公开(公告)号：DE60334980D1

公开(公告)日：2010-12-30

申请号：DE60334980

申请日：2003-04-11

Applicant: BREWER SCIENCE INC

Inventor： SABNIS RAM W ,  SHIH WU-SHENG

IPC: G03F7/30

公开(公告)号：AU3329001A

公开(公告)日：2001-09-03

申请号：AU3329001

申请日：2001-02-02

Applicant: BREWER SCIENCE INC

Inventor： BREWER TERRY ,  GUERRERO DOUGLAS ,  SABNIS RAM W ,  SPENCER MARY J

IPC: G03F7/11 ,  C23C16/46 ,  G03F7/09 ,  H01L21/027 ,  G03C1/76 ,  G03C1/492 ,  G03C1/494 ,  G11B7/24 ,  G03F7/00

Abstract: An improved method for applying organic antireflective coatings to substrate surfaces and the resulting precursor structures are provided. Broadly, the methods comprise chemical vapor depositing (CVD) an antireflective compound on the substrate surface. In one embodiment, the compound is highly strained (e.g., having a strain energy of at least about 10 kcal/mol) and comprises two cyclic moieties joined to one another via a linkage group. The most preferred monomers are [2.2](1,4)-naphthalenophane and [2.2](9,10)-anthracenophane. The CVD processes comprise heating the antireflective compound so as to vaporize it, and then pyrolizing the vaporized compound to form stable diradicals which are subsequently polymerized on a substrate surface in a deposition chamber. The inventive methods are useful for providing highly conformal antireflective coatings on large substrate surfaces having super submicron (0.25 mum or smaller) features.

公开(公告)号：AU2003223582A8

公开(公告)日：2003-10-27

申请号：AU2003223582

申请日：2003-04-11

Applicant: BREWER SCIENCE INC

Inventor： SHIH WU-SHENG ,  SABNIS RAM W

IPC: C23C14/12 ,  G02B1/11 ,  G03F7/09 ,  H01L21/027 ,  G03F7/30

Abstract: An improved method for applying polymeric antireflective coatings to substrate surfaces and the resulting precursor structures are provided. Broadly, the methods comprise plasma enhanced chemical vapor depositing (PECVD) a polymer on the substrate surfaces. The most preferred starting monomers are 4-fluorostyrene, 2,3,4,5,6-pentafluorostyrene, and allylpentafluorobenzene. The PECVD processes comprise subjecting the monomers to sufficient electric current and pressure so as to cause the monomers to sublime to form a vapor which is then changed to the plasma state by application of an electric current. The vaporized monomers are subsequently polymerized onto a substrate surface in a deposition chamber. The inventive methods are useful for providing highly conformal antireflective coatings on large surface substrates having super submicron (0.25 mum or smaller) features. The process provides a much faster deposition rate than conventional chemical vapor deposition (CVD) methods, is environmentally friendly, and is economical.

公开(公告)号：CA2400157A1

公开(公告)日：2001-08-30

申请号：CA2400157

申请日：2001-02-02

Applicant: BREWER SCIENCE INC

Inventor： SPENCER MARY J ,  SABNIS RAM W ,  GUERRERO DOUGLAS ,  BREWER TERRY

IPC: G03F7/11 ,  C23C16/46 ,  G03F7/09 ,  H01L21/027 ,  G03C1/76 ,  G03F7/00 ,  G11B7/24 ,  G03C1/492 ,  G03C1/494

Abstract: An improved method for applying organic antireflective coatings to substrate surfaces and the resulting precursor structures are provided. Broadly, the methods comprise chemical vapor depositing (CVD) an antireflective compound on the substrate surface. In one embodiment, the compound is highly strained (e.g., having a strain energy of at least about 10 kcal/mol) and comprises t wo cyclic moieties joined to one another via a linkage group. The most preferre d monomers are [2.2](1,4)-naphthalenophane and [2.2](9,10)-anthracenophane. Th e CVD processes comprise heating the antireflective compound so as to vaporize it, and then pyrolizing the vaporized compound to form stable diradicals whi ch are subsequently polymerized on a substrate surface in a deposition chamber. The inventive methods are useful for providing highly conformal antireflecti ve coatings on large substrate surfaces having super submicron (0.25.mu.m or smaller) features.

公开(公告)号：AU2003232015A1

公开(公告)日：2003-11-17

申请号：AU2003232015

申请日：2003-04-28

Applicant: BREWER SCIENCE INC

Inventor： SABNIS RAM W

IPC: G03F7/11 ,  B05D7/24 ,  C09D4/00 ,  C09D165/00 ,  G03F7/09 ,  G03F7/16 ,  H01L21/027 ,  H01L21/312 ,  H01L21/20 ,  H01L21/36

Abstract: An improved method for applying polymeric antireflective coatings to substrate surfaces and the resulting precursor structures are provided. Broadly, the methods comprise plasma enhanced chemical vapor depositing (PECVD) a polymer on the substrate surfaces. The PECVD processes comprise providing a quantity of a polymer generated by introducing monomer vapors into a plasma state followed by polymerization thereof, with assistance of plasma energy, onto the surface of a substrate. The most preferred starting monomers are phenylacetylene, 4-ethynyltoluene, and 1-ethynyl-2-fluorobenzene. The inventive methods are useful for providing highly conformal antireflective coatings on large surface substrates having super submicron (0.25 mum or smaller) features. The process provides a much faster deposition rate than conventional chemical vapor deposition (CVD) methods, is environmentally friendly, and is economical.

公开(公告)号：AU2003223582A1

公开(公告)日：2003-10-27

申请号：AU2003223582

申请日：2003-04-11

Applicant: BREWER SCIENCE INC

Inventor： SABNIS RAM W ,  SHIH WU-SHENG

IPC: C23C14/12 ,  G02B1/11 ,  G03F7/09 ,  H01L21/027

Abstract: An improved method for applying polymeric antireflective coatings to substrate surfaces and the resulting precursor structures are provided. Broadly, the methods comprise plasma enhanced chemical vapor depositing (PECVD) a polymer on the substrate surfaces. The most preferred starting monomers are 4-fluorostyrene, 2,3,4,5,6-pentafluorostyrene, and allylpentafluorobenzene. The PECVD processes comprise subjecting the monomers to sufficient electric current and pressure so as to cause the monomers to sublime to form a vapor which is then changed to the plasma state by application of an electric current. The vaporized monomers are subsequently polymerized onto a substrate surface in a deposition chamber. The inventive methods are useful for providing highly conformal antireflective coatings on large surface substrates having super submicron (0.25 mum or smaller) features. The process provides a much faster deposition rate than conventional chemical vapor deposition (CVD) methods, is environmentally friendly, and is economical.

公开(公告)号：DE60333913D1

公开(公告)日：2010-10-07

申请号：DE60333913

申请日：2003-04-28

Applicant: BREWER SCIENCE INC

Inventor： SABNIS RAM W

IPC: G03F7/11 ,  H01L21/20 ,  B05D7/24 ,  C09D4/00 ,  C09D165/00 ,  G02B1/11 ,  G03F7/09 ,  G03F7/16 ,  H01L21/027 ,  H01L21/312 ,  H01L21/36

公开(公告)号：CA2269538A1

公开(公告)日：1998-04-02

申请号：CA2269538

申请日：1997-06-27

Applicant: BREWER SCIENCE INC ,  NISSAN CHEMICAL IND LTD

Inventor： STRODER MICHAEL D ,  YANAGIMOTO AKIRA ,  WATANABE YOSHITANE ,  SONE YASUHISA ,  BREWER TERRY L ,  HAYS EDITH G ,  SABNIS RAM W ,  EMA KIYOMI ,  MAYO JONATHAN W

IPC: G02B5/00 ,  C09D179/08 ,  G02B5/20 ,  G02F1/1335 ,  G03C1/73 ,  G03F7/00 ,  G09F9/30

Abstract: An organic black matrix having high resistivity (~10 11 ohm/square), high optical density (~ 2.0) at ultra thin film thicknesses (~ 1.0 microns) for improved STN and TFT pixel display applications is made possible by combining polyimideldye solutions and mixed metal oxide pigment dispersions at a weight/weight ratio of dye to pigment of 1:15 to 3:15. The need for low resistivity carbon black, as a replacement for sputtered chrome, is negated.

公开(公告)号：EP1012671A4

公开(公告)日：2000-12-06

申请号：EP99954589

申请日：1999-07-14

Applicant: BREWER SCIENCE INC ,  NISSAN CHEMICAL IND LTD

Inventor： SABNIS RAM W ,  MAYO JONATHAN W ,  BREWER TERRY L ,  STRODER MICHAEL D ,  EMA KIYOMI ,  SONE YASUHISA ,  NIHIRA TAKAYASU ,  AOBA KAZUHIRO ,  YANAGIMOTO AKIRA

IPC: G03F7/004 ,  C08L33/04 ,  C08L101/00 ,  G02B5/20 ,  G02B5/22 ,  G02F1/1335 ,  G03F7/00 ,  G03F7/033 ,  G03F7/075 ,  G03F7/027

CPC classification number: G03F7/0751 ,  G02F1/133512 ,  G03F7/0007

Abstract: A photosensitive black matrix material containing an alkali soluble polymer, a photopolymerizable polyfunctional (meth)acrylate or mixture thereof, a silica coated metal oxide pigment to block light, a trialkoxyorganosilane coupling agent, a photoinitiator, sufficient solvent to render the composition spin coatable and less than 3 wt % of a dye soluble in the solvent. The resulting composition is useful for forming black matrices for display panels such as flat panel displays. The process for forming the composition consisting of mixing the ingredients is also claimed.

Abstract translation: 含有碱溶性聚合物，光聚合多官能（甲基）丙烯酸酯或其混合物，二氧化硅涂覆的金属氧化物颜料以阻挡光的光敏黑色基质材料，三烷氧基有机硅烷偶联剂，光引发剂，足以使组合物可旋涂的溶剂， 超过3重量％的可溶于溶剂的染料。 所得到的组合物可用于形成显示面板如平板显示器的黑色矩阵。 本发明还要求保护用于形成由混合成分组成的组合物的方法。

公开(公告)号：EP1269258A4

公开(公告)日：2010-03-10

申请号：EP01905408

申请日：2001-02-02

Applicant: BREWER SCIENCE INC

Inventor： BREWER TERRY ,  GUERRERO DOUGLAS ,  SABNIS RAM W ,  SPENCER MARY J

IPC: G03F7/11 ,  C23C16/46 ,  G03F7/09 ,  H01L21/027 ,  G03C1/76 ,  G03C1/492 ,  G03C1/494 ,  G03F7/00 ,  G11B7/24

CPC classification number: G03F7/091 ,  Y10S430/136 ,  Y10S430/151