公开(公告)号：KR840001602B1

公开(公告)日：1984-10-11

申请号：KR810002253

申请日：1981-06-20

Applicant: HOECHST AG

Inventor： RUCKERT HANS ,  BUHR GERHARD ,  STEPPAN HARTMUT

IPC: G03C1/72 ,  C08L33/00 ,  C08L33/02 ,  C08L61/00 ,  C08L61/04 ,  C08L61/06 ,  C08L75/00 ,  C08L75/04 ,  G03C1/74 ,  G03C5/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/16 ,  G03F7/26 ,  H01L21/027 ,  H01L21/30 ,  H05K3/00

公开(公告)号：US3915707A

公开(公告)日：1975-10-28

申请号：US41826673

申请日：1973-11-23

Applicant: HOECHST AG

Inventor： GESSWEIN EBERHARD ,  MOLLER WERNER ,  RUCKERT HANS

IPC: C09K11/02 ,  C09D5/22 ,  G03F7/021 ,  H01J29/20 ,  H01J29/22 ,  G03C5/18 ,  G03C1/54

CPC classification number: G03F7/021 ,  H01J29/225 ,  Y10S430/11 ,  Y10S430/127

Abstract: This invention relates to a light-sensitive copying composition for the manufacture of screens for cathode ray tubes, comprising a dispersion of a phosphor pigment in an aqueous solution of a hydrophilic cross-linkable binder and a sensitizer, the sensitizer being a condensation product of an aromatic diazonium compound containing recurrent units of the general types A-N2X and B, which are connected by methylene groups, said units A-N2X being derived from compounds of the general formula (R1-R3)pR2N2X wherein X is the anion of an aliphatic monosulfonic acid with one to six carbon atoms, P IS AN INTEGER FROM 1 TO 3, R1 is a carbocyclic or heterocyclic aromatic group, having at least one condensable position, R2 is an arylene group of the benzene or naphthalene series, R3 is either a single bond or one of the following groups: -(CH2)q-NR4-(CH2)q-NR4-(CH2)r-NR5-O-(CH2)r-NR4-S-(CH2)r-NR4-O-R6-O-O-S-CO -NR4-SO2-NR4wherein Q IS AN INTEGER FROM 0 TO 5, R IS AN INTEGER FROM 2 TO 5, R4 is either hydrogen, or an alkyl group with one to five carbon atoms, or an aralkyl group with seven to 12 carbon atoms, or an aryl group with six to 12 carbon atoms, R5 is hydrogen or an alkyl group with one to five carbon atoms, and R6 is an arylene group with six to 12 carbon atoms AND SAID UNITS B being radicals, free of diazonium groups, of the following compounds: aromatic amines, phenols, thiophenols, phenol ethers, aromatic thioethers, aromatic hydrocarbons, aromatic heterocyclic compounds, or organic acid amides. The invention also includes a process for the manufacture of a screen for a cathode ray tube employing the novel light-sensitive composition.

Abstract translation: 本发明涉及一种用于制造阴极射线管屏幕的光敏复印组合物，其包括在亲水性可交联粘合剂和敏化剂的水溶液中的荧光颜料的分散体，所述敏化剂是 芳族重氮化合物，其含有通过亚甲基连接的一般类型A-N2X和B的复发单元，所述单元A-N2X衍生自通式（R1-R3）pR2-N2X的化合物，其中X为 具有1至6个碳原子的脂肪族单磺酸，P 1为1至3的整数，R 1为具有至少一个可缩合位置的碳环或杂环芳族基团，R 2为苯或萘系列的亚芳基，R 3为 单键或以下组之一：

公开(公告)号：US3890152A

公开(公告)日：1975-06-17

申请号：US29109572

申请日：1972-09-21

Applicant: HOECHST AG

Inventor： RUCKERT HANS ,  UNHOLZ RAINER

IPC: G03C1/72 ,  G03F7/095 ,  G03F7/08

CPC classification number: G03F7/095

Abstract: This invention relates to a light-sensitive composition comprising at least one diazonium salt mixed condensate and at least one compound selected from the group consisting of an oquinone diazide sulfonic amide and an o-quinone diazide sulfonic ester.

Abstract translation: 本发明涉及包含至少一种重氮盐混合缩合物和至少一种选自邻醌二叠氮磺酰胺和邻醌二叠氮磺酸酯的化合物的感光组合物。

公开(公告)号：JPS5737349A

公开(公告)日：1982-03-01

申请号：JP9412081

申请日：1981-06-19

Applicant: Hoechst Ag

Inventor： RUCKERT HANS ,  BUHR GERHARD ,  STEPPAN HARTMUT

IPC: G03C1/72 ,  C08L33/00 ,  C08L33/02 ,  C08L61/00 ,  C08L61/04 ,  C08L61/06 ,  C08L75/00 ,  C08L75/04 ,  G03C1/74 ,  G03C5/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/16 ,  H01L21/027 ,  H01L21/30 ,  H05K3/00

CPC classification number: G03F7/039 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S522/904

公开(公告)号：JPS51120714A

公开(公告)日：1976-10-22

申请号：JP3415776

申请日：1976-03-27

Applicant: HOECHST AG

Inventor： BUHR GERHARD ,  RUCKERT HANS ,  FRASS HANS WERNER

IPC: G03F7/039 ,  G01T1/04 ,  G03C1/72 ,  G03C1/73 ,  G03F3/10 ,  G03F7/004 ,  G03F7/016 ,  G03F7/022

Abstract: This invention relates to a radiation-sensitive copying composition comprising a compound (1) which splits-off an acid upon irradiation and a compound (2) having at least one group selected from the group consisting of a carboxylic ortho acid ester group and a carboxylic acid amide acetal group, which composition, upon irradiation, forms an exposure product having a higher solubility in a liquid developer than the non-irradiated composition.

公开(公告)号：CS253715B2

公开(公告)日：1987-12-17

申请号：CS692684

申请日：1984-09-14

Applicant: HOECHST AG

Inventor： DOENGES REINHARD ,  RUCKERT HANS ,  GEISSLER ULRICH ,  STEPPAN HARTMUT

IPC: C07D277/20 ,  C07D209/12 ,  C07D215/10 ,  C07D215/12 ,  C07D215/14 ,  C07D277/12 ,  C07D277/64 ,  C07D277/84 ,  C07D293/00 ,  C07D293/12 ,  C07D521/00 ,  C08F2/00 ,  C08F2/50 ,  C08G85/00 ,  G03C1/00 ,  G03C1/675 ,  G03F7/029 ,  G03C1/72 ,  G03C1/68 ,  G03F7/00

Abstract: Compounds of the formula I … … are described in which L denotes H or CO-(R )n(CX3)m, M denotes alkylene, alkenylene or arylene, Q denotes S, Se, O, dialkylmethylene, alken-1,2-ylene, 1,2-phenylene or N-R, where M + Q together form 3 or 4 ring members, R denotes alkyl, aralkyl or alkoxyalkyl, R denotes an aromatic group, and X denotes Cl, Br or I and n = 0 and m = 1 or n = 1 and m = 1 or 2. The compounds eliminate HX on irradiation and form radicals. They are therefore highly active acid donors and radical initiators for photochemical processes.

公开(公告)号：MY8600248A

公开(公告)日：1986-12-31

申请号：MY8600248

申请日：1986-12-30

Applicant: HOECHST AG

Inventor： RUCKERT HANS ,  BUHR GERHARD ,  STEPPAN HARTMUT

IPC: G03C1/72 ,  C08L33/00 ,  C08L33/02 ,  C08L61/00 ,  C08L61/04 ,  C08L61/06 ,  C08L75/00 ,  C08L75/04 ,  G03C1/74 ,  G03C5/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/16 ,  G03F7/26 ,  H01L21/027 ,  H01L21/30 ,  H05K3/00

Abstract: A positive-working radiation-sensitive mixture is described which is composed of a compound having at least one C-O-C bond which can be split by acid, a compound which forms a strong acid when irradiated, a binder which is insoluble in water and soluble in aqueous-alkaline solutions, and a resin having solubility properties which differ from those of the binder and which is selected from (1) a polyurethane resin obtained from an organic isocyanate and a polymer which contains hydroxyl groups, (2) a polyvinyl alkyl ether, (3) an alkyl acrylate polymer, or (4) a hydrogenated or partially hydrogenated derivative of colophony. As a result of the resin additives, photoresist layers are obtained which have good adhesion to the support, good flexibility, good latitude in developing and good resolution.

公开(公告)号：AU543462B2

公开(公告)日：1985-04-18

申请号：AU7675281

申请日：1981-10-23

Applicant: HOECHST AG

Inventor： BUHR GERHARD ,  RUCKERT HANS ,  STAHLHOFEN PAUL

IPC: G03C1/56 ,  C07C161/06

公开(公告)号：DE2147947C2

公开(公告)日：1983-12-01

申请号：DE2147947

申请日：1971-09-25

Applicant: HOECHST AG, 6230 FRANKFURT, DE

Inventor： RUCKERT HANS ,  UNHOLZ RAINER

IPC: G03C1/72 ,  G03F7/095 ,  G03F7/08

Abstract: This invention relates to a light-sensitive composition comprising at least one diazonium salt mixed condensate and at least one compound selected from the group consisting of an o-quinone diazide sulfonic amide and an o-quinone diazide sulfonic ester.

公开(公告)号：NL172274B

公开(公告)日：1983-03-01

申请号：NL7212548

申请日：1972-09-15

Applicant: HOECHST AG

Inventor： RUCKERT HANS ,  UNHOLZ RAINER

IPC: G03C1/72 ,  G03F7/095 ,  G03C1/70 ,  G03F7/08 ,  G03C1/52

Abstract: This invention relates to a light-sensitive composition comprising at least one diazonium salt mixed condensate and at least one compound selected from the group consisting of an o-quinone diazide sulfonic amide and an o-quinone diazide sulfonic ester.