11.
    发明专利
    未知

    公开(公告)号:DE59301458D1

    公开(公告)日:1996-02-29

    申请号:DE59301458

    申请日:1993-10-14

    Applicant: BASF AG

    Abstract: Mixtures comprising (A) from 80 to 99% by weight of a polymer based on methyl methacrylate, (B) from 20 to 1% by weight of a particulate polymer having a weight-average value (Mw) of the particle diameter which is in the range from 1-50 mu m, obtainable by polymerisation of a monomer which contains vinyl groups, and (C) from 0 to 60% by weight of a multistage graft rubber based on an ester of acrylic acid or on butadiene for the preparation of rough coating compositions.

    13.
    发明专利
    未知

    公开(公告)号:DE4318077A1

    公开(公告)日:1994-12-08

    申请号:DE4318077

    申请日:1993-06-01

    Applicant: BASF AG

    Abstract: Moulding compositions which are resistant to stress cracking, essentially comprising A) from 49 to 99 % by weight of a polymer obtainable by polymerisation of a C1-C20-alkyl ester of methacrylic or acrylic acid, or mixtures of such esters, B) from 0.95 to 50 % by weight of a polymer obtainable by polymerisation of a monomer mixture of b1) from 75 to 82 % by weight of a vinyl aromatic monomer and b2) from 18 to 25 % by weight of acrylonitrile or methacrylonitrile, or a mixture thereof, and C) from 0.05 to 1 % by weight of a mixture comprising c1) a triaryl phosphite of the formula I in which R and R are C1-C12-alkyl, C5-C8-cycloalkyl, C6-C 10-aryl or C6-C10-aryl-C1-C4-alkyl, where the aryl radicals may be substituted up to 3 times by C1-C4-alkyl, and R is hydrogen or C1-C4-alkyl; c2) an amine of the formula II in which n has a value of from 2 to 10, c3) a benzotriazole of the formula III in which R , R and R are as defined for R ; c4) a phenol of the formula IV ABK IV where k is 1, 2 or 4, and, if k = 1, A is -COOR , -CONHR or , where R is C1-C21-alkyl, and, if k = 2, A is -CONH-(CH2)n-CONH-, or , where p and m are integers from 1 to 10, and, if k = 4, A is , where q is an integer from 1 to 4, and B is , where R and R are hydrogen, methyl or tert-butyl. h

Patent Agency Ranking