公开(公告)号：US20190219936A1

公开(公告)日：2019-07-18

申请号：US16307512

申请日：2017-06-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Franciscus Godefridus Casper BIJNEN ,  Augustinus Hubert Maria BOSHOUWERS ,  Johannes ONVLEE

IPC: G03F9/00 ,  H01L21/68

CPC classification number: G03F9/7046 ,  G03F9/7049 ,  G03F9/7084 ,  G03F9/7088 ,  H01L21/681 ,  H01L21/682

Abstract: A target structure such as an alignment mark on a semiconductor substrate becomes obscured by an opaque layer so that it cannot be located by an alignment sensor. A position for the mark is determined using an edge position sensor and relative position information that defines the position of the mark relative to one or more edge portions of the substrate is stored prior to formation of the opaque layer. A window can be opened in the opaque layer, based on the determined position. After revealing the target structure, the alignment sensor can, if desired, measure more accurately the position of the target structure, for use in controlling a further lithographic step. The edge position sensor may be a camera having an angle-selective behavior. The edge position sensor may be integrated within the alignment sensor hardware.

公开(公告)号：US20180095369A1

公开(公告)日：2018-04-05

申请号：US15565082

申请日：2016-03-24

Applicant: ASML Netherlands B.V.

Inventor： Kevin VAN DE RUIT ,  Bart Dinand PAARHUIS ,  Jean-Philippe Xavier VAN DAMME ,  Johannes ONVLEE ,  Cornelis Melchior BROUWER ,  Pieter Jacob KRAMER

IPC: G03F7/20 ,  G03F1/62

CPC classification number: G03F7/70983 ,  G01B2210/56 ,  G03F1/62 ,  G03F7/2002 ,  G03F7/70258 ,  G03F7/7085

Abstract: A lithographic apparatus including a support to support a patterning device, a substrate table to hold a substrate, and a projection system to project a radiation beam patterned by the patterning device onto a target portion of the substrate. A transparent layer is provided to protect the pattering device. The apparatus further includes a transparent layer deformation-determining device to determine a deformation profile of the transparent layer, the deformation profile of the transparent layer expressing a deformation of the transparent layer during a scanning movement of the lithographic apparatus, and a compensator device which is configured to control the projection system, the substrate table and/or the support in response to the deformation profile of the transparent layer to compensate for the deformation of the transparent layer during the scanning movement of the apparatus.

公开(公告)号：US20170307986A1

公开(公告)日：2017-10-26

申请号：US15649161

申请日：2017-07-13

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Earl William EBERT ,  Johannes ONVLEE ,  Samir A. NAYFEH ,  Mark Josef SCHUSTER ,  Peter A. DELMASTRO ,  Christopher Charles WARD ,  Frank Johannes Jacobus VAN BOXTEL ,  Abdullah ALIKHAN ,  Daniel Nathan BURBANK ,  Daniel Nicholas GALBURT ,  Justin Matthew VERDIRAME

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70808 ,  G03F7/70858 ,  G03F7/70866

Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.

公开(公告)号：US20150241796A1

公开(公告)日：2015-08-27

申请号：US14699468

申请日：2015-04-29

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Earl William EBERT, JR. ,  Johannes ONVLEE ,  Samir A. NAYFEH ,  Mark Josef SCHUSTER ,  Peter A. DELMASTRO ,  Christopher Charles WARD ,  Frank Johannes Jacobus VAN BOXTEL ,  Abdullah ALIKHAN ,  Daniel Nathan BURBANK ,  Daniel Nicholas GALBURT ,  Justin Matthew VERDIRAME ,  Thomas VENTURINO

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70808 ,  G03F7/70858 ,  G03F7/70866

Abstract: A system for controlling temperature of a patterning device in a lithographic apparatus is discussed. The system includes a patterning device support configured to support a patterning device and a reticle cooling system configured to provide substantially uniform temperature distribution across the patterning device. The reticle cooling system includes a first and second array of gas inlets configured to provide a first and second gas flow along a first and second direction across a surface of the patterning device, respectively, where first and second directions are opposite to each other. The reticle cooling system further includes a switching control system configured to control operation of the first and second arrays of gas inlets.

Abstract translation: 讨论了用于控制光刻设备中的图案形成装置的温度的系统。 该系统包括构造成支撑图案形成装置的图案形成装置支撑件和被配置为在图案形成装置上提供基本均匀的温度分布的掩模版冷却系统。 标线冷却系统包括第一和第二气体入口阵列，其被配置为分别在第一和第二方向彼此相对的情况下分别跨越图案形成装置的表面沿着第一和第二方向提供第一和第二气流。 标线冷却系统还包括配置成控制气体入口的第一和第二阵列的操作的开关控制系统。