公开(公告)号：NO900613A

公开(公告)日：1990-08-10

申请号：NO900613

申请日：1990-02-08

Applicant: HOECHST AG

Inventor： MEISTER CHRISTOPH ,  DOENGES REINHARD

IPC: C08B37/08

CPC classification number: C08B37/003

公开(公告)号：HUT37134A

公开(公告)日：1985-11-28

申请号：HU347484

申请日：1984-09-14

Applicant: HOECHST AG

Inventor： DOENGES REINHARD ,  RUCKERT HANS ,  GEISSLER ULRICH ,  STEPPAN HARTMUT

IPC: C07D277/20 ,  C07D209/12 ,  C07D215/10 ,  C07D215/12 ,  C07D215/14 ,  C07D277/12 ,  C07D277/64 ,  C07D277/84 ,  C07D293/00 ,  C07D293/12 ,  C07D521/00 ,  C08F2/00 ,  C08F2/50 ,  C08G85/00 ,  G03C1/00 ,  G03C1/675 ,  G03F7/029 ,  C07D209/10 ,  C07D417/06 ,  C07D413/06 ,  C07D401/06 ,  C07D403/06 ,  G03C1/72 ,  G03C1/68 ,  G03F7/00

Abstract: Compounds of the formula I … … are described in which L denotes H or CO-(R )n(CX3)m, M denotes alkylene, alkenylene or arylene, Q denotes S, Se, O, dialkylmethylene, alken-1,2-ylene, 1,2-phenylene or N-R, where M + Q together form 3 or 4 ring members, R denotes alkyl, aralkyl or alkoxyalkyl, R denotes an aromatic group, and X denotes Cl, Br or I and n = 0 and m = 1 or n = 1 and m = 1 or 2. The compounds eliminate HX on irradiation and form radicals. They are therefore highly active acid donors and radical initiators for photochemical processes.

公开(公告)号：ZA8407165B

公开(公告)日：1985-04-24

申请号：ZA8407165

申请日：1984-09-12

Applicant: HOECHST AG

Inventor： DOENGES REINHARD ,  RUCKERT HANS ,  GEISSLER ULRICH ,  STEPPAN HARTMUT

IPC: C07D277/20 ,  C07D209/12 ,  C07D215/10 ,  C07D215/12 ,  C07D215/14 ,  C07D277/12 ,  C07D277/64 ,  C07D277/84 ,  C07D293/00 ,  C07D293/12 ,  C07D521/00 ,  C08F2/00 ,  C08F2/50 ,  C08G85/00 ,  G03C1/00 ,  G03C1/675 ,  G03F7/029 ,  C07D ,  C08F ,  G03C ,  G03F

CPC classification number: C07D215/10 ,  C07D209/12 ,  C07D215/12 ,  C07D277/12 ,  C07D277/64 ,  C07D277/84 ,  C07D293/12 ,  G03C1/675 ,  G03F7/0295 ,  Y10S430/123

公开(公告)号：FI843594L

公开(公告)日：1985-03-17

申请号：FI843594

申请日：1984-09-13

Applicant: HOECHST AG

Inventor： DOENGES REINHARD ,  RUCKERT HANS ,  GEISSLER ULRICH ,  STEPPAN HARTMUT

IPC: C07D277/20 ,  C07D209/12 ,  C07D215/10 ,  C07D215/12 ,  C07D215/14 ,  C07D277/12 ,  C07D277/64 ,  C07D277/84 ,  C07D293/00 ,  C07D293/12 ,  C07D521/00 ,  C08F2/00 ,  C08F2/50 ,  C08G85/00 ,  G03C1/00 ,  G03C1/675 ,  G03F7/029 ,  C07D

Abstract: Compounds of the formula I … … are described in which L denotes H or CO-(R )n(CX3)m, M denotes alkylene, alkenylene or arylene, Q denotes S, Se, O, dialkylmethylene, alken-1,2-ylene, 1,2-phenylene or N-R, where M + Q together form 3 or 4 ring members, R denotes alkyl, aralkyl or alkoxyalkyl, R denotes an aromatic group, and X denotes Cl, Br or I and n = 0 and m = 1 or n = 1 and m = 1 or 2. The compounds eliminate HX on irradiation and form radicals. They are therefore highly active acid donors and radical initiators for photochemical processes.

公开(公告)号：FI843594A0

公开(公告)日：1984-09-13

申请号：FI843594

申请日：1984-09-13

Applicant: HOECHST AG

Inventor： DOENGES REINHARD ,  RUCKERT HANS ,  GEISSLER ULRICH ,  STEPPAN HARTMUT

IPC: C07D277/20 ,  C07D209/12 ,  C07D215/10 ,  C07D215/12 ,  C07D215/14 ,  C07D277/12 ,  C07D277/64 ,  C07D277/84 ,  C07D293/00 ,  C07D293/12 ,  C07D521/00 ,  C08F2/00 ,  C08F2/50 ,  C08G85/00 ,  G03C1/00 ,  G03C1/675 ,  G03F7/029 ,  C07D

Abstract: Compounds of the formula I … … are described in which L denotes H or CO-(R )n(CX3)m, M denotes alkylene, alkenylene or arylene, Q denotes S, Se, O, dialkylmethylene, alken-1,2-ylene, 1,2-phenylene or N-R, where M + Q together form 3 or 4 ring members, R denotes alkyl, aralkyl or alkoxyalkyl, R denotes an aromatic group, and X denotes Cl, Br or I and n = 0 and m = 1 or n = 1 and m = 1 or 2. The compounds eliminate HX on irradiation and form radicals. They are therefore highly active acid donors and radical initiators for photochemical processes.

公开(公告)号：ZA813555B

公开(公告)日：1982-06-30

申请号：ZA813555

申请日：1981-05-27

Applicant: HOECHST AG

Inventor： REINHARD DOENGES ,  DOENGES REINHARD

IPC: C08F2/00 ,  C07D263/34 ,  C07D263/56 ,  C07D263/57 ,  C07D413/04 ,  C08F2/48 ,  C08F2/50 ,  C08F2/54 ,  G03C1/675 ,  G03F7/00 ,  G03F7/004 ,  G03F7/028 ,  G03F7/039 ,  C07D ,  C08J ,  C08K ,  A61K ,  G03C

Abstract: This invention relates to a novel 2-(halogenomethyl-phenyl)-4-halogeno-oxazole derivative; to a radiation-sensitive composition which, as the radiation-sensitive compound, contains a 2-halogenomethyl-phenyl)-4-halogeno-oxazole derivative; and to a process for the preparation of the novel 2-(halogenomethyl-phenyl)-4-halogeno-oxazole derivatives.

公开(公告)号：FI109909B

公开(公告)日：2002-10-31

申请号：FI951572

申请日：1995-04-03

Applicant: HOECHST AG

Inventor： HILBIG JOSEF ,  DOENGES REINHARD

IPC: C08B11/00 ,  C08B11/20 ,  C08B31/08 ,  C08B37/00

Abstract: The prodn. of low-mol. wt. polysaccharide ether (I) by oxidative degradation of high-mol. wt. polysaccharide ether (II) comprises adding a perborate (III) or a mixt. of (III) and perborate activator (IV) to a slurry or suspension of (II) and reacting at 25-90 deg. C.

公开(公告)号：CA2124421A1

公开(公告)日：1994-11-28

申请号：CA2124421

申请日：1994-05-26

Applicant: HOECHST AG

Inventor： DOENGES REINHARD ,  EHRLER RUDOLF ,  HELWERTH RAINER

IPC: C07H15/26 ,  C07D207/40 ,  C07D207/404 ,  C07D207/408 ,  C07D207/412 ,  C07D207/416 ,  C10M133/16 ,  C10N30/04 ,  C10N30/12 ,  C11D3/28 ,  C11D7/32 ,  C11D7/34 ,  C07H15/08 ,  C11D1/75 ,  C23F11/10

Abstract: Substituted succinimides The present invention relates to succinimides of the formula (I) in which R1 and R2, independently of one another, are hydrogen, C1-C24-alkyl, C2-C24-alkenyl, C6-C12-cycloalkyl, C6-C12-cyclo-alkenyl, C6-C12 - aryl, C1-24- alkoxy, C1- C14 - acyl, C1-C24-acyloxy, a hydroxyl, amino or sulfo group or a C1-C24-dialkylamino, C1-C24-acylamino, C1-C2,-alkylsulfato, C1-C24-alkylsulfonato, C1-C24,-alkylsulfito, C1-C24-alkylsulfinyl or C1-24-alkoxycarbonyl radical, and R3 is a polyhydroxyalkyl radical of the formula (II) in which R4 is - (CHOR7)n-H, R5 is - (CHOR7)m-H, R6 is - (CHOR7)o-H where n + m + o in 2-6, and R7 is H or a carbohydrate attached in the form of a glycoside from the series comprising reducing sugars, a process for their preparation and their use.

公开(公告)号：NO900613L

公开(公告)日：1990-08-10

申请号：NO900613

申请日：1990-02-08

Applicant: HOECHST AG

Inventor： MEISTER CHRISTOPH ,  DOENGES REINHARD

IPC: C08B37/08

Abstract: The invention relates to a process for the preparation of activated chitosans in which a chitosan is reacted with an acid to form a salt and preferably subsequently with a base. The addition of acid and, preferably, of base in the activation is carried out in a suspending agent which substantially prevents dissolution of the chitosan salts. Suspending agents which can be used are both aqueous solutions of inorganic salts and organic or aqueous-organic solvents. The invention also relates to a process for preparing both water-soluble and water-insoluble chitosan derivatives by reacting the activated chitosans with reagents which are generally suitable for reacting polysaccharides or amines.

公开(公告)号：CS253715B2

公开(公告)日：1987-12-17

申请号：CS692684

申请日：1984-09-14

Applicant: HOECHST AG

Inventor： DOENGES REINHARD ,  RUCKERT HANS ,  GEISSLER ULRICH ,  STEPPAN HARTMUT

IPC: C07D277/20 ,  C07D209/12 ,  C07D215/10 ,  C07D215/12 ,  C07D215/14 ,  C07D277/12 ,  C07D277/64 ,  C07D277/84 ,  C07D293/00 ,  C07D293/12 ,  C07D521/00 ,  C08F2/00 ,  C08F2/50 ,  C08G85/00 ,  G03C1/00 ,  G03C1/675 ,  G03F7/029 ,  G03C1/72 ,  G03C1/68 ,  G03F7/00

Abstract: Compounds of the formula I … … are described in which L denotes H or CO-(R )n(CX3)m, M denotes alkylene, alkenylene or arylene, Q denotes S, Se, O, dialkylmethylene, alken-1,2-ylene, 1,2-phenylene or N-R, where M + Q together form 3 or 4 ring members, R denotes alkyl, aralkyl or alkoxyalkyl, R denotes an aromatic group, and X denotes Cl, Br or I and n = 0 and m = 1 or n = 1 and m = 1 or 2. The compounds eliminate HX on irradiation and form radicals. They are therefore highly active acid donors and radical initiators for photochemical processes.