公开(公告)号：WO02054443A2

公开(公告)日：2002-07-11

申请号：PCT/GB0105768

申请日：2001-12-27

Applicant: AXCELIS TECH INC ,  EATON LTD

Inventor： SAADATMAND KOUROSH ,  DIVERGILIO WILLIAM FRANK ,  SWENSON DAVID D

IPC: C23C14/48 ,  H01J37/317 ,  H01L21/265 ,  H05H9/00 ,  H01J37/30

CPC classification number: H05H9/00

Abstract: A method and apparatus are disclosed for accelerating ions in an ion implantation system. An ion accelerator is provided which comprises a plurality of energizable electrodes energized by a variable frequency power source, in order to accelerate ions from an ion source. The variable frequency power source allows the ion accelerator to be adapted to accelerate a wide range of ion species to desired energy levels for implantation onto a workpiece, while reducing the cost and size of an ion implantation accelerator.

Abstract translation: 公开了用于在离子注入系统中加速离子的方法和装置。 提供了一种离子加速器，其包括由可变频率电源激励的多个可激励电极，以便从离子源加速离子。 可变频率电源允许离子加速器适于将宽范围的离子种类加速到期望的能级以用于植入到工件上，同时降低离子注入加速器的成本和尺寸。