公开(公告)号：NO801937L

公开(公告)日：1980-12-30

申请号：NO801937

申请日：1980-06-27

Applicant: IBM

Inventor： VIGAR JAMES MICHAEL LINFORD

IPC: C25D3/06 ,  C25D

Abstract: A process for plating thick chromium coatings for engineering applications comprises depositing a thin initial layer from a low concentration chromium III/thiocyanate bath and depositing the bulk of the remaining thickness from a relatively higher concentration chromium III/thiocyanate bath. Deposits produced by this two-stage process are more cohesive and smoother than those obtainable by plating the entire thickness from the high concentration bath alone.

公开(公告)号：NO801937A

公开(公告)日：1980-12-30

申请号：NO801937

申请日：1980-06-27

Applicant: IBM

Inventor： VIGAR JAMES MICHAEL LINFORD

IPC: C25D3/06 ,  C25D

CPC classification number: C25D3/06 ,  Y10T428/12854

公开(公告)号：DE2242095A1

公开(公告)日：1973-05-10

申请号：DE2242095

申请日：1972-08-26

Applicant: IBM

Inventor： KINGTON BRIAN WILLIAM ,  VIGAR JAMES MICHAEL LINFORD

IPC: G11B5/02 ,  G11B5/245 ,  G11B5/31 ,  G11B5/49 ,  G11B15/12 ,  G11B5/22

公开(公告)号：DK151905C

公开(公告)日：1988-08-08

申请号：DK277280

申请日：1980-06-27

Applicant: IBM

Inventor： VIGAR JAMES MICHAEL LINFORD

IPC: C25D3/06

Abstract: A process for plating thick chromium coatings for engineering applications comprises depositing a thin initial layer from a low concentration chromium III/thiocyanate bath and depositing the bulk of the remaining thickness from a relatively higher concentration chromium III/thiocyanate bath. Deposits produced by this two-stage process are more cohesive and smoother than those obtainable by plating the entire thickness from the high concentration bath alone.

公开(公告)号：DK151905B

公开(公告)日：1988-01-11

申请号：DK277280

申请日：1980-06-27

Applicant: IBM

Inventor： VIGAR JAMES MICHAEL LINFORD

IPC: C25D3/06

Abstract: A process for plating thick chromium coatings for engineering applications comprises depositing a thin initial layer from a low concentration chromium III/thiocyanate bath and depositing the bulk of the remaining thickness from a relatively higher concentration chromium III/thiocyanate bath. Deposits produced by this two-stage process are more cohesive and smoother than those obtainable by plating the entire thickness from the high concentration bath alone.

公开(公告)号：AT18075T

公开(公告)日：1986-03-15

申请号：AT82306021

申请日：1982-11-11

Applicant: IBM

Inventor： BARCLAY DONALD JOHN ,  MORGAN WILLIAM MORRIS ,  VIGAR JAMES MICHAEL LINFORD

IPC: C25D3/06 ,  C25D3/10 ,  C25D3/56

Abstract: A chromium electroplating electrolyte comprising a source of trivalent chromium ions, a complexant, a buffer agent and a sulphur species selected from sulphites and dithionites, the complexant being selected so that the stability constant K1 of the chromium complex as defined herein is in the range 10 M preferably the chromium ions have a molar concentration lower than 0.01M. Complexants within this range include aspartic acid, iminodiacetic acid, nitrilotriacetic acid, 5-sulphosalicylic acid and citric acid.

公开(公告)号：NO151474C

公开(公告)日：1985-04-17

申请号：NO801937

申请日：1980-06-27

Applicant: IBM

Inventor： VIGAR JAMES MICHAEL LINFORD

IPC: C25D3/06

Abstract: A process for plating thick chromium coatings for engineering applications comprises depositing a thin initial layer from a low concentration chromium III/thiocyanate bath and depositing the bulk of the remaining thickness from a relatively higher concentration chromium III/thiocyanate bath. Deposits produced by this two-stage process are more cohesive and smoother than those obtainable by plating the entire thickness from the high concentration bath alone.

公开(公告)号：NO151474B

公开(公告)日：1985-01-02

申请号：NO801937

申请日：1980-06-27

Applicant: IBM

Inventor： VIGAR JAMES MICHAEL LINFORD

IPC: C25D3/06

Abstract: A process for plating thick chromium coatings for engineering applications comprises depositing a thin initial layer from a low concentration chromium III/thiocyanate bath and depositing the bulk of the remaining thickness from a relatively higher concentration chromium III/thiocyanate bath. Deposits produced by this two-stage process are more cohesive and smoother than those obtainable by plating the entire thickness from the high concentration bath alone.

公开(公告)号：NO151473B

公开(公告)日：1985-01-02

申请号：NO793615

申请日：1979-11-09

Applicant: IBM

Inventor： BARCLAY DONALD JOHN ,  VIGAR JAMES MICHAEL LINFORD

IPC: C25D3/06 ,  C25D5/14

Abstract: A very low concentration (below 0.03 M) trivalent chromium plating bath in which the source of chromium is an equilibrated aqueous solution of a chromium (III) - thiocyanate complex gives a deposit of unexpectedly light color. Such a bath is employed to produce thin overcoatings of light colored chromium for decorative applications. The bath and process is also used to plate the initial layer of a thick (greater than 5 micron) deposit for engineering applications, the major part of which is plated from a higher chromium concentration bath. Such thick deposits from a higher concentration bath are more cohesive and smoother when plated over an initial layer from the low concentration bath.

公开(公告)号：FI63445C

公开(公告)日：1983-06-10

申请号：FI802060

申请日：1980-06-27

Applicant: IBM

Inventor： VIGAR JAMES MICHAEL LINFORD

IPC: C25D3/06

Abstract: A process for plating thick chromium coatings for engineering applications comprises depositing a thin initial layer from a low concentration chromium III/thiocyanate bath and depositing the bulk of the remaining thickness from a relatively higher concentration chromium III/thiocyanate bath. Deposits produced by this two-stage process are more cohesive and smoother than those obtainable by plating the entire thickness from the high concentration bath alone.