公开(公告)号：US20210003924A1

公开(公告)日：2021-01-07

申请号：US17022910

申请日：2020-09-16

Applicant: ASML Netherlands B.V.

Inventor： Patricius Aloysius Jacobus TINNEMANS ,  Arie Jeffrey DEN BOEF ,  Armand Eugene Albert KOOLEN ,  Nitesh PANDEY ,  Vasco Tomas TENNER ,  Willem Marie Julia Marcel COENE ,  Patrick WARNAAR

IPC: G03F7/20 ,  G01B11/06 ,  G01B11/02 ,  G01N21/47 ,  G01N21/95 ,  G03F9/00

Abstract: Described is a metrology system for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology system comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.

公开(公告)号：US20190391498A1

公开(公告)日：2019-12-26

申请号：US16561096

申请日：2019-09-05

Applicant: ASML Netherlands B.V.

Inventor： Scott Anderson MIDDLEBROOKS ,  Markus Gerardus Martinus Maria VAN KRAAIJ ,  Adrianus Cornelis Matheus KOOPMAN ,  Stefan HUNSCHE ,  Willem Marie Julia Marcel COENE

IPC: G03F7/20 ,  G06T7/60 ,  G06T7/12

Abstract: A method and apparatus of detection, registration and quantification of an image. The method may include obtaining an image of a lithographically created structure, and applying a level set method to an object, representing the structure, of the image to create a mathematical representation of the structure. The method may include obtaining a first dataset representative of a reference image object of a structure at a nominal condition of a parameter, and obtaining second dataset representative of a template image object of the structure at a non-nominal condition of the parameter. The method may further include obtaining a deformation field representative of changes between the first dataset and the second dataset. The deformation field may be generated by transforming the second dataset to project the template image object onto the reference image object. A dependence relationship between the deformation field and change in the parameter may be obtained.

公开(公告)号：US20250014164A1

公开(公告)日：2025-01-09

申请号：US18893626

申请日：2024-09-23

Applicant: ASML Netherlands B.V.

Inventor： Vasco Tomas TENNER ,  Willem Marie Julia Marcel COENE

IPC: G06T7/00 ,  G01N21/88 ,  G01N21/956 ,  G03F7/00

Abstract: Disclosed is a method of determining a complex-valued field relating to a structure, comprising: obtaining image data relating to a series of images of the structure, for which at least one measurement parameter is varied over the series and obtaining a trained network operable to map a series of images to a corresponding complex-valued field. The method comprises inputting the image data into said trained network and non-iteratively determining the complex-valued field relating to the structure as the output of the trained network. A method of training the trained network is also disclosed.

公开(公告)号：US20240319620A1

公开(公告)日：2024-09-26

申请号：US18650790

申请日：2024-04-30

Applicant: ASML Netherlands B.V.

Inventor： Patricius Aloysius Jacobus TINNEMANS ,  Arie Jeffrey DEN BOEF ,  Armand Eugene Albert KOOLEN ,  Nitesh PANDEY ,  Vasco Tomas TENNER ,  Willem Marie Julia Marcel COENE ,  Patrick WARNAAR

IPC: G03F7/00 ,  G01B11/02 ,  G01B11/06 ,  G01N21/47 ,  G01N21/95 ,  G03F9/00

CPC classification number: G03F7/7085 ,  G01B11/02 ,  G01B11/0625 ,  G01N21/4788 ,  G01N21/9501 ,  G03F7/70158 ,  G03F7/705 ,  G03F7/70625 ,  G03F7/70633 ,  G03F9/7088 ,  G01B2210/56

Abstract: Described is a metrology system for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology system comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.

公开(公告)号：US20200348244A1

公开(公告)日：2020-11-05

申请号：US16963905

申请日：2019-01-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Nitish KUMAR ,  Richard QUINTANILHA ,  Markus Gerardus Martinus Maria VAN KRAAIJ ,  Konstantin TSIGUTKIN ,  Willem Marie Julia Marcel COENE

IPC: G01N21/956 ,  G02F1/35 ,  G03F1/84

Abstract: A method of inspection for defects on a substrate, such as a reflective reticle substrate, and associated apparatuses. The method includes performing the inspection using inspection radiation obtained from a high harmonic generation source and having one or more wavelengths within a wavelength range of between 20 nm and 150 nm. Also, a method including performing a coarse inspection using first inspection radiation having one or more first wavelengths within a first wavelength range; and performing a fine inspection using second inspection radiation having one or more second wavelengths within a second wavelength range, the second wavelength range comprising wavelengths shorter than the first wavelength range.

公开(公告)号：US20180149987A1

公开(公告)日：2018-05-31

申请号：US15575069

申请日：2016-03-14

Applicant: ASML Netherlands B.V.

Inventor： Simon Gijsbert Josephus MATHIJSSEN ,  Arie Jeffrey DEN BOEF ,  Alessandro POLO ,  Patricius Aloysius Jacobus TINNEMANS ,  Adrianus Johannes Hendrikus SCHELLEKENS ,  Elahe YEGANEGI DASTGERDI ,  Willem Marie Julia Marcel COENE ,  Erik Willem BOGAART ,  Simon Reinald HUISMAN

IPC: G03F9/00 ,  G03F7/20

Abstract: An alignment system, method and lithographic apparatus are provided for determining the position of an alignment mark, the alignment system comprising a first system configured to produce two overlapping images of the alignment mark that are rotated by around 180 degrees with respect to one another, and a second system configured to determine the position of the alignment mark from a spatial distribution of an intensity of the two overlapping images.

公开(公告)号：US20170336713A1

公开(公告)日：2017-11-23

申请号：US15533309

申请日：2015-11-13

Applicant: ASML Netherlands B.V.

Inventor： Scott Anderson MIDDLEBROOKS ,  Markus Gerardus Martinus Maria VAN KRAAJI ,  Adrianus Cornelis Matheus KOOPMAN ,  Stefan HUNSCHE ,  Willem Marie Julia Marcel COENE

IPC: G03F7/20 ,  G06T7/12 ,  G06T7/60

CPC classification number: G03F7/705 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/7065 ,  G06T7/12 ,  G06T7/149 ,  G06T7/60 ,  G06T2207/10061 ,  G06T2207/20161 ,  G06T2207/30148

Abstract: A method and apparatus of detection, registration and quantification of an image. The method may include obtaining an image of a lithographically created structure, and applying a level set method to an object, representing the structure, of the image to create a mathematical representation of the structure. The method may include obtaining a first dataset representative of a reference image object of a structure at a nominal condition of a parameter, and obtaining second dataset representative of a template image object of the structure at a non-nominal condition of the parameter. The method may further include obtaining a deformation field representative of changes between the first dataset and the second dataset. The deformation field may be generated by transforming the second dataset to project the template image object onto the reference image object. A dependence relationship between the deformation field and change in the parameter may be obtained.

公开(公告)号：US20150331336A1

公开(公告)日：2015-11-19

申请号：US14710443

申请日：2015-05-12

Applicant: ASML Netherlands B.V.

Inventor： Richard QUINTANILHA ,  Willem Marie Julia Marcel COENE

IPC: G03F7/20

CPC classification number: G03F7/70633 ,  G03F7/70683

Abstract: A pattern from a patterning device is applied to a substrate by a lithographic apparatus. The applied pattern includes product features and metrology targets. The metrology targets include large targets which are for measuring overlay using X-ray scattering and small targets which are for measuring overlay by diffraction of visible radiation. Some of the smaller targets are distributed at locations between the larger targets, while other small targets are placed at the same locations as a large target. By comparing values measured using a small target and large target at the same location, parameter values measured using all the small targets can be corrected for better accuracy. The large targets can be located primarily within scribe lanes while the small targets are distributed within product areas.

Abstract translation: 来自图案形成装置的图案通过光刻装置施加到基板。 应用模式包括产品功能和计量目标。 测量目标包括用于使用X射线散射测量覆盖物的大目标和用于通过可见光辐射衍射测量覆盖物的小目标。 一些较小的目标分布在较大目标之间的位置，而其他小目标则放置在与大目标相同的位置。 通过比较在相同位置使用小目标和大目标测量的值，可以校正使用所有小目标测量的参数值以获得更高的精度。 大型目标主要位于划线范围内，而小目标则分布在产品区域内。