公开(公告)号：US20250067768A1

公开(公告)日：2025-02-27

申请号：US18724551

申请日：2022-12-22

Applicant: ASML Netherlands B.V.

Inventor： Mustafa Ümit ARABUL ,  Zili ZHOU ,  Nitesh PANDEY ,  Coen Adrianus VERSCHUREN ,  Willem Marie Julia Marcel COENE ,  Gerard Jan VERBIEST ,  Peter Gerard STEENEKEN ,  Martin Pierre ROBIN

IPC: G01Q10/04 ,  G01Q60/32 ,  G01Q70/14 ,  G03F7/00

Abstract: The disclosure relates to determining information about a target structure formed on a substrate using a lithographic process. In one arrangement, a cantilever probe is provided having a cantilever arm and a probe element. The probe element extends from the cantilever arm towards the target structure. Ultrasonic waves are generated in the cantilever probe. The ultrasonic waves propagate through the probe element into the target structure and reflect back from the target structure into the probe element or into a further probe element extending from the cantilever arm. The reflected ultrasonic waves are detected and used to determine information about the target structure.

公开(公告)号：US20220299888A1

公开(公告)日：2022-09-22

申请号：US17619961

申请日：2020-05-14

Applicant: ASML Netherlands B.V.

Inventor： Alexander Prasetya KONIJNENBERG ,  Willem Marie Julia Marcel COENE ,  Nitesh PANDEY

IPC: G03F7/20 ,  G01B9/02 ,  G01N21/95 ,  G06V10/42

Abstract: Disclosed is a method of determining a complex-valued field relating to a sample measured using an imaging system. The method comprises obtaining image data relating to a series of images of the sample, imaged at an image plane of the imaging system, and for which at least two different modulation functions are imposed in a Fourier plane of the imaging system; and determining the complex-valued field from the imaging data based on the imposed modulation functions.

公开(公告)号：US20230044632A1

公开(公告)日：2023-02-09

申请号：US17787244

申请日：2020-10-21

Applicant: ASML Netherlands B.V.

Inventor： Willem Marie Julia Marcel COENE ,  Arie Jeffrey DEN BOEF ,  Vasco Tomas TENNER ,  Nitesh PANDEY ,  Christos MESSINIS ,  Johannes Fitzgerald DE BOER

IPC: G03H1/08 ,  G03H1/26

Abstract: A dark field digital holographic microscope is disclosed which is configured to determine a characteristic of interest of a structure. The dark field digital holographic microscope comprises an illumination device configured to provide at least: a first beam pair comprising a first illumination beam of radiation (1010) and a first reference beam of radiation (1030) and a second beam pair comprising a second illumination beam of radiation (1020) and a second reference beam of radiation (1040); and one or more optical elements (1070) operable to capture a first scattered radiation and to capture a second scattered radiation scattered by the structure resultant from the first and second illumination beams respectively. The beams of the first beam pair are mutually coherent and the beams of the second beam pair are mutually coherent. The illumination device is configured to impose incoherence (ADI) between the first beam pair and second beam pair.

公开(公告)号：US20220309645A1

公开(公告)日：2022-09-29

申请号：US17618306

申请日：2020-05-08

Applicant: ASML Netherlands B.V.

Inventor： Vasco Tomas TENNER ,  Willem Marie Julia Marcel COENE

IPC: G06T7/00 ,  G01N21/88 ,  G01N21/956 ,  G03F7/20

Abstract: Disclosed is a method of determining a complex-valued field relating to a structure, comprising: obtaining image data relating to a series of images of the structure, for which at least one measurement parameter is varied over the series and obtaining a trained network operable to map a series of images to a corresponding complex-valued field. The method comprises inputting the image data into said trained network and non-iteratively determining the complex-valued field relating to the structure as the output of the trained network. A method of training the trained network is also disclosed.

公开(公告)号：US20200072761A1

公开(公告)日：2020-03-05

申请号：US16490091

申请日：2018-03-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Adrianus Cornelis Matheus KOOPMAN ,  Scott Anderson MIDDLEBROOKS ,  Willem Marie Julia Marcel COENE

IPC: G01N21/956 ,  G03F7/20 ,  G06F17/50

Abstract: A method including selecting a shaped feature from a set of shaped features, each shaped feature of the set of shaped features having a set of points on a perimeter of the shape of the shaped feature, creating a plurality of shape context descriptors for the selected shaped feature, wherein each shape context descriptor provides an indication of a location in a shape context descriptor framework of a first focus point of the set of points in relation to a second point of the set of points, and identifying a shaped feature from the set of shaped features having a same or similar shape as the selected shaped feature based on data from the plurality of shape context descriptors.

公开(公告)号：US20250138436A1

公开(公告)日：2025-05-01

申请号：US18690961

申请日：2022-08-16

Applicant: ASML Netherlands B.V.

Inventor： Armand Eugene Albert KOOLEN ,  Willem Marie Julia Marcel COENE ,  Alexander Prasetya KONIJNENBERG ,  Teunis Willem TUKKER ,  Arie Jeffrey DEN BOEF

IPC: G03F7/00 ,  G06T5/10

Abstract: Disclosed is a metrology method and associated devices. The method comprises obtaining a first image, said first image being subject to one or more non-isoplanatic aberrations of an optical system used to capture said image; and non-iteratively correcting said first image for the effect of said one or more non-isoplanatic aberrations by performing one or both of: a field non-isoplanatic correction operation in field space for said first image, said field space corresponding to a field plane of the optical system; and a pupil non-isoplanatic correction operation in pupil space for said first image, said pupil space corresponding to a pupil plane of the optical system. Said one or more non-isoplanatic aberrations comprise a class of non-isoplanatic aberrations describable as a convolution combined with an object distortion and/or a pupil distortion.

公开(公告)号：US20230062585A1

公开(公告)日：2023-03-02

申请号：US17856213

申请日：2022-07-01

Applicant: ASML Netherlands B.V.

Inventor： Patricius Aloysius Jacobus TINNEMANS ,  Arie Jeffrey DEN BOEF ,  Armand Eugene Albert KOOLEN ,  Nitesh PANDEY ,  Vasco Tomas TENNER ,  Willem Marie Julia Marcel COENE ,  Patrick WARNAAR

IPC: G03F7/20 ,  G01B11/06 ,  G01B11/02 ,  G01N21/47 ,  G01N21/95 ,  G03F9/00

Abstract: Described is a metrology system for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology system comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.

公开(公告)号：US20170345138A1

公开(公告)日：2017-11-30

申请号：US15533614

申请日：2015-11-13

Applicant: ASML Netherlands B.V.

Inventor： Scott Anderson MIDDLEBROOKS ,  Markus Gerardus Martinus Maria VAN KRAAIJ ,  Maxim PISARENCO ,  Adrianus Cornelis Matheus KOOPMAN ,  Stefan HUNSCHE ,  Willem Marie Julia Marcel COENE

IPC: G06T7/00

CPC classification number: G06T7/001 ,  G03F7/705 ,  G03F7/70625 ,  G03F7/70633 ,  G06T2207/10061 ,  G06T2207/20068 ,  G06T2207/30148

Abstract: A method and apparatus of detection, registration and quantification of an image. The method may include obtaining an image of a lithographically created structure, and applying a level set method to an object, representing the structure, of the image to create a mathematical representation of the structure. The method may include obtaining a first dataset representative of a reference image object of a structure at a nominal condition of a parameter, and obtaining second dataset representative of a template image object of the structure at a non-nominal condition of the parameter. The method may further include obtaining a deformation field representative of changes between the first dataset and the second dataset. The deformation field may be generated by transforming the second dataset to project the template image object onto the reference image object. A dependence relationship between the deformation field and change in the parameter may be obtained.

公开(公告)号：US20170261428A1

公开(公告)日：2017-09-14

申请号：US15449367

申请日：2017-03-03

Applicant: ASML Netherlands B.V.

Inventor： Willem Marie Julia Marcel COENE ,  Alexander Prasetya Konijnenberg

IPC: G01N21/47 ,  G01N21/33 ,  G03F9/00

CPC classification number: G01N21/47 ,  G01N21/33 ,  G03F7/70625 ,  G03F7/70633 ,  G03F9/7092

Abstract: Disclosed is a method of obtaining data describing an object structure. The method comprising the steps of: (a) illuminating the object structure with illuminating radiation; (b) modulating the phase of the illuminating radiation after scattering by the object structure, the modulation comprising applying a first phase factor dependent upon at least one controllable parameter and an aberration function having a form of a subadditive function of a vector norm; (c) capturing a plurality of intensity patterns, wherein each intensity pattern corresponds to a unique value of the at least one controllable parameter; and (d) reconstructing the data describing the object structure based on the plurality of intensity patterns. Also disclosed are corresponding inspection and lithographic apparatuses, a method of manufacturing devices and a computer program.

公开(公告)号：US20240160151A1

公开(公告)日：2024-05-16

申请号：US18280459

申请日：2022-03-04

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N. V.

Inventor： Willem Marie Julia Marcel COENE ,  Vasco Tomas TENNER ,  Hugo Augustinus Joseph CRAMER ,  Arie Jeffrrey DEN BOEF ,  Wouter Dick KOEK ,  Sergei SOKOLOV ,  Jeroen Johan Maarten VAN DE WIJDEVEN ,  Alexander Kenneth RAUB

IPC: G03H1/04 ,  G01N21/95 ,  G02B21/10 ,  G02B21/36 ,  G03H1/00 ,  G03H1/02 ,  G03H1/08

CPC classification number: G03H1/0486 ,  G01N21/9501 ,  G02B21/10 ,  G02B21/365 ,  G03H1/0866 ,  G03H2001/0038 ,  G03H2001/0044 ,  G03H2001/005 ,  G03H2001/0232 ,  G03H2001/0445 ,  G03H2001/0473 ,  G03H2210/62

Abstract: A method of correcting a holographic image, a processing device, a dark field digital holographic microscope, a metrology apparatus and an inspection apparatus. The method includes obtaining a holographic image; determining at least one attenuation function due to motion blur from the holographic image; and correcting the holographic image, or a portion thereof, using the at least one attenuation function.