公开(公告)号：US08888086B2

公开(公告)日：2014-11-18

申请号：US13105148

申请日：2011-05-11

Applicant: Abbas Rastegar

Inventor： Abbas Rastegar

IPC: B23Q3/00 ,  G03F7/20 ,  G03F1/68 ,  G03F1/66 ,  H01L21/67

CPC classification number: G03F7/70916 ,  G03F1/66 ,  G03F1/68 ,  G03F7/70841 ,  H01L21/6719 ,  Y10S269/903

Abstract: An apparatus is provided for protecting a surface of interest from particle contamination, and particularly, during transitioning of the surface between atmospheric pressure and vacuum. The apparatus includes a chamber configured to receive the surface, and a protector plate configured to reside within the chamber with the surface, and inhibit particle contamination of the surface. A support mechanism is also provided suspending the protector plate away from an inner surface of the chamber. The support mechanism holds the protector plate within the chamber in spaced, opposing relation to the surface to provide a gap between the protector plate and the surface which presents a diffusion barrier to particle migration into the gap and onto the surface, thereby inhibiting particle contamination of the surface.

Abstract translation: 提供了一种用于保护感兴趣的表面免受颗粒污染的装置，特别是在大气压力和真空之间的表面过渡期间。 所述设备包括被配置为容纳所述表面的室，以及被配置成与所述表面一起驻留在所述室内的保护板，并且抑制所述表面的颗粒污染。 还提供了一种支撑机构，其将保护板悬挂在室的内表面之外。 支撑机构将保护板保持在腔内与表面间隔开的相对关系，以在保护板和表面之间提供间隙，该间隙对于颗粒迁移到间隙中并在表面上具有扩散阻挡，从而抑制颗粒污染 表面。

公开(公告)号：US08539969B2

公开(公告)日：2013-09-24

申请号：US12847621

申请日：2010-07-30

Applicant: Abbas Rastegar

Inventor： Abbas Rastegar

IPC: B08B3/12

CPC classification number: H01L21/67046 ,  B06B1/0276 ,  B06B1/0622 ,  B06B2201/20 ,  B06B2201/55 ,  B06B2201/71 ,  B08B3/12 ,  H01L21/02041

Abstract: An apparatus, system, and method for a Gigasonic Brush for cleaning surfaces is presented. One embodiment of the system includes an array of acoustic transducers coupled to a substrate where the individual acoustic transducers have sizes in the range of 9 um2 to 250,000 um2. The system may include a positioning mechanism coupled to at least one of a target surface or the array of acoustic transducers, and configured to position the array of acoustic transducers within 1 millimeter of a target surface. The system may also include a cleaning liquid supply arranged to provide cleaning liquid for coupling the array of acoustic transducers to the target surface. The system may further include a controller coupled to the array of acoustic transducers and configured to activate the array of acoustic transducers.

Abstract translation: 介绍了一种用于清洁表面的Gigasonic Brush的设备，系统和方法。 该系统的一个实施例包括耦合到衬底的声学换能器阵列，其中各个声学换能器的尺寸在9um2至250,000um2的范围内。 系统可以包括耦合到目标表面或声换能器阵列中的至少一个的定位机构，并且被配置为将声换能器阵列定位在目标表面的1毫米内。 该系统还可以包括布置成提供用于将声换能器阵列耦合到目标表面的清洁液体的清洁液体供应。 系统还可以包括耦合到声换能器阵列并被配置为激活声换能器阵列的控制器。

公开(公告)号：US07497913B2

公开(公告)日：2009-03-03

申请号：US11414146

申请日：2006-04-28

Applicant: Abbas Rastegar ,  Sean Eichenlaub

Inventor： Abbas Rastegar ,  Sean Eichenlaub

IPC: B08B7/00 ,  B08B7/04 ,  B08B3/00 ,  B08B3/04

CPC classification number: B08B3/02 ,  B24B37/00 ,  B24B55/00 ,  Y10S134/902

Abstract: Methods and apparatuses for cleaning a surface is provided. In one embodiment, a method includes the step of determining the type and size of the contaminant particles. A solution, which may include a plurality of variable size particles, may be selected such that an appropriate size cleaning particle is used during the cleaning process. The solution may include polystyrene latex particles or other cleaning particles. Alternatively, the solution may be a slurry. The solution and particles are delivered to the surface via a nozzle at a velocity that does not damage the surface and that clears the contaminants from the surface.

Abstract translation: 提供了用于清洁表面的方法和设备。 在一个实施例中，一种方法包括确定污染物颗粒的类型和尺寸的步骤。 可以选择可以包括多个可变尺寸颗粒的溶液，使得在清洁过程中使用适当尺寸的清洁颗粒。 溶液可以包括聚苯乙烯胶乳颗粒或其它清洁颗粒。 或者，溶液可以是浆料。 溶液和颗粒通过喷嘴以不破坏表面并且从表面清除污染物的速度被输送到表面。

公开(公告)号：US08206510B2

公开(公告)日：2012-06-26

申请号：US13027923

申请日：2011-02-15

Applicant: Abbas Rastegar ,  Yoshiaki Ikuta

Inventor： Abbas Rastegar ,  Yoshiaki Ikuta

IPC: B08B3/10

CPC classification number: B08B3/10 ,  B05D3/062 ,  B08B7/0057 ,  H01L21/67051 ,  H01L21/67115

Abstract: The present invention provides an apparatus and a method for an ultraviolet cleaning tool. The cleaning tool includes ultraviolet source spaced apart from a surface having contaminant particles. The ultraviolet source can create ozone between the surface and the ultraviolet source which breaks the chemical bonds between particles and the surface. The apparatus includes a gas feed which introduces a gas to aid the chemical bond. Additionally, the gas feed can introduce a gas to remove the particles from the surface.

Abstract translation: 本发明提供一种紫外线清洁工具的装置和方法。 清洁工具包括与具有污染物颗粒的表面间隔开的紫外线源。 紫外线源可以在表面和紫外线源之间产生臭氧，从而破坏了颗粒与表面之间的化学键。 该装置包括引入气体以辅助化学键的气体进料。 此外，气体进料可以引入气体以从表面除去颗粒。

公开(公告)号：US20110272838A1

公开(公告)日：2011-11-10

申请号：US12775355

申请日：2010-05-06

Applicant: Matt Malloy ,  Abbas Rastegar ,  Lloyd C. Litt

Inventor： Matt Malloy ,  Abbas Rastegar ,  Lloyd C. Litt

IPC: B29C59/02 ,  B29C33/72 ,  B29C33/38 ,  B29C59/00 ,  B29C35/08

CPC classification number: G03F7/0002 ,  B29C33/38 ,  B29C33/3857 ,  B29C33/42 ,  B82Y10/00 ,  B82Y40/00

Abstract: An apparatus, system, and method for nanoimprint templates with a backside recess having tapered sidewalls. In some embodiments, the nanoimprint templates comprise a support structure having a top surface, a bottom surface, and a recess in the top surface. The recess may have an inwardly tapered sidewall extending from the top surface to a floor of the recess. The template may further comprise a mold on the bottom surface.

Abstract translation: 一种用于纳米压印模板的装置，系统和方法，其具有具有锥形侧壁的背侧凹槽。 在一些实施例中，纳米压印模板包括具有顶表面，底表面和顶表面中的凹部的支撑结构。 凹部可以具有从顶部表面延伸到凹部的底板的向内渐缩的侧壁。 模板还可以包括底面上的模具。

公开(公告)号：US07921859B2

公开(公告)日：2011-04-12

申请号：US11301643

申请日：2005-12-13

Applicant: Abbas Rastegar ,  Yoshiaki Ikuta

Inventor： Abbas Rastegar ,  Yoshiaki Ikuta

IPC: B08B3/04

CPC classification number: B08B3/10 ,  B05D3/062 ,  B08B7/0057 ,  H01L21/67051 ,  H01L21/67115

Abstract: The present invention provides an apparatus and a method for an ultraviolet cleaning tool. The cleaning tool includes ultraviolet source spaced apart from a surface having contaminant particles. The ultraviolet source can create ozone between the surface and the ultraviolet source which breaks the chemical bonds between particles and the surface. The apparatus includes a gas feed which introduces a gas to aid the chemical bond. Additionally, the gas feed can introduce a gas to remove the particles from the surface.

Abstract translation: 本发明提供一种紫外线清洁工具的装置和方法。 清洁工具包括与具有污染物颗粒的表面间隔开的紫外线源。 紫外线源可以在表面和紫外线源之间产生臭氧，从而破坏了颗粒与表面之间的化学键。 该装置包括引入气体以辅助化学键的气体进料。 此外，气体进料可以引入气体以从表面除去颗粒。

公开(公告)号：US20120024313A1

公开(公告)日：2012-02-02

申请号：US12847621

申请日：2010-07-30

Applicant: Abbas Rastegar

Inventor： Abbas Rastegar

IPC: B08B3/12

CPC classification number: H01L21/67046 ,  B06B1/0276 ,  B06B1/0622 ,  B06B2201/20 ,  B06B2201/55 ,  B06B2201/71 ,  B08B3/12 ,  H01L21/02041

Abstract: An apparatus, system, and method for a Gigasonic Brush for cleaning surfaces is presented. One embodiment of the system includes an array of acoustic transducers coupled to a substrate where the individual acoustic transducers have sizes in the range of 9 um2 to 250,000 um2. The system may include a positioning mechanism coupled to at least one of a target surface or the array of acoustic transducers, and configured to position the array of acoustic transducers within 1 millimeter of a target surface. The system may also include a cleaning liquid supply arranged to provide cleaning liquid for coupling the array of acoustic transducers to the target surface. The system may further include a controller coupled to the array of acoustic transducers and configured to activate the array of acoustic transducers.

Abstract translation: 介绍了一种用于清洁表面的Gigasonic Brush的设备，系统和方法。 该系统的一个实施例包括耦合到衬底的声学换能器阵列，其中各个声学换能器的尺寸在9um2至250,000um2的范围内。 系统可以包括耦合到目标表面或声换能器阵列中的至少一个的定位机构，并且被配置为将声换能器阵列定位在目标表面的1毫米内。 该系统还可以包括布置成提供用于将声换能器阵列耦合到目标表面的清洁液体的清洁液体供应。 系统还可以包括耦合到声换能器阵列并被配置为激活声换能器阵列的控制器。

公开(公告)号：US20080302390A1

公开(公告)日：2008-12-11

申请号：US11628125

申请日：2005-05-18

Applicant: Abbas Rastegar

Inventor： Abbas Rastegar

IPC: B08B3/02

CPC classification number: H01L21/67051 ,  B08B3/02 ,  B08B17/02 ,  G03F1/82 ,  H01L21/67011

Abstract: This invention relates to a mask cleaning apparatus 101 and a method of cleaning a mask substrate 110. An embodiment according to the invention is a mask cleaning apparatus 101 with a trap comprising a cold trap 120. An additional heater 130 performs the heating function. The mask cleaning apparatus 101 further comprises a support means 105, an aerosol nozzle 150 for blowing aerosol 155 towards the mask substrate 110. In a first stage of the cleaning process the mask substrate 110 is close to the heater 130, and the mask substrate 110 is heated. In a second stage of the cleaning process, the gas flow 170 is stopped, and the mask 110 is transported close to the cold trap 120. The cold trap 120 is cooled. In a third stage of the cleaning process, the aerosol nozzle 150 blows aerosol 155 towards the mask substrate 110, which detaches particles from the mask substrate 110. This embodiment uses thermophoretic forces for trapping detached particles. Other embodiments according to the invention use vacuum, electrostatic forces and/or getter metal for trapping detached particles.

Abstract translation: 本发明涉及一种面罩清洁装置101和一种清洁掩模基板110的方法。根据本发明的实施例是具有包括冷阱120的捕集器的掩模清洁装置101.附加加热器130执行加热功能。 掩模清洁装置101还包括支撑装置105，用于将气溶胶155吹向掩模基板110的气溶胶喷嘴150.在清洁处理的第一阶段，掩模基板110靠近加热器130，并且掩模基板110 被加热。 在清洁过程的第二阶段中，气流170停止，并且掩模110被运送到冷阱120附近。冷阱120被冷却。 在清洁过程的第三阶段，气溶胶喷嘴150将气溶胶155吹向面罩基板110，掩模基板110将颗粒从掩模基板110分离。该实施例使用热泳力来捕获分离的颗粒。 根据本发明的其它实施例使用真空，静电力和/或吸气剂金属来捕获分离的颗粒。

公开(公告)号：US20060260662A1

公开(公告)日：2006-11-23

申请号：US11414146

申请日：2006-04-28

Applicant: Abbas Rastegar ,  Sean Eichenlaub

Inventor： Abbas Rastegar ,  Sean Eichenlaub

IPC: B08B3/02

CPC classification number: B08B3/02 ,  B24B37/00 ,  B24B55/00 ,  Y10S134/902

Abstract: Methods and apparatuses for cleaning a surface is provided. In one embodiment, a method includes the step of determining the type and size of the contaminant particles. A solution, which may include a plurality of variable size particles, may be selected such that an appropriate size cleaning particle is used during the cleaning process. The solution may include polystyrene latex particles or other cleaning particles. Alternatively, the solution may be a slurry. The solution and particles are delivered to the surface via a nozzle at a velocity that does not damage the surface and that clears the contaminants from the surface.

公开(公告)号：US20140053868A1

公开(公告)日：2014-02-27

申请号：US13592276

申请日：2012-08-22

Applicant: Abbas Rastegar ,  Arun John Kadaksham

Inventor： Abbas Rastegar ,  Arun John Kadaksham

IPC: H01L21/02 ,  B08B3/12

CPC classification number: H01L21/02057 ,  B08B3/102 ,  B08B3/12 ,  B08B2203/0288 ,  G03F1/82 ,  H01L21/02052 ,  H01L21/67028

Abstract: Embodiments of the present disclosure relate to methods and apparatus for reduction of particle defects from a semiconductor surface, such as for example the reduction of sub 100 micron defects. Methods and apparatus of the present disclosure are particularly useful in the manufacture of semiconductor devices when employing extreme ultraviolet photolithography. In some embodiments, a fluid stream is provided through a nozzle at conditions such that cavitation bubbles are formed, the cavitation bubbles being present in a stable cavitation state or regime. The fluid stream is flowed over at least a portion of the surface. A shockwave is generated or created in the fluid stream. The shockwave momentarily increases acoustic pressure in the fluid causing the cavitation bubbles to collapse and produce a jet or pulse of high fluid flow which removes particle defects from the surface.

Abstract translation: 本公开的实施例涉及用于从半导体表面减少颗粒缺陷的方法和装置，例如减少亚100微米缺陷。 本公开的方法和装置在采用极紫外光刻法时制造半导体器件时特别有用。 在一些实施例中，在形成空化气泡的条件下通过喷嘴提供流体流，空化气泡以稳定的空化状态或状态存在。 流体流在表面的至少一部分上流动。 在流体流中产生或产生冲击波。 冲击波暂时增加流体中的声压，导致气蚀气泡塌陷并产生高流体流的射流或脉冲，从表面去除颗粒缺陷。