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公开(公告)号:BR8306748A
公开(公告)日:1984-07-17
申请号:BR8306748
申请日:1983-12-08
Applicant: HOECHST AG
Inventor: STAHLHOFEN PAUL , HSIEH SHANE
Abstract: 1. A light-sensitive composition which comprises a water-insoluble binder which is soluble in aqueous-alkaline solutions ; and a light-sensitive component selected from the group consisting of o- or p- quinone diazides, diazonium salt polycondensation products, or a mixture of a) a compound which eliminates an acid on exposure to light and b) a compound having at least one C-O-C group which can be split by acid ; and a thermo-crosslinking compound, which thermo-crosslinking compound is a cyclical acid amide of the general formula : see diagramm : EP0111273,P8,F1 wherein R denotes a hydrogen atom or an alkyl group.
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公开(公告)号:ZA838409B
公开(公告)日:1984-06-27
申请号:ZA838409
申请日:1983-11-11
Applicant: HOECHST AG
Inventor: STAHLHOFEN PAUL , SHANE HSIEH
Abstract: 1. A light-sensitive composition which comprises a water-insoluble binder which is soluble in aqueous-alkaline solutions ; and a light-sensitive component selected from the group consisting of o- or p- quinone diazides, diazonium salt polycondensation products, or a mixture of a) a compound which eliminates an acid on exposure to light and b) a compound having at least one C-O-C group which can be split by acid ; and a thermo-crosslinking compound, which thermo-crosslinking compound is a cyclical acid amide of the general formula : see diagramm : EP0111273,P8,F1 wherein R denotes a hydrogen atom or an alkyl group.
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公开(公告)号:FI834528A
公开(公告)日:1984-06-14
申请号:FI834528
申请日:1983-12-09
Applicant: HOECHST AG
Inventor: STAHLHOFEN PAUL
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公开(公告)号:AU2191483A
公开(公告)日:1984-06-14
申请号:AU2191483
申请日:1983-12-02
Applicant: HOECHST AG
Inventor: HSIEH SHANE , STAHLHOFEN PAUL
Abstract: 1. A light-sensitive composition which comprises a water-insoluble binder which is soluble in aqueous-alkaline solutions ; and a light-sensitive component selected from the group consisting of o- or p- quinone diazides, diazonium salt polycondensation products, or a mixture of a) a compound which eliminates an acid on exposure to light and b) a compound having at least one C-O-C group which can be split by acid ; and a thermo-crosslinking compound, which thermo-crosslinking compound is a cyclical acid amide of the general formula : see diagramm : EP0111273,P8,F1 wherein R denotes a hydrogen atom or an alkyl group.
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公开(公告)号:CA1151933A
公开(公告)日:1983-08-16
申请号:CA336717
申请日:1979-10-01
Applicant: HOECHST AG
Inventor: STAHLHOFEN PAUL
IPC: G03C1/72 , G03F7/023 , H01L21/027 , G03C1/52
Abstract: \\ Hoe 78/K 065 LIGHT-SENSITIVE MIXTURE AND COPYING MATERIAL PRODUCED THEREFROM A positive-working light-sensitive copying material, in particular for the preparation of planographic printing plates, is described, the light-sensitive layer of which contains an ester or amide of a o-naphthoquinone diazide-sulfonic or -carboxylic acid, an alkali-soluble, water-insoluble phenolic resin and a condensation product of a hydroxybenzophenone and formaldehyde. The material is distinguished by an increased light-sensitivity.
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公开(公告)号:BR8203685A
公开(公告)日:1983-06-21
申请号:BR8203685
申请日:1982-06-24
Applicant: HOECHST AG
Inventor: STAHLHOFEN PAUL
Abstract: A light-sensitive mixture is described, which is specially intended for the production of planographic printing plates and which contains, as the light-sensitive compound, a naphthoquinonediazide sulfonic acid ester of the general formula I in which D is the 1,2-naphthoquinone-2-diazide-5-sulfonyl radical or the 1,2-naphthoquinone-2-diazide-4-sulfonyl radical, preferably the 1,2-naphthoquinone-2-diazide-5-sulfonyl radical, R and R' are hydrogen atoms, alkyl groups having 1 to 4 carbon atoms or radicals of the formula DO, and n denotes an integer from 6 to 18, preferably from 8 to 14. The new compounds are distinguished by good solubility and produce layers which have a high resistance to alkaline developer solutions and to damping solution containing alcohol.
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公开(公告)号:ZA824004B
公开(公告)日:1983-03-30
申请号:ZA824004
申请日:1982-06-08
Applicant: HOECHST AG
Inventor: STAHLHOFEN PAUL
Abstract: A light-sensitive mixture is described, which is specially intended for the production of planographic printing plates and which contains, as the light-sensitive compound, a naphthoquinonediazide sulfonic acid ester of the general formula I in which D is the 1,2-naphthoquinone-2-diazide-5-sulfonyl radical or the 1,2-naphthoquinone-2-diazide-4-sulfonyl radical, preferably the 1,2-naphthoquinone-2-diazide-5-sulfonyl radical, R and R' are hydrogen atoms, alkyl groups having 1 to 4 carbon atoms or radicals of the formula DO, and n denotes an integer from 6 to 18, preferably from 8 to 14. The new compounds are distinguished by good solubility and produce layers which have a high resistance to alkaline developer solutions and to damping solution containing alcohol.
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公开(公告)号:FI822470L
公开(公告)日:1983-01-15
申请号:FI822470
申请日:1982-07-12
Applicant: HOECHST AG
Inventor: STAHLHOFEN PAUL
Abstract: A light-sensitive mixture is described, which contains, as the light-sensitive compound, a 1,2-naphthoquinone-2-diazidesulfonic acid ester of the general formula I (I) in which R and R' denote hydrogen atoms or lower alkyl groups, X denotes a saturated alkylene, hydroxyalkylene or dihydroxyalkylene group having 6 to 18 carbon atoms, D denotes the 1,2-naphthoquinone-2-diazide-5-sulfonyl radical or the 1,2-naphthoquinone-2-diazide-4-sulfonyl radical and n denotes a number from 1 to 20. The new quinone diazides produce printing plates which are capable of long printing runs and have good resistance to developer and good flexibility of the printing stencil.
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公开(公告)号:ZA8107990B
公开(公告)日:1982-10-27
申请号:ZA8107990
申请日:1981-11-18
Applicant: HOECHST AG
Inventor: STAHLHOFEN PAUL
CPC classification number: G03F7/022
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公开(公告)号:DE3100856A1
公开(公告)日:1982-08-12
申请号:DE3100856
申请日:1981-01-14
Applicant: HOECHST AG
Inventor: STAHLHOFEN PAUL
IPC: G03C1/72 , C07C67/00 , C07C301/00 , C07C309/76 , G03C1/56 , G03C1/60 , G03F7/022 , G03F7/26 , H05K3/00 , G03C1/52 , G03F7/08
Abstract: A light-sensitive mixture comprising a light-sensitive naphthoquinone-diazide-sulfonic acid ester corresponding to the formula: I wherein D represents a 1,2-naphthoquinone-2-diazide-5-sulfonyl or -4-sulfonyl radical; R1, R2, R3, R1', R2' and R3' each represent hydrogen, halogen, alkyl groups having 1 to 4 carbon atoms or radicals of the formula DO and n represents an integer from 2 to 18; not more than three DO radicals in total being present on one benzene ring. The mixture is useful for preparing printing plates or photoresists.
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