公开(公告)号：JPS62116938A

公开(公告)日：1987-05-28

申请号：JP26790586

申请日：1986-11-12

Applicant: Hoechst Ag

Inventor： STAHLHOFEN PAUL ,  MOHR DIETER

IPC: B41N3/00 ,  B41N3/08 ,  G03F7/26 ,  G03F7/40

CPC classification number: B41N3/08 ,  G03F7/40

公开(公告)号：JPS57142635A

公开(公告)日：1982-09-03

申请号：JP234782

申请日：1982-01-12

Applicant: HOECHST AG

Inventor： STAHLHOFEN PAUL

IPC: G03C1/72 ,  C07C67/00 ,  C07C301/00 ,  C07C309/76 ,  G03C1/56 ,  G03C1/60 ,  G03F7/022 ,  G03F7/26 ,  H05K3/00

公开(公告)号：JPS5254503A

公开(公告)日：1977-05-04

申请号：JP12815976

申请日：1976-10-25

Applicant: HOECHST AG

Inventor： STAHLHOFEN PAUL ,  BEUTEL RAINER

IPC: G03C1/72 ,  G03F7/004 ,  G03F7/022

公开(公告)号：AT68893T

公开(公告)日：1991-11-15

申请号：AT86115242

申请日：1986-11-04

Applicant: HOECHST AG

Inventor： STAHLHOFEN PAUL ,  MOHR DIETER

IPC: B41N3/00 ,  B41N3/08 ,  G03F7/26 ,  G03F7/40

公开(公告)号：AU565579B2

公开(公告)日：1987-09-17

申请号：AU3050184

申请日：1984-07-11

Applicant: HOECHST AG

Inventor： STAHLHOFEN PAUL

IPC: G03F7/038 ,  G03C1/52 ,  G03C5/00 ,  G03F7/004 ,  G03F7/022 ,  G03F7/26 ,  G03F7/38 ,  G03F7/08 ,  H05K3/06

Abstract: A process for producing negative relief copies is disclosed in which a light-sensitive material, comprising (1) a light-sensitive ester or amide of a 1,2-quinone-diazide-sulfonic acid or of a 1,2-quinone-diazide-carboxylic acid and (2) a hexamethylol melamine ether is imagewise exposed, thereafter heated, and, after cooling, exposed again without an original, and subsequently developed by means of an aqueous-alkaline developer. The disclosed process permits the production of negative copies with the aid of a material which yields positive copies when it is processed in a conventional manner.

公开(公告)号：CA1213600A

公开(公告)日：1986-11-04

申请号：CA404463

申请日：1982-06-04

Applicant: HOECHST AG

Inventor： STAHLHOFEN PAUL

IPC: G03C1/72 ,  G03C1/52 ,  G03C1/56 ,  G03F7/022 ,  G03F7/26 ,  H01L21/027 ,  C07C143/68 ,  G03C1/54

Abstract: A light-sensitive mixture is described, which is specially intended for the production of planographic printing plates and which contains, as the light-sensitive compound, a naphthoquinonediazide sulfonic acid ester of the general formula I in which D is the 1, 2-naphthoquinone-2-diazide-5-sulfonyl radical or the 1, 2-naphthoquinone-2-diazide-4-sulfonyl radical, preferably the 1,2-naphthoquinone-2-diazide-5-sulfonyl radical, R and R' are hydrogen atoms, alkyl groups having 1 to 4 carbon atoms or radicals of the formula DO, and n denotes an integer from 6 to 18, preferably from 8 to 14. The new compounds are distinguished by good solubility and produce layers which have a high resistance to alkaline developer solutions and to damping solution containing alcohol.

公开(公告)号：ZA8507887B

公开(公告)日：1986-05-28

申请号：ZA8507887

申请日：1985-10-15

Applicant: HOECHST AG

Inventor： VOLLMANN HANSJOERG ,  STAHLHOFEN PAUL

IPC: G03C1/00 ,  G03C1/72 ,  G03C5/00 ,  G03F7/004 ,  G03F7/022 ,  G03F7/20 ,  G03F7/26 ,  G03F7/38 ,  G03F

CPC classification number: G03F7/2022 ,  G03F7/0226

公开(公告)号：HK15086A

公开(公告)日：1986-03-07

申请号：HK15086

申请日：1986-02-27

Applicant: HOECHST AG

Inventor： STAHLHOFEN PAUL

IPC: G03C1/72 ,  C07C67/00 ,  C07C301/00 ,  C07C309/76 ,  G03C1/56 ,  G03C1/60 ,  G03F7/022 ,  G03F7/26 ,  H05K3/00 ,  G03C1/94

Abstract: A light-sensitive mixture comprising a light-sensitive naphthoquinone-diazide-sulfonic acid ester corresponding to the formula: I wherein D represents a 1,2-naphthoquinone-2-diazide-5-sulfonyl or -4-sulfonyl radical; R1, R2, R3, R1', R2' and R3' each represent hydrogen, halogen, alkyl groups having 1 to 4 carbon atoms or radicals of the formula DO and n represents an integer from 2 to 18; not more than three DO radicals in total being present on one benzene ring. The mixture is useful for preparing printing plates or photoresists.

公开(公告)号：ZA8502068B

公开(公告)日：1985-11-27

申请号：ZA8502068

申请日：1985-03-20

Applicant: HOECHST AG

Inventor： STAHLHOFEN PAUL ,  SCHELL LONI

IPC: B41N3/08 ,  G03F7/40 ,  B41C

CPC classification number: B41N3/08 ,  G03F7/40

公开(公告)号：CA1183379A

公开(公告)日：1985-03-05

申请号：CA395918

申请日：1982-02-10

Applicant: HOECHST AG

Inventor： STAHLHOFEN PAUL

IPC: G03C1/72 ,  C08L61/00 ,  C08L61/04 ,  G03C1/60 ,  G03F7/00 ,  G03F7/004 ,  G03F7/021 ,  G03F7/022 ,  G03F7/023

Abstract: A light-sensitive mixture, which is composed of a lightsensitive compound, for example, an o-quinone-diazide or a diazonium salt polycondensate, or a light-sensitive combination of compounds, for example, a photolytic acid donor and an acetal compound or orthocarboxylic acid compound which can be cleaved by acid, and of a novolak having halogenated phenol units is described. The mixture is preferably used for the preparation of printing plates, in particular planographic printing plates, which have an improved resistance to aqueous-alkaline developer solutions, gasoline hydrocarbons and fountain solutions containing alcohol.