公开(公告)号：WO2007130299A3

公开(公告)日：2008-04-10

申请号：PCT/US2007010044

申请日：2007-04-26

Applicant: CORNING INC ,  WEBB JAMES E

Inventor： WEBB JAMES E

IPC: G02B13/22 ,  G02B27/00

CPC classification number: G02B13/22 ,  G02B7/008 ,  G02B27/0025 ,  G03F7/706

Abstract: The application relates to the correction of distortion in a telecentric imaging system by shifting the object plane along the optical axis. The goal is to correct distortion errors caused by environmental influences like changes in temperature or pressure. The design of the imaging system remains sufficiently telecentric so that changes in working distance do not significantly alter magnification. Distortions accompanying magnification corrections can also be corrected.

Abstract translation: 该应用涉及通过沿着光轴移动物体平面来改善远心成像系统中的失真。 目标是纠正由温度或压力变化等环境影响引起的失真误差。 成像系统的设计保持足够的远心，使得工作距离的变化不会显着改变放大倍数。 伴随放大倍率校正的失真也可以纠正。

公开(公告)号：EP1137606A4

公开(公告)日：2004-03-24

申请号：EP99937275

申请日：1999-07-16

Applicant: CORNING INC

Inventor： HARES GEORGE B ,  KOHLI JEFFREY T ,  WEBB JAMES E

IPC: C03C3/078 ,  C03C3/085 ,  C03C3/087 ,  C03C3/091 ,  C03C3/093 ,  C03C4/00 ,  C03C3/089

CPC classification number: C03C3/078 ,  C03C4/0028

Abstract: This invention relates to lead-free silicate glasses that find use in producing fine crystal glassware and in laminated ware applications. The glasses consist essentially, in weight percent, of: SiO2 52-66; Al2O3 0-4; Li2O 0-4; Na2O 3-16; K2O 0-12; ZnO 15-30; BaO 0-7; MgO+CaO+SrO 0-4; ZrO2 0-4; B2O3 0-4.

公开(公告)号：EP1910874A4

公开(公告)日：2009-08-05

申请号：EP06787798

申请日：2006-07-19

Applicant: CORNING INC

Inventor： WEBB JAMES E

IPC: G02B5/30 ,  G02B13/14 ,  G02B13/22 ,  G02B27/28

CPC classification number: G03F7/70966 ,  G02B5/3083 ,  G02B13/143 ,  G02B13/22 ,  G02B27/283

Abstract: Axisymmetric birefringent materials are incorporated into a deep UV imaging system by exploiting axial symmetries. A polar orthogonal polarization pattern is relayed conjugate to a pupil of a telecentric imaging system to avoid birefringence of axisymmetric birefringent optics located in telecentric object or image space.

公开(公告)号：EP1417530A4

公开(公告)日：2008-10-08

申请号：EP02750066

申请日：2002-07-16

Applicant: CORNING INC

Inventor： ALLAN DOUGLAS C ,  WEBB JAMES E ,  BRUNING JOHN H

IPC: G01L1/24 ,  G02B1/02 ,  G02B5/30 ,  G02B17/08 ,  G02F1/01 ,  G03F7/20 ,  H01L21/027 ,  G02B27/14 ,  G01J4/00 ,  G01R33/02 ,  G02F1/07 ,  G02F1/1333 ,  H01J40/14

CPC classification number: G02B17/0892 ,  G01L1/241 ,  G02B1/02 ,  G02B5/3091 ,  G02B17/0808 ,  G02B17/086 ,  G02F1/0131 ,  G03F7/70225 ,  G03F7/70566 ,  G03F7/70958 ,  G03F7/70966

Abstract: Stress-induced photoelastic birefringence compensates for intrinsic birefringence of cubic crystalline structures (12) in deep ultraviolet (less than 200 nm) microlithographic imaging systems (10). Both the photoelastic birefringence and the intrinsic birefringence are expressed in a tensor format simplified by the symmetries of cubic crystalline structures. The stress-induced photoelastic birefringence can be sized to individually compensate for intrinsic birefringence exhibited in the same optical elements or preferably to collectively compensate for the cumulative effects of intrinsic birefringence in other optical elements in the lithography system.