公开(公告)号：US20080264446A1

公开(公告)日：2008-10-30

申请号：US11574231

申请日：2005-08-23

Applicant: Abbas Rastegar ,  Andy Ma ,  Dave Krick ,  Pat Marmillion

Inventor： Abbas Rastegar ,  Andy Ma ,  Dave Krick ,  Pat Marmillion

IPC: H01L21/00 ,  B08B3/10

CPC classification number: H01L21/67028

Abstract: There is an apparatus for cleaning a substrate mounted on a moveable platen. In an example embodiment, the apparatus comprises a first chamber, the first chamber has solvent-dispensing nozzles; the solvent-dispensing nozzles wet the substrate surface with a solvent as the platen transports the substrate. The platen moves in a predetermined direction and at a predetermined scan velocity as it transports the substrate into a process chamber. The process chamber has a hot source at a predetermined height from the substrate surface; it provides heat energy directed toward the substrate surface, the heat energy evaporates the solvent dispensed on the substrate surface; the solvent evaporation removes particulates from the substrate surface, as the platen transports the substrate from the first chamber into the process chamber. Substrates cleaned may include precision photo-masks, or wafers.

Abstract translation: 存在用于清洁安装在可动台板上的基板的装置。 在一个示例性实施例中，该装置包括第一室，第一室具有溶剂分配喷嘴; 当压板输送衬底时，溶剂分配喷嘴用溶剂润湿衬底表面。 当压板将基板输送到处理室中时，压板以预定的方向和预定的扫描速度移动。 处理室具有距基板表面预定高度的热源; 它提供指向衬底表面的热能，热能蒸发分配在衬底表面上的溶剂; 溶剂蒸发从衬底表面去除颗粒，因为压板将衬底从第一室输送到处理室中。 清洁的基板可以包括精密光掩模或晶片。

公开(公告)号：US20070163715A1

公开(公告)日：2007-07-19

申请号：US11532700

申请日：2006-09-18

Applicant: Abbas Rastegar

Inventor： Abbas Rastegar

IPC: H01L21/306

CPC classification number: H01L21/02052 ,  B08B3/024 ,  B08B5/02 ,  B08B7/0057 ,  B08B7/02 ,  B08B2203/0288 ,  G03F1/82 ,  H01L21/67051

Abstract: Apparatuses and methods for cleaning a surface comprising contaminate particles are provided. In one respect, plasma and/or a shockwave may be created in a fluid flowing through a nozzle. The nozzle, coupled to a laser source and a fluid feed may be configured to deliver the generated plasma and/or shockwave to the surface.

Abstract translation: 提供了用于清洁包含污染颗粒的表面的装置和方法。 在一个方面，可以在流过喷嘴的流体中产生等离子体和/或冲击波。 耦合到激光源和流体进料的喷嘴可以被配置为将产生的等离子体和/或冲击波传送到表面。

公开(公告)号：US20060207629A1

公开(公告)日：2006-09-21

申请号：US11301643

申请日：2005-12-13

Applicant: Abbas Rastegar ,  Yoshiaki Ikuta

Inventor： Abbas Rastegar ,  Yoshiaki Ikuta

IPC: B05D3/00 ,  B08B3/12

CPC classification number: B08B3/10 ,  B05D3/062 ,  B08B7/0057 ,  H01L21/67051 ,  H01L21/67115

Abstract: The present invention provides an apparatus and a method for an ultraviolet cleaning tool. The cleaning tool includes ultraviolet source spaced apart from a surface having contaminant particles. The ultraviolet source can create ozone between the surface and the ultraviolet source which breaks the chemical bonds between particles and the surface. The apparatus includes a gas feed which introduces a gas to aid the chemical bond. Additionally, the gas feed can introduce a gas to remove the particles from the surface.

Abstract translation: 本发明提供一种紫外线清洁工具的装置和方法。 清洁工具包括与具有污染物颗粒的表面间隔开的紫外线源。 紫外线源可以在表面和紫外线源之间产生臭氧，从而破坏了颗粒与表面之间的化学键。 该装置包括引入气体以辅助化学键的气体进料。 此外，气体进料可以引入气体以从表面除去颗粒。

公开(公告)号：US08097091B2

公开(公告)日：2012-01-17

申请号：US11574231

申请日：2005-08-23

Applicant: Abbas Rastegar ,  Andy Ma ,  Dave Krick ,  Pat Marmillion

Inventor： Abbas Rastegar ,  Andy Ma ,  Dave Krick ,  Pat Marmillion

IPC: B08B3/02 ,  B08B3/04 ,  B08B3/10

CPC classification number: H01L21/67028

Abstract: There is an apparatus for cleaning a substrate (5) mounted on a moveable platen. In an example embodiment, the apparatus comprises a first chamber (20), the first chamber has solvent-dispensing nozzles (25); the solvent-dispensing nozzles wet the substrate surface (5) with a solvent (7) as the platen transports the substrate. The platen moves in a predetermined direction and at a predetermined scan velocity as it transports the substrate into a process chamber. The process chamber has a hot source (30) at a predetermined height (h) from the substrate surface (5); it provides heat energy directed toward the substrate surface, the heat energy evaporates the solvent (7) dispensed on the substrate surface; the solvent evaporation removes particulates (35) from the substrate surface, as the platen transports the substrate from the first chamber (20) into the process chamber. Substrates cleaned may include precision photo-masks, or wafers.

Abstract translation: 存在用于清洁安装在可动台板上的基板（5）的装置。 在一个示例性实施例中，该装置包括第一室（20），第一室具有溶剂分配喷嘴（25）; 当压板输送衬底时，溶剂分配喷嘴用溶剂（7）润湿衬底表面（5）。 当压板将基板输送到处理室中时，压板以预定的方向和预定的扫描速度移动。 处理室具有距基板表面（5）预定高度（h）的热源（30）; 它提供指向衬底表面的热能，热能蒸发分配在衬底表面上的溶剂（7）; 当压板将基板从第一室（20）输送到处理室时，溶剂蒸发从基板表面去除微粒（35）。 清洁的基板可以包括精密光掩模或晶片。

公开(公告)号：US20110132394A1

公开(公告)日：2011-06-09

申请号：US13027923

申请日：2011-02-15

Applicant: Abbas Rastegar ,  Yoshiaki Ikuta

Inventor： Abbas Rastegar ,  Yoshiaki Ikuta

IPC: B08B3/10

CPC classification number: B08B3/10 ,  B05D3/062 ,  B08B7/0057 ,  H01L21/67051 ,  H01L21/67115

Abstract: The present invention provides an apparatus and a method for an ultraviolet cleaning tool. The cleaning tool includes ultraviolet source spaced apart from a surface having contaminant particles. The ultraviolet source can create ozone between the surface and the ultraviolet source which breaks the chemical bonds between particles and the surface. The apparatus includes a gas feed which introduces a gas to aid the chemical bond. Additionally, the gas feed can introduce a gas to remove the particles from the surface.

Abstract translation: 本发明提供一种紫外线清洁工具的装置和方法。 清洁工具包括与具有污染物颗粒的表面间隔开的紫外线源。 紫外线源可以在表面和紫外线源之间产生臭氧，从而破坏了颗粒与表面之间的化学键。 该装置包括引入气体以辅助化学键的气体进料。 此外，气体进料可以引入气体以从表面除去颗粒。

公开(公告)号：US07629556B2

公开(公告)日：2009-12-08

申请号：US11532700

申请日：2006-09-18

Applicant: Abbas Rastegar

Inventor： Abbas Rastegar

IPC: B23K26/14 ,  B08B3/00

CPC classification number: H01L21/02052 ,  B08B3/024 ,  B08B5/02 ,  B08B7/0057 ,  B08B7/02 ,  B08B2203/0288 ,  G03F1/82 ,  H01L21/67051

Abstract: Apparatuses and methods for cleaning a surface comprising contaminate particles are provided. In one respect, plasma and/or a shockwave may be created in a fluid flowing through a nozzle. The nozzle, coupled to a laser source and a fluid feed may be configured to deliver the generated plasma and/or shockwave to the surface.

Abstract translation: 提供了用于清洁包含污染颗粒的表面的装置和方法。 在一个方面，可以在流过喷嘴的流体中产生等离子体和/或冲击波。 耦合到激光源和流体进料的喷嘴可以被配置为将产生的等离子体和/或冲击波传送到表面。

公开(公告)号：US20060213615A1

公开(公告)日：2006-09-28

申请号：US11305312

申请日：2005-12-16

Applicant: Abbas Rastegar

Inventor： Abbas Rastegar

IPC: H01L21/306

CPC classification number: H01L21/67028 ,  B08B7/0042 ,  H01L21/67051

Abstract: An apparatus including a laser operating in different cleaning techniques is provided. In one embodiment, the laser interacts with the particle to remove the particle by expansion. In another embodiment, a liquid-assisted laser cleaning technique evaporates a liquid layer on the surface by laser pulses and subsequently removing the particles from the surface. Further, the present disclosure provides parameters to control the energy transfer to the particle. For example, for a shock wave generation parameters, the droplets size and concentration (e.g., pressure), substrate surface temperature, chemical composition of the droplets may be controlled.

Abstract translation: 提供一种包括以不同清洁技术操作的激光器的设备。 在一个实施方案中，激光与颗粒相互作用以通过扩展除去颗粒。 在另一个实施例中，液体辅助激光清洗技术通过激光脉冲蒸发表面上的液体层，随后从表面除去颗粒。 此外，本公开提供了控制到颗粒的能量传递的参数。 例如，对于冲击波产生参数，可以控制液滴尺寸和浓度（例如压力），底物表面温度，液滴的化学组成。