公开(公告)号：US20210003924A1

公开(公告)日：2021-01-07

申请号：US17022910

申请日：2020-09-16

Applicant: ASML Netherlands B.V.

Inventor： Patricius Aloysius Jacobus TINNEMANS ,  Arie Jeffrey DEN BOEF ,  Armand Eugene Albert KOOLEN ,  Nitesh PANDEY ,  Vasco Tomas TENNER ,  Willem Marie Julia Marcel COENE ,  Patrick WARNAAR

IPC: G03F7/20 ,  G01B11/06 ,  G01B11/02 ,  G01N21/47 ,  G01N21/95 ,  G03F9/00

Abstract: Described is a metrology system for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology system comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.

公开(公告)号：US20200089135A1

公开(公告)日：2020-03-19

申请号：US16470905

申请日：2017-11-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Sebastianus Adrianus GOORDEN ,  Nitesh PANDEY ,  Duygu AKBULUT ,  Alessandro POLO ,  Simon Reinald HUISMAN

IPC: G03F9/00 ,  G03F7/20

Abstract: Disclosed is a metrology sensor system, such as a position sensor. The system comprises an optical collection system configured to collect diffracted or scattered radiation from a metrology mark on a substrate, said collected radiation comprising at least one parameter-sensitive signal and noise signal which is not parameter-sensitive, a processing system operable to process the collected radiation; and a module housing. An optical guide is provided for guiding the at least one parameter-sensitive signal, separated from the noise signal, from the processing system to a detection system outside of the housing. A detector detects the separated at least one parameter-sensitive signal. An obscuration for blocking zeroth order radiation and/or a demagnifying optical system may be provided between the optical guide and the detector.

公开(公告)号：US20200081340A1

公开(公告)日：2020-03-12

申请号：US16556709

申请日：2019-08-30

Applicant: ASML Netherlands B.V.

Inventor： Nitesh PANDEY

IPC: G03F7/00 ,  G03F7/20

Abstract: Disclosed is a method and associated inspection apparatus for measuring a characteristic of interest relating to a structure on a substrate. The inspection apparatus uses measurement radiation comprising a plurality of wavelengths. The method comprises performing a plurality of measurement acquisitions of said structure, each measurement acquisition being performed using measurement radiation comprising a different subset of the plurality of wavelengths, to obtain a plurality of multiplexed measurement signals. The plurality of multiplexed measurement signals are subsequently de-multiplexed into signal components according to each of said plurality of wavelengths, to obtain a plurality of de-multiplexed measurement signals which are separated according to wavelength.

公开(公告)号：US20190383602A1

公开(公告)日：2019-12-19

申请号：US16548981

申请日：2019-08-23

Applicant: ASML Netherlands B.V.

Inventor： Nitesh PANDEY

IPC: G01B11/25 ,  G03F7/20 ,  G01B11/06 ,  G03F9/00 ,  G01B11/24

Abstract: Measurement system comprising a radiation source configured to generate a measurement radiation beam, a polarizer and a grating to receive the measurement radiation beam and provide a polarized measurement radiation beam patterned by the grating, optics to form an image of the grating at a target location on a substrate. The image comprises a first part having a first polarization and a second part having a second polarization, detection optics to receive radiation from the target location of the substrate and form an image of the grating image at a second grating, and a detector to receive radiation transmitted through the second grating and produce a two output signal indicative of the intensity of the transmitted radiation for the first and second parts of the grating image respectively. Topography of the substrate can be determined from the signals.

公开(公告)号：US20190285993A1

公开(公告)日：2019-09-19

申请号：US16428215

申请日：2019-05-31

Applicant: ASML NETHERLANDS B.V.

Inventor： Nitesh PANDEY ,  Jin LIAN ,  Samee Ur REHMAN ,  Martin Jacobus Johan JAK

IPC: G03F7/20 ,  G01B11/02

Abstract: Methods and apparatuses for measuring a plurality of structures formed on a substrate are disclosed. In one arrangement, a method includes obtaining data from a first measurement process. The first measurement process including individually measuring each of the plurality of structures to measure a first property of the structure. A second measurement process is used to measure a second property of each of the plurality of structures. The second measurement process includes illuminating each structure with radiation having a radiation property that is individually selected for that structure using the measured first property for the structure.

公开(公告)号：US20190113852A1

公开(公告)日：2019-04-18

申请号：US16159080

申请日：2018-10-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Janneke RAVENSBERGEN ,  Duygu AKBULUT ,  Nitesh PANDEY ,  Jin LIAN

IPC: G03F7/20 ,  G01B9/02

CPC classification number: G03F7/70633 ,  G01B9/02083 ,  G01B9/0209 ,  G03F7/70625

Abstract: A metrology apparatus is disclosed that has an optical system to focus radiation onto a structure and directs redirected radiation from the structure to a detection system. The optical system applies a plurality of different offsets of an optical characteristic to radiation before and/or after redirected by the structure, such that a corresponding plurality of different offsets are provided to redirected radiation derived from a first point of a pupil plane field distribution relative to redirected radiation derived from a second point of the pupil plane field distribution. The detection system detects a corresponding plurality of radiation intensities resulting from interference between the redirected radiation derived from the first point of the pupil plane field distribution and the redirected radiation derived from the second point of the pupil plane field distribution. Each radiation intensity corresponds to a different one of the plurality of different offsets.

公开(公告)号：US20180364591A1

公开(公告)日：2018-12-20

申请号：US16061209

申请日：2016-11-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Robert John SOCHA ,  Arie Jeffrey DEN BOEF ,  Nitesh PANDEY

IPC: G03F7/20 ,  G01N21/956 ,  G01N21/88 ,  G01B11/27

Abstract: A method of adjusting a metrology apparatus, the method including: spatially dividing an intensity distribution of a pupil plane of the metrology apparatus into a plurality of pixels; and reducing an effect of a structural asymmetry in a target on a measurement by the metrology apparatus on the target, by adjusting intensities of the plurality of pixels.

公开(公告)号：US20180267415A1

公开(公告)日：2018-09-20

申请号：US15764617

申请日：2016-09-06

Applicant: ASML Netherlands B.V.

Inventor： Nitesh PANDEY ,  Arie Jeffrey DEN BOEF ,  Heine Melle MULDER ,  Willem Richard PONGERS ,  Paulus Antonius Andreas TEUNISSEN

IPC: G03F9/00

CPC classification number: G03F9/7084 ,  G03F7/70258 ,  G03F9/7049 ,  G03F9/7076 ,  G03F9/7092

Abstract: A topography measurement system comprising a radiation source configured to generate a radiation beam, a spatially coded grating configured to pattern the radiation beam and thereby provide a spatially coded radiation beam, optics configured to form an image of the spatially coded grating at a target location on a substrate, detection optics configured to receive radiation re-fleeted from the target location of the substrate and form an image of the grating image at a second grating, and a detector configured to receive radiation transmitted through the second grating and produce an output signal.

公开(公告)号：US20160061590A1

公开(公告)日：2016-03-03

申请号：US14838252

申请日：2015-08-27

Applicant: ASML Netherlands B.V.

Inventor： Nitesh PANDEY

IPC: G01B11/14

CPC classification number: G01B11/14 ,  G03F7/70625 ,  G03F7/70633 ,  G03F9/7007 ,  G03F9/703

Abstract: A broadband spectroscopic analysis is used for controlling a distance (d) between a miniature solid immersion lens (SIL, 60) and a metrology target (30′). An objective lens arrangement (15, 60) including the SIL illuminates the metrology target with a beam of radiation with different wavelengths and collects a radiation (709) reflected or diffracted by the metrology target. A mounting (64) holds the SIL within a distance from the metrology target that is less than the coherence length of the illuminating radiation (703). A detection arrangement (812, 818) produces a spectrum of the radiation reflected or diffracted by the metrology target. The distance between the SIL and the metrology target or other target surface can be inferred from spectral shifts observed in the detected spectrum. Servo control of the distance is implemented based on these shifts, using an actuator (66).

Abstract translation: 使用宽带光谱分析来控制微型固体浸没透镜（SIL，60）和测量目标（30'）之间的距离（d）。 包括SIL的物镜布置（15,60）利用具有不同波长的辐射束照亮计量目标，并收集由计量目标反射或衍射的辐射（709）。 安装件（64）将SIL保持在远离测量目标的距离小于照射辐射（703）的相干长度的距离处。 检测装置（812,818）产生由计量目标反射或衍射的辐射的光谱。 SIL和测量目标或其他目标表面之间的距离可以从在检测到的光谱中观察到的光谱偏移推断出来。 使用致动器（66），基于这些偏移来实现距离的伺服控制。

公开(公告)号：US20240004184A1

公开(公告)日：2024-01-04

申请号：US18037957

申请日：2021-11-08

Applicant: ASML Netherlands B.V.

Inventor： Luc Roger Simonne HASPESLAGH ,  Nitesh PANDEY ,  Ties Wouter VAN DER WOORD ,  Halil Gökay YEGEN ,  Sebastianus Adrianus GOORDEN ,  Alexis HUMBLET ,  Alexander Ludwig KLEIN ,  Jim Vincent OVERKAMP ,  Guilherme BRONDANI TORRI ,  Edgar Alberto OSORIO OLIVEROS

IPC: G02B26/08 ,  G03F7/00 ,  B81B7/02

CPC classification number: G02B26/0858 ,  G03F7/70291 ,  G03F7/70116 ,  B81B7/02 ,  B81B2207/11 ,  B81B2207/015

Abstract: A micromirror array comprises a substrate, a plurality of mirrors for reflecting incident light and, for each mirror of the plurality of mirrors, at least one piezoelectric actuator for displacing the mirror, wherein the at least one piezoelectric actuator is connected to the substrate. The micromirror array further comprises one or more pillars connecting the mirror to the at least one piezoelectric actuator. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection and/or metrology apparatus.