公开(公告)号：EP4553885A1

公开(公告)日：2025-05-14

申请号：EP23208804.7

申请日：2023-11-09

Applicant: ASML Netherlands B.V.

Inventor： VAN SOEST, Jurgen

IPC: H01J37/07 ,  H01J37/06 ,  H01J37/18

Abstract: The present disclosure relates to a charged particle source and related apparatus and methods. In one arrangement, the source comprises a first emitter element configured to emit assessment charged particles, an extractor configured to accelerate the emitted assessment charged particles towards a sample, and one or more second emitter elements configured to emit cleaning charged particles. The source is configured to cause the cleaning charged particles to impinge intermittently on a target surface during a corresponding plurality of cleaning periods.

公开(公告)号：EP4213176A1

公开(公告)日：2023-07-19

申请号：EP22151364.1

申请日：2022-01-13

Applicant: ASML Netherlands B.V.

Inventor： VAN SOEST, Jurgen ,  KUIPER, Vincent, Sylvester ,  LI, Yinglong

IPC: H01J37/244 ,  H01J37/28

Abstract: A charged particle assessment apparatus comprising: a charged particle beam device; an actuated sample stage; a hot component and a thermal compensator. The actuated sample stage is configured to hold a sample. The hot component is configured to operate such that, during operation, heat is radiated toward a sample held on the sample holder. The hot component is smaller than the sample. The thermal compensator is configured to heat the sample so as to reduce thermal gradients therein.

公开(公告)号：EP4199033A1

公开(公告)日：2023-06-21

申请号：EP21216074.1

申请日：2021-12-20

Applicant: ASML Netherlands B.V.

Inventor： VAN SOEST, Jurgen ,  WIELAND, Marco, Jan-Jaco ,  KUIPER, Vincent, Sylvester

IPC: H01J37/28 ,  H01J37/302 ,  H01J37/317

Abstract: Methods of processing a sample and charged particle assessment systems are disclosed. In one arrangement, a sample is processed using a multi-beam of sub-beams of charged particles. At least a portion of a sub-beam processable area is processed with each sub-beam. The sub-beam processable area comprising an array of sections having rows of sections and columns of sections. Each row of sections defines an elongate region that is substantially equal to or smaller than a pitch at the sample surface of the sub-beams in the multi-beam. A plurality of the sections are processed.

公开(公告)号：EP4182960A1

公开(公告)日：2023-05-24

申请号：EP21745778.7

申请日：2021-07-15

Applicant: ASML Netherlands B.V.

Inventor： VAN SOEST, Jurgen

IPC: H01J37/075 ,  H01J3/02 ,  H01J37/073 ,  H01J1/14 ,  H01J1/304

公开(公告)号：EP4020517A1

公开(公告)日：2022-06-29

申请号：EP20216933.0

申请日：2020-12-23

Applicant: ASML Netherlands B.V.

Inventor： STEENBRINK, Stijn, Wilem, Herman, Karel ,  KONING, Johan, Joost ,  VAN SOEST, Jurgen ,  WIELAND, Marco, Jan-Jaco

IPC: H01J37/12 ,  H01J37/28

Abstract: Disclosed herein is an electron-optical device, a lens assembly and an electron-optical column. The electron-optical device comprises an array substrate and an adjoining substrate and is configured to provide a potential difference between the substrates. An array of apertures is defined in each of the substrates for the path of electron beamlets. The array substrate has a thickness which is stepped so that the array substrate is thinner in the region corresponding to the array of apertures than another region of the array substrate.

公开(公告)号：EP3610493A1

公开(公告)日：2020-02-19

申请号：EP18784630.8

申请日：2018-04-10

Applicant: ASML Netherlands B.V.

Inventor： DINU-GÜRTLER, Laura ,  HOGERVORST, Eric Petrus ,  VAN SOEST, Jurgen

IPC: H01J1/88 ,  H01J37/065

公开(公告)号：EP3971941A1

公开(公告)日：2022-03-23

申请号：EP20196493.9

申请日：2020-09-16

Applicant: ASML Netherlands B.V.

Inventor： VAN DER KROON, Boudewijn, Weijert, Herman, Jan ,  VAN SOEST, Jurgen

IPC: H01J37/248 ,  H01R13/53

Abstract: Disclosed herein is a connector 401 for electrically connecting a feedthrough 411 of a vacuum tool to a high voltage power source, the connector comprising: a connector wire assembly 405+406 configured to be in electrical connection with a high voltage power source; and a connector insulator 402 comprising a channel 407 configured to extend into the connector insulator and to receive a feedthrough pin 408 so as to electrically connect the connector wire assembly with the feedthrough pin; wherein the connector insulator is configured to engage with the feedthrough so that a boundary surface of the connector insulator extends substantially bi-directionally in the direction of the longitudinal axis of the channel.

公开(公告)号：EP3899665A1

公开(公告)日：2021-10-27

申请号：EP19828649.4

申请日：2019-12-16

Applicant: ASML Netherlands B.V.

Inventor： VAN DER TOORN, Jan-Gerard, Cornelis ,  HUINCK, Jeroen, Gertruda, Antonius ,  SEVERT, Han, Willem, Hendrik ,  KOOIKER, Allard, Eelco ,  RONDE, Michaël, Johannes, Christiaan ,  WELLINK, Arno, Maria ,  LIU, Shibing ,  LUO, Ying ,  WANG, Yixiang ,  CHEN, Chia-Yao ,  ZHU, Bohang ,  VAN SOEST, Jurgen

IPC: G03F7/20 ,  H01J37/00 ,  H01J37/20

公开(公告)号：EP3886138A1

公开(公告)日：2021-09-29

申请号：EP20165312.8

申请日：2020-03-24

Applicant: ASML Netherlands B.V.

Inventor： VAN SOEST, Jurgen ,  BERGLUND, Gun Sara Mari ,  HUANG FOEN CHUNG, Robert Wong Joek Meu ,  MARTINEZ NEGRETE GASQUE, Diego ,  DINU GURTLER, Laura

IPC: H01J37/02 ,  H01J37/28

Abstract: A flood column for charged particle flooding of a sample, the flood column comprising a charged particle source configured to emit a charged particle beam along a beam path; a source lens arranged down-beam of the charged particle source; a condenser lens arranged down-beam of the source lens; and an aperture body arranged down-beam of the condenser lens, wherein the aperture body is for passing a portion of the charged particle beam; and wherein the source lens is controllable so as to variably set the beam angle of the charged particle beam down-beam of the source lens.

公开(公告)号：EP4453991A1

公开(公告)日：2024-10-30

申请号：EP22818432.1

申请日：2022-11-21

Applicant: ASML Netherlands B.V.

Inventor： VAN SOEST, Jurgen ,  WIELAND, Marco, Jan-Jaco ,  KUIPER, Vincent, Sylvester

IPC: H01J37/28 ,  H01J37/302 ,  H01J37/317