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    MASK, MASK BLANK, PHOTOSENSITIVE MATERIAL THEREFOR AND FABRICATION THEREOF
    4.
    发明申请
    MASK, MASK BLANK, PHOTOSENSITIVE MATERIAL THEREFOR AND FABRICATION THEREOF 审中-公开
    遮罩，遮罩，其感光材料及其制造

    公开(公告)号：WO2004107044A3

    公开(公告)日：2005-04-14

    申请号：PCT/US2004015243

    申请日：2004-05-13

    Applicant: BELLMAN ROBERT A ,  BORRELLI NICHOLAS F ,  HARES GEORGE B ,  SMITH CHARLENE M ,  WALTON ROBIN M ,  CORNING INC

    Inventor： BELLMAN ROBERT A ,  BORRELLI NICHOLAS F ,  HARES GEORGE B ,  SMITH CHARLENE M ,  WALTON ROBIN M

    IPC: C03C3/064 ,  C03C3/091 ,  C03C15/00 ,  G03F1/30 ,  G03F1/32 ,  G03F1/34 ,  G03F1/14 ,  G02B6/16 ,  G03F1/00

    CPC classification number: G03F1/30 ,  C03C3/064 ,  C03C3/091 ,  C03C15/00 ,  G03F1/32 ,  G03F1/34

    Abstract: Disclosed are masks and mask blanks for photolithographic processes, photosensitive materials and fabrication method therefor. Photosensitive materials are used in the masks for recording permanent pattern features via UV exposure. The masks are advantageously phase-shifting, but can be gray-scale masks having index patterns with arbitrary distribution of refractive index and pattern dimension. The masks may have features above the surface formed from opaque or attenuating materials. Alumino-boro-germano-silicate glasses having a composition comprising, in terms of mole percentage, 1-6% of Al2O3, 10-36% of B2O3, 2-20% of GeO2, 40-80% of SiO2, 2-10% of R2O, where R is selected from Li, Na and K, and expressed in terms of weight percentage of the glass, 0-5% of F, can be used for the mask substrate.

    Abstract translation: 公开了用于光刻工艺的掩模和掩模坯料，感光材料及其制造方法。 光敏材料用于通过紫外线曝光记录永久图案特征的掩模。 掩模有利地是相移，但是可以是具有折射率和图案尺寸的任意分布的索引图案的灰度掩模。 掩模可以具有由不透明或衰减材料形成的表面上方的特征。 氧化铝 - 硼 - 锗酸 - 硅酸盐玻璃，其组成包括以摩尔百分比计为1〜6％的Al 2 O 3，10-36％的B 2 O 3，2〜20％的GeO 2，40〜80％的SiO 2，2-10 R 2选自Li，Na和K的R 2 O％，并且以玻璃重量百分比表示，0-5％的F可以用于掩模基板。

    PHOTOREFRACTIVE GLASS AND OPTICAL ELEMENTS MADE THEREFROM
    10.
    发明申请
    PHOTOREFRACTIVE GLASS AND OPTICAL ELEMENTS MADE THEREFROM 审中-公开
    光折射玻璃及其制成的光学元件

    公开(公告)号：WO2005066089A2

    公开(公告)日：2005-07-21

    申请号：PCT/US2004043267

    申请日：2004-12-21

    Applicant: CORNING INC ,  SCHROEDER JOSEPH F ,  BORRELLI NOCHOLAS F ,  HARES GEORGE B

    Inventor： SCHROEDER JOSEPH F ,  BORRELLI NOCHOLAS F ,  HARES GEORGE B

    IPC: C03C3/112 ,  C03C4/00 ,  C03C4/04 ,  G02B5/00 ,  G02B6/00 ,  G02B6/12 ,  C03C3/00

    CPC classification number: C03C3/112 ,  C03C4/0071 ,  C03C4/04 ,  G02B2006/12107

    Abstract: The present invention provides an alkali alumino-silicate Na-F-containing glass material and a method of making the alkali alumino-silicate Na-F-containing glass material, with the glass material capable of being made photosensitive and thus formed into optical elements at wavelengths ranging between about 240 to 350 nm, and more particularly at the standard 248nm wavelength of excimer lasers. Also disclosed is optical element wherein a refractive index pattern formed in the alumino-silicate Na-F containing glass material, the refractive index pattern including regions of high refractive index and regions of low refractive index, the difference between the refractive indices of the high refractive index regions and the low refractive index regions being at least 4x10 at a wavelength of 633 nm.

    Abstract translation: 本发明提供一种含有碱金属铝硅酸盐的含Na-F玻璃材料和一种制备该含有碱金属铝硅酸盐Na-F的玻璃材料的方法，该玻璃材料能够被制成光敏元件，并由此形成光学元件 波长范围在约240-350nm之间，更特别是在准分子激光器的标准248nm波长范围内。 还公开了光学元件，其中在含硅铝酸盐Na-F的玻璃材料中形成折射率图案，折射率图案包括高折射率区域和低折射率区域，高折射率区域 折射率区域和低折射率区域在633nm的波长处至少为4×10 -5。

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