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11.

发明专利
FORMATION OF MULTILAYER RESIST ON SUBSTRATE 失效

公开(公告)号：JPS6014238A

公开(公告)日：1985-01-24

申请号：JP2882984

申请日：1984-02-20

Applicant: IBM

Inventor： HIROYUKI HIRAOKA , DONARUDO KURIFUOODO HOFUAA , ROBAATO DENISU MIRAA , RESUTAA ARIN BEDAASON , KAARUTON GURANTO UIRUSON

IPC: G03C5/00 , G03F7/075 , G03F7/09 , G03F7/26 , H01L21/027 , G03F7/00 , H01L21/30

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