公开(公告)号：FR2896886B1

公开(公告)日：2008-07-11

申请号：FR0650380

申请日：2006-02-02

Applicant: ESSILOR INT

Inventor： BITEAU JOHN ,  BOILOT JEAN PIERRE ,  GACOIN THIERRY ,  MATHERON MURIEL ,  RABOIN LORRAINE

IPC: G02B1/10 ,  G02C7/10

Abstract: The present invention relates to a method for making a substrate coated with a mesoporous photochromic film, comprising: a) preparing a precursor sol of a mesoporous film comprising an inorganic precursor agent, at least one organic solvent, water, at least one pore-forming agent and one hydrophobic precursor agent bearing at least one hydrophobic group; b) depositing a film of the precursor sol onto a main surface of a substrate; c) removing the pore-forming agent from the film resulting from the previous step at a temperature @150° C.; d) impregnating the mesoporous film resulting from step c) with a solution comprising at least one photochromic agent. In an alternative embodiment, the photochromic agent is directly introduced into the precursor sol. In an alternative embodiment of the previous alternative embodiment, the precursor sol does not comprise any hydrophobic precursor agent but the photochromic film is made hydrophobic by a treatment subsequent to its preparation.

公开(公告)号：FR2858691A1

公开(公告)日：2005-02-11

申请号：FR0350397

申请日：2003-08-05

Applicant: ESSILOR INT

Inventor： DOUCE JEROME ,  CHAPUT FREDERIC ,  BITEAU JOHN ,  BOILOT JEAN PIERRE ,  HOCHSTETTER GILLES

IPC: C08J7/04 ,  C09D7/12 ,  C09D183/04 ,  G02B1/10 ,  C08L83/10 ,  C08J5/12 ,  C01F7/04

Abstract: A polymerizable anti-scratch coating composition comprising at least one alkoxysilane and/or a hydrolyzate of it, anisotropic particles of one or more metal oxides and/or oxyhydroxides with a principal axis D1 of length 400 nm or less and, transversely to it, a minimum dimension D2 and a maximum D3 such that D3 is greater than or equal to D2, D1/D2 = 11or more and D1/D3 = 10 or more and optionally a polymerization catalyst. Independent claims are included for (1) a substrate coated by deposition and hardening of the claimed composition; (2) the particles as defined in the main and dependent claims.

公开(公告)号：FR2827967B1

公开(公告)日：2003-10-24

申请号：FR0110019

申请日：2001-07-26

Applicant: ESSILOR INT

Inventor： LANDRAUD NATHALIE ,  PERETTI JACQUES ,  CHAPUT FREDERIC ,  LAMPEL GEORGES ,  BOILOT JEAN PIERRE ,  LAHLIL KHALID ,  SAFAROV VIATCHESLAV

IPC: H01L21/027 ,  G02B6/255 ,  G02B6/42 ,  G03F7/20 ,  G02B6/24 ,  G06K15/00 ,  G03F7/09 ,  G11B7/00

Abstract: The method comprises emitting appropriate polarisation light waves on a photosensitive material for inducing therein a topographic modification through an aperture of at the most 100 mm bound by an opaque area, said layer being arranged at the most 100 mm away from the aperture.

公开(公告)号：FR2787100A1

公开(公告)日：2000-06-16

申请号：FR9815825

申请日：1998-12-15

Applicant: ESSILOR INT

Inventor： BITEAU JOHN ,  BOILOT JEAN PIERRE ,  CHAPUT FREDERIC

IPC: C01B33/16 ,  C03C1/00 ,  C01B33/145

Abstract: The invention concerns a method which consists in hydrolysing an initial volume Vsi of a precursor material comprising at least a polyalkoxysilane with an amount of water such that: x H2O / x Si >/= 10 wherein x H2O and x Si represent the number of moles of H2O and Si present respectively; concentrating the hydrolysate up to a volume substantially equal to the initial volume Vsi; relaxation of the hydrolyzate until demixing into an aqueous phase and an organosilicon phase; and recuperating the organosilicon phase. The invention is applicable to optics.