ,  Alessandro POLO ,  Kirill Urievich SOBOLEV ,  Simon Reinald HUISMAN ,  Justin Lloyd KREUZER

IPC: G03F9/00 ,  G02B26/08

Abstract: An apparatus for and method of determining the alignment of a substrate in which a multiple alignment marks are simultaneously illuminated with spatially coherent radiation and the light from the illuminated marks is collected in parallel to obtain information on the positions of the marks and distortions within the marks.

公开(公告)号：US20220057718A1

公开(公告)日：2022-02-24

申请号：US17415671

申请日：2019-11-19

Applicant: ASML Netherlands B.V.

Inventor： Sebastianus Adrianus GOORDEN ,  Simon Reinald HUISMAN ,  Sergei SOKOLOV

IPC: G03F7/20 ,  G02B21/06 ,  G02B6/42

Abstract: Disclosed is an illumination system for delivering incoherent radiation to a metrology sensor system. Also disclosed is an associated metrology system and method. The illumination system comprises a spatial filter system for selective spatial filtering of a beam of said incoherent radiation outside of a module housing of the metrology sensor system. At least one optical guide is provided for guiding the spatially filtered beam of incoherent radiation to the metrology sensor system, the at least one optical guide being such that the radiation guided has a substantially similar output angle as input angle.

公开(公告)号：US20210382404A1

公开(公告)日：2021-12-09

申请号：US17284009

申请日：2019-09-24

Applicant: ASML Netherlands B.V.

Inventor： Simon Reinald HUISMAN

IPC: G03F9/00 ,  G02B6/02

Abstract: A detection system for an alignment sensor, and an alignment sensor and lithographic projection apparatus comprising such a detection system is disclosed. The detection system comprises at least one detection circuit; and a plurality of optical fiber cores for transporting a measurement signal to the at least one detection circuit. At least as subset of the plurality of optical fiber cores are selectively switchable between a detection state and a non-detection state, thereby defining a configurable detection spot.

公开(公告)号：US20210072652A1

公开(公告)日：2021-03-11

申请号：US17044674

申请日：2019-03-13

Applicant: ASML Netherlands B.V.

Inventor： Simon Reinald HUISMAN ,  Marinus Petrus REIJNDERS

IPC: G03F9/00 ,  G03F7/20

Abstract: The invention provides a level sensor to measure a position of a surface of a substrate, comprising a projection unit arranged to direct a beam of radiation to the surface of the substrate and a detection unit. The detection unit comprises a detection grating arranged to receive the beam of radiation reflected on the surface of the substrate, one or more detectors, one or more optical elements to direct the beam of radiation from the detection grating to the one or more detectors, and a processing unit to determine the position of the surface of the substrate on the basis of the beam of radiation received by the one or more detectors. The detection grating and the one or more optical elements are integrated in a single integrated optical element.

公开(公告)号：US20190049866A1

公开(公告)日：2019-02-14

申请号：US16069678

申请日：2017-01-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Simon Reinald HUISMAN ,  Alessandro POLO ,  Duygu AKBULUT ,  Sebastianus Adrianus GOORDEN ,  Arie Jeffrey DEN BOEF

IPC: G03F9/00 ,  G01B9/02 ,  G01D5/26

Abstract: In an alignment sensor of a lithographic apparatus, position sensing radiation is delivered to a target (P1). After reflection or diffraction from the target, position sensing radiation is processed to determine a position of the target. Reference radiation interferes with the position sensing radiation) while a relative phase modulation is applied between the reference radiation and the position sensing radiation. The interfering radiation includes a time-varying component defined by the applied phase modulation. The interfering radiation is delivered to two photodetectors in such a way that each photodetector receives said time-varying component in anti-phase to that received at the other photodetector. A difference signal (i(t)) from said photodetectors contains an amplified, low noise version of said time-varying component. This is used in determining the position of the target. Mode matching enhances interference. Surface scattered radiation is rejected.

公开(公告)号：US20250147429A1

公开(公告)日：2025-05-08

申请号：US18693337

申请日：2022-09-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Sebastianus Adrianus GOORDEN ,  Simon Reinald HUISMAN ,  Simon Gijsbert Josephus MATHIJSSEN

IPC: G03F7/00 ,  G03F9/00

Abstract: A method for determining a measurement setting for measuring a parameter of interest from a target structure on a substrate. The method includes: obtaining first position difference data describing a difference between a position of a first representative target structure position and a position of one or more first features relating to product structure; obtaining optical metrology data relating to optical measurements of the target structure and further relating to a plurality of different measurement settings; and determining the measurement setting from the first position difference data and the optical metrology data such that a measured feature position value obtained from an optical measurement of the target structure using the determined measurement setting is better correlated to a position of the one or more first features.

公开(公告)号：US20230341785A1

公开(公告)日：2023-10-26

申请号：US18002258

申请日：2021-06-07

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Simon Reinald HUISMAN ,  Sergey MALYK ,  Yuxiang LIN ,  Daan Maurits SLOTBOOM

IPC: G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70625 ,  G03F9/7088 ,  G03F7/705

Abstract: A system includes an illumination system, an optical element, a switching element and a detector. The illumination system includes a broadband light source that generates a beam of radiation. The dispersive optical element receives the beam of radiation and generates a plurality of light beams having a narrower bandwidth than the broadband light source. The optical switch receives the plurality of light beams and transmits each one of the plurality of light beams to a respective one of a plurality of alignment sensor of a sensor array. The detector receives radiation returning from the sensor array and to generate a measurement signal based on the received radiation.