公开(公告)号：WO9813728A8

公开(公告)日：1999-08-05

申请号：PCT/US9711638

申请日：1997-06-27

Applicant: BREWER SCIENCE INC ,  NISSAN CHEMICAL IND LTD

Inventor： SABNIS RAM W ,  MAYO JONATHAN W ,  HAYS EDITH G ,  BREWER TERRY L ,  STRODER MICHAEL D ,  YANAGIMOTO AKIRA ,  SONE YASUHISA ,  WATANABE YOSHITANE ,  EMA KIYOMI

IPC: G02B5/00 ,  C09D179/08 ,  G02B5/20 ,  G02F1/1335 ,  G03C1/73 ,  G03F7/00 ,  G09F9/30

CPC classification number: G02F1/133512 ,  G03F7/0007

Abstract: An organic black matrix having high resistivity (>/= 10 ohm/square), high optical density (>/= 2.0) at ultra thin film thicknesses (

Abstract translation: 对于改进的STN和TFT像素显示应用，具有高电阻率（> / = 10 11欧姆/平方），超薄膜厚度（ / = 2.0））的有机黑色矩阵是 通过将聚酰亚胺/染料溶液和混合金属氧化物颜料分散体以1:15至3:15的染料与颜料的重量/重量比组合成为可能。 需要低电阻率炭黑作为溅射铬的替代品被否定。

公开(公告)号：EP1502292A4

公开(公告)日：2009-01-21

申请号：EP03747615

申请日：2003-04-28

Applicant: BREWER SCIENCE INC

Inventor： SABNIS RAM W

IPC: G03F7/11 ,  H01L21/20 ,  B05D7/24 ,  C09D4/00 ,  C09D165/00 ,  G02B1/11 ,  G03F7/09 ,  G03F7/16 ,  H01L21/027 ,  H01L21/312 ,  H01L21/36

CPC classification number: B05D1/62 ,  C09D4/00 ,  C09D165/00 ,  G02B1/111 ,  G03F7/091 ,  G03F7/167 ,  H01L21/0276 ,  C08F238/00

Abstract: An improved method for applying polymeric antireflective coatings to substrate surfaces and the resulting precursor structures are provided. Broadly, the methods comprise plasma enhanced chemical vapor depositing (PECVD) a polymer on the substrate surfaces. The PECVD processes comprise providing a quantity of a polymer generated by introducing monomer vapors into a plasma state followed by polymerization thereof, with assistance of plasma energy, onto the surface of a substrate. The most preferred starting monomers are phenylacetylene, 4-ethynyltoluene, and 1-ethynyl-2-fluorobenzene. The inventive methods are useful for providing highly conformal antireflective coatings on large surface substrates having super submicron (0.25 µm or smaller) features. The process provides a much faster deposition rate than conventional chemical vapor deposition (CVD) methods, is environmentally friendly, and is economical.

公开(公告)号：EP1493061A4

公开(公告)日：2009-01-07

申请号：EP03719720

申请日：2003-04-11

Applicant: BREWER SCIENCE INC

Inventor： SABNIS RAM W ,  SHIH WU-SHENG

IPC: C23C14/12 ,  G02B1/11 ,  G03F7/09 ,  H01L21/027 ,  G03F7/30

CPC classification number: G02B1/11 ,  G02B1/111 ,  G03F7/091

Abstract: An improved method for applying polymeric antireflective coatings to substrate surfaces and the resulting precursor structures are provided. Broadly, the methods comprise plasma enhanced chemical vapor depositing (PECVD) a polymer on the substrate surfaces. The most preferred starting monomers are 4-fluorostyrene, 2,3,4,5,6-pentafluorostyrene, and allylpentafluorobenzene. The PECVD processes comprise subjecting the monomers to sufficient electric current and pressure so as to cause the monomers to sublime to form a vapor which is then changed to the plasma state by application of an electric current. The vaporized monomers are subsequently polymerized onto a substrate surface in a deposition chamber. The inventive methods are useful for providing highly conformal antireflective coatings on large surface substrates having super submicron (0.25 µm or smaller) features. The process provides a much faster deposition rate than conventional chemical vapor deposition (CVD) methods, is environmentally friendly, and is economical.