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公开(公告)号：US20200075366A1
公开(公告)日：2020-03-05
申请号：US16555764
申请日：2019-08-29
Applicant: Applied Materials, Inc.
Inventor： Tejas Ulavi , Dhritiman Subha Kashyap , Sanjeev Baluja
Abstract: A thermal management system comprising a fluid channel with a plurality of parallel first flow paths extending along a first level in a first thermal mass and a plurality of parallel second flow paths extending along a second level in a second thermal mass are described. Methods for controlling the temperature of a substrate or heater surface and fluid manifolds are also described.
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公开(公告)号：US20200030766A1
公开(公告)日：2020-01-30
申请号：US16523252
申请日：2019-07-26
Applicant: Applied Materials, Inc.
Inventor： Jared Ahmad Lee , Sanjeev Baluja , Joseph AuBuchon , Dhritiman Subha Kashyap , Michael Rice
Abstract: Apparatus and methods for providing high velocity gas flow showerheads for deposition chambers are described. The showerhead has a faceplate in contact with a backing plate that has a concave portion to provide a plenum between the backing plate and the faceplate. A plurality of thermal elements is within the concave portion of the backing plate and extends to contact the faceplate.
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公开(公告)号：US20230294116A1
公开(公告)日：2023-09-21
申请号：US17699971
申请日：2022-03-21
Applicant: Applied Materials, Inc.
Inventor： Prahallad Iyengar , Dhritiman Subha Kashyap , Parth Swaroop , Satish Radhakrishnan
Abstract: Dual channel showerhead assemblies are described. In some embodiments, the dual channel showerhead assemblies, which include a showerhead upper plate and a showerhead lower plate, enable delivery of mutually incompatible precursors along separate channels that mix in the process zone above a wafer. The dual channel showerhead assemblies provide at least two separate gas paths. In some embodiments, the hole design and hole distribution are configured for minimal jetting effect and plenum volumes for fast purging. The dual channel showerhead assemblies described herein may have a reduced purge out time compared to single channel showerheads, spiral dual channel showerheads, and bonded dual channel showerheads.
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公开(公告)号：US11682576B2
公开(公告)日：2023-06-20
申请号：US17845230
申请日：2022-06-21
Applicant: Applied Materials, Inc.
Inventor： Tejas Ulavi , Sanjeev Baluja , Dhritiman Subha Kashyap
IPC: H01T23/00 , H01L21/683 , H01L21/67
CPC classification number: H01L21/6833 , H01L21/67103
Abstract: Substrate supports comprising a top plate positioned on a shaft are described. The top plate including a primary heating element a first depth from the surface of the top plate, a inner zone heating element a second depth from the surface of the top plate and an outer zone heating element a third depth from the surface of the top plate. Substrate support assemblies comprising a plurality of substrate supports and methods of processing a substrate are also disclosed.
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15.发明授权公开(公告)号：US11586789B2
公开(公告)日：2023-02-21
申请号：US17224545
申请日：2021-04-07
Applicant: Applied Materials, Inc.
Inventor： Dhritiman Subha Kashyap , Chaowei Wang , Kartik Shah , Kevin Griffin , Karthik Ramanathan , Hanhong Chen , Joseph AuBuchon , Sanjeev Baluja
Abstract: Methods, software systems and processes to develop surrogate model-based optimizers for controlling and optimizing flow and pressure of purges between a showerhead and a heater having a substrate support to control non-uniformity inherent in a processing chamber due to geometric configuration and process regimes. The flow optimizer process utilizes experimental data from optimal process space coverage models, generated simulation data and statistical machine learning tools (i.e. regression models and global optimizers) to predict optimal flow rates for any user-specified process regime.
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Patent Agency Ranking
公开(公告)号：US20220319899A1
公开(公告)日：2022-10-06
申请号：US17845230
申请日：2022-06-21
Applicant: Applied Materials, Inc.
Inventor： Tejas Ulavi , Sanjeev Baluja , Dhritiman Subha Kashyap
IPC: H01L21/683 , H01L21/67
Abstract: Substrate supports comprising a top plate positioned on a shaft are described. The top plate including a primary heating element a first depth from the surface of the top plate, a inner zone heating element a second depth from the surface of the top plate and an outer zone heating element a third depth from the surface of the top plate. Substrate support assemblies comprising a plurality of substrate supports and methods of processing a substrate are also disclosed.
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公开(公告)号：US11430686B2
公开(公告)日：2022-08-30
申请号：US17066971
申请日：2020-10-09
Applicant: Applied Materials, Inc.
Inventor： Tejas Ulavi , Sanjeev Baluja , Dhritiman Subha Kashyap
IPC: H01T23/00 , H01L21/683 , H01L21/67
Abstract: Substrate supports comprising a top plate positioned on a shaft are described. The top plate including a primary heating element a first depth from the surface of the top plate, a inner zone heating element a second depth from the surface of the top plate and an outer zone heating element a third depth from the surface of the top plate. Substrate support assemblies comprising a plurality of substrate supports and methods of processing a substrate are also disclosed.
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公开(公告)号：US11110425B2
公开(公告)日：2021-09-07
申请号：US16523252
申请日：2019-07-26
Applicant: Applied Materials, Inc.
Inventor： Jared Ahmad Lee , Sanjeev Baluja , Joseph AuBuchon , Dhritiman Subha Kashyap , Michael Rice
Abstract: Apparatus and methods for providing high velocity gas flow showerheads for deposition chambers are described. The showerhead has a faceplate in contact with a backing plate that has a concave portion to provide a plenum between the backing plate and the faceplate. A plurality of thermal elements is within the concave portion of the backing plate and extends to contact the faceplate.
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公开(公告)号：US10910243B2
公开(公告)日：2021-02-02
申请号：US16555764
申请日：2019-08-29
Applicant: Applied Materials, Inc.
Inventor： Tejas Ulavi , Dhritiman Subha Kashyap , Sanjeev Baluja
Abstract: A thermal management system comprising a fluid channel with a plurality of parallel first flow paths extending along a first level in a first thermal mass and a plurality of parallel second flow paths extending along a second level in a second thermal mass are described. Methods for controlling the temperature of a substrate or heater surface and fluid manifolds are also described.
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公开(公告)号：US20200370180A1
公开(公告)日：2020-11-26
申请号：US16876252
申请日：2020-05-18
Applicant: Applied Materials, Inc.
Inventor： Ashutosh Agarwal , Sanjeev Baluja , Dhritiman Subha Kashyap , Kartik Shah , Yanjun Xia
IPC: C23C16/455 , H01J37/32
Abstract: Provided are gas distribution apparatus with a showerhead having a front plate and a back plate spaced to form a gas volume, the front plate having an inner surface adjacent the gas volume and an outer surface with a plurality of apertures extending therethrough, the gas volume having a center region and an outer region; a first inlet in fluid communication with the center region of the gas volume, the inlet having an inside and an outside; and a mixer disposed on the inside of the inlet to increase gas flow temperature. Also provided are processing chamber apparatus and methods of depositing a film.
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