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公开(公告)号：US10372045B2
公开(公告)日：2019-08-06
申请号：US14428287
申请日：2013-08-26
Applicant: ASML Netherlands B.V.
Inventor： Johannes Antonius Gerardus Akkermans , Bas Pieter Lemmen , Sjoerd Martijn Huiberts , Joeri Lof , Petrus Theodorus Rutgers , Sven Antoin Johan Hol , Harmeet Singh , Peter Michel Silvester Maria Heijmans
IPC: G03F7/20 , H01F7/08 , H01F7/16 , H02P25/08 , H02P6/16 , H02P25/06 , H02K41/025 , H02P25/034 , G03F7/22 , H02K11/00 , H02K41/03
Abstract: A reluctance actuator assembly comprising a reluctance actuator, a flux sensor to measure a magnetic flux in a gap of the reluctance actuator, and a flux amplifier to drive an actuator coil of the reluctance actuator based on a flux set point and the flux measured by the flux sensor. A method comprising providing to the flux amplifier a flux setpoint, the flux setpoint comprising a time constant component and a sinusoidally varying component at an excitation frequency, measuring a force generated by the reluctance actuator in response to the flux setpoint, and calibrating the reluctance actuator assembly from the measured force.
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公开(公告)号：US09494869B2
公开(公告)日：2016-11-15
申请号：US14357530
申请日：2012-12-05
Applicant: ASML Netherlands B.V.
Inventor： Hans Butler , Arno Jan Bleeker , Pieter Renaat Maria Hennus , Martinus Hendricus Henricus Hoeks , Sven Antoin Johan Hol , Harmen Klaas Van Der Schoot , Bernardus Antonius Slaghekke , Patricius Aloysius Jacobus Tinnemans , Marc Wilhelmus Maria Van Der Wijst , Koen Jacobus Johannes Maria Zaal , Theodorus Petrus Maria Cadee , Ruud Antonius Catharina Maria Beerens , Olof Martinus Josephus Fischer , Wilhelmus Henricus Theodorus Maria Aangenent , Niels Johannes Maria Bosch
CPC classification number: G03F7/70258 , G03F7/70275 , G03F7/70366 , G03F7/70391 , G03F7/704 , G03F7/70558 , G03F7/70816 , G03F7/709
Abstract: An exposure apparatus including a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least rotatable around an axis; and an actuator system configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame.
Abstract translation: 一种曝光装置，包括：投影系统，被配置为将多个辐射束投影到目标上; 至少可绕轴旋转的可移动框架; 以及致动器系统，其构造成将可移动框架移动到远离与可移动框架的几何中心对应的轴线的轴线上，并使框架围绕通过框架的质心的轴线旋转。
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公开(公告)号：US09927711B2
公开(公告)日：2018-03-27
申请号：US15105343
申请日：2014-12-02
Applicant: ASML Netherlands B.V.
Inventor： Sven Antoin Johan Hol , Andrea Lodovico Mancuso , Hendricus Johannes Maria Meijer , Erik Maria Rekkers , Marinus Johannes Maria Van Dam
IPC: G03F7/20
CPC classification number: G03F7/70191 , G03F7/70758 , G03F7/70825 , G03F7/70941
Abstract: An actuator to displace, for example a mirror, provides movement with at least two degrees of freedom by varying the currents in two electromagnets (370). A moving part includes a permanent magnet (362) with a magnetic face constrained to move over a working area lying substantially in a first plane perpendicular to a direction of magnetization of the magnet. The electromagnets have pole faces lying substantially in a second plane closely parallel to the first plane, each pole face substantially filling a quadrant of the area traversed by the face of the moving magnet. A ferromagnetic shield (820) is provided around the moving part and has at least one interruption (822) to reduce the influence of adjacent actuators or stray fields while also minimizing attraction between the permanent magnet (362) and the shield (820).
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Patent Agency Ranking
14.发明授权公开(公告)号：US09785051B2
公开(公告)日：2017-10-10
申请号：US14435450
申请日：2013-09-17
Applicant: ASML Netherlands B.V.
Inventor： Jan Bernard Plechelmus Van Schoot , Sven Antoin Johan Hol , Edwin Johan Buis , Erik Maria Rekkers , Gosse Charles De Vries , Hako Botma , Marinus Johannes Maria Van Dam , Ramon Pascal Van Gorkom
CPC classification number: G03F7/70091 , G01C9/06 , G01C2009/066 , G02B7/1821 , G03F7/70116 , H01F7/0231 , H01F7/206 , H01H2051/2218 , H02K41/00
Abstract: An actuator to displace, for example a mirror, provides movement with at least two degrees of freedom by varying the currents in two electromagnets. A moving part includes a permanent magnet with a magnetic face constrained to move over a working area lying substantially in a first plane perpendicular to a direction of magnetization of the magnet. The electromagnets have pole faces lying substantially in a second plane closely parallel to the first plane, each pole face substantially filling a quadrant of the area traversed by the face of the moving magnet. An optical position sensor may direct a beam of radiation at the moving magnet through a central space between the electromagnets. The sizes of facets in a pupil mirror device may be made smaller in a peripheral region, but larger in a central region, thereby relaxing focusing requirements.
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15.发明申请Actuation Mechanism, Optical Apparatus, Lithography Apparatus and Method of Manufacturing Devices 有权激光机构，光学装置，平版印刷装置和制造装置的方法公开(公告)号：US20150261093A1
公开(公告)日：2015-09-17
申请号：US14435315
申请日：2013-09-17
Applicant: ASML NETHERLANDS B.V.
CPC classification number: G03F7/70833 , G02B5/0891 , G02B7/1828 , G02B19/0023 , G02B26/0816 , G03F7/70116 , G03F7/7015 , G03F7/70825 , H01F7/0205 , H02K11/40 , H02K16/00 , H02K41/0352 , H02K41/0356 , H02K49/10
Abstract: An EUV optical apparatus includes a number of adjustable mirrors (22x) on mirror bodies (120). Each mirror body is supported on an actuator (100x) comprising a moving part (132, 134, 136) and a fixed casing part (128, 130). The actuator provides a resilient support (140, 142) for the mirror body so that it is tiltable with two degrees relative to the casing. An electromagnetic motor (166, 170-178) applies first part, under the influence of an applied motive force, the resilient mounting being arranged to provide a biasing force that resists said motive force. A magnetic coupling (102, 104a, 104b) is arranged between the moving and fixed parts so as to provide a counter-biasing force. The counter-biasing force partly opposes said biasing force and thereby reduces the motive force required to effect a given displacement. The actuator can thus be made with reduced size, weight and heat dissipation.
Abstract translation: EUV光学装置包括在镜体（120）上的多个可调镜（22x）。 每个镜体支撑在包括移动部件（132,134,136）和固定壳体部件（128,130）的致动器（100x）上。 致动器提供用于镜体的弹性支撑件（140,142），使得其相对于壳体可倾斜两度。 电磁马达（166,170-178）在施加的动力的作用下施加第一部分，所述弹性安装件设置成提供抵抗所述动力的偏置力。 磁性联轴器（102,104a，104b）设置在运动部件和固定部件之间，以提供反作用力。 反作用力部分地与所述偏压力相反，从而减小了实现给定位移所需的动力。 致动器因此可以减小尺寸，重量和散热。
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公开(公告)号：US11315752B2
公开(公告)日：2022-04-26
申请号：US17118456
申请日：2020-12-10
Applicant: ASML Netherlands B.V.
Inventor： Peter Paul Hempenius , Sven Antoin Johan Hol , Maarten Frans Janus Kremers , Henricus Martinus Johannes Van De Groes , Niels Johannes Maria Bosch , Marcel Koenraad Marie Baggen
IPC: H01J37/20 , H01J37/09 , H01J37/317
Abstract: An e-beam apparatus is disclosed, the tool comprising an electron optics system configured to project an e-beam onto an object, an object table to hold the object, and a positioning device configured to move the object table relative to the electron optics system. The positioning device comprises a short stroke stage configured to move the object table relative to the electron optics system and a long stroke stage configured to move the short stroke stage relative to the electron optics system. The e-beam apparatus further comprises a magnetic shield to shield the electron optics system from a magnetic disturbance generated by the positioning device. The magnetic shield may be arranged between the positioning device and the electron optics system.
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17.发明授权公开(公告)号：US09494878B2
公开(公告)日：2016-11-15
申请号：US14435315
申请日：2013-09-17
Applicant: ASML Netherlands B.V.
IPC: G03F7/20 , H02K41/035 , H02K16/00 , G02B7/182 , G02B26/08 , H01F7/02 , H02K49/10 , G02B5/08 , G02B19/00
CPC classification number: G03F7/70833 , G02B5/0891 , G02B7/1828 , G02B19/0023 , G02B26/0816 , G03F7/70116 , G03F7/7015 , G03F7/70825 , H01F7/0205 , H02K11/40 , H02K16/00 , H02K41/0352 , H02K41/0356 , H02K49/10
Abstract: An EUV optical apparatus includes a number of adjustable mirrors (22x) on mirror bodies (120). Each mirror body is supported on an actuator (100x) comprising a moving part (132, 134, 136) and a fixed casing part (128, 130). The actuator provides a resilient support (140, 142) for the mirror body so that it is tiltable with two degrees relative to the casing. An electromagnetic motor (166, 170-178) applies first part, under the influence of an applied motive force, the resilient mounting being arranged to provide a biasing force that resists said motive force. A magnetic coupling (102, 104a, 104b) is arranged between the moving and fixed parts so as to provide a counter-biasing force. The counter-biasing force partly opposes said biasing force and thereby reduces the motive force required to effect a given displacement. The actuator can thus be made with reduced size, weight and heat dissipation.
Abstract translation: EUV光学装置包括在镜体（120）上的多个可调镜（22x）。 每个镜体支撑在包括移动部件（132,134,136）和固定壳体部件（128,130）的致动器（100x）上。 致动器提供用于镜体的弹性支撑件（140,142），使得其相对于壳体可倾斜两度。 电磁马达（166,170-178）在施加的动力的作用下施加第一部分，所述弹性安装件设置成提供抵抗所述动力的偏置力。 磁性联轴器（102,104a，104b）设置在运动部件和固定部件之间，以提供反作用力。 反作用力部分地与所述偏压力相反，从而减小了实现给定位移所需的动力。 致动器因此可以减小尺寸，重量和散热。
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公开(公告)号：US20150205210A1
公开(公告)日：2015-07-23
申请号：US14413667
申请日：2013-05-15
Applicant: ASML NETHERLANDS B.V.
CPC classification number: G03F7/70833 , F16C32/0459 , G03F7/70058 , G03F7/704 , G03F7/70816
Abstract: A support for a movable element includes a stator element, a gravity compensator field inducing element mounted on the stator element, the gravity compensator field inducing element configured to apply a translational force to the movable element by controlling a magnetic field in a gap between the stator element and the movable element, and a plurality of torque compensator field inducing elements mounted on the stator element, the torque compensator field inducing elements configured to apply a torque to the movable element by controlling a magnetic field in the gap between the stator element and the movable element, the torque being about a first axis substantially perpendicular to the direction of the translational force applied by the gravity compensator field inducing element.
Abstract translation: 可移动元件的支撑件包括定子元件，安装在定子元件上的重力补偿器场感应元件，重力补偿器场引发元件被配置为通过控制定子之间的间隙中的磁场向可移动元件施加平移力 元件和可移动元件以及安装在定子元件上的多个扭矩补偿器场诱导元件，扭矩补偿器场诱导元件被配置为通过控制定子元件和定子元件之间的间隙中的磁场向可移动元件施加扭矩 所述扭矩大约是基本上垂直于由重力补偿器场诱导元件施加的平移力的方向的第一轴线。
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