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公开(公告)号:DE10241379A1
公开(公告)日:2004-03-18
申请号:DE10241379
申请日:2002-09-06
Applicant: INFINEON TECHNOLOGIES AG
Inventor: TAKACS DEZSOE , STIFTINGER MARTIN
IPC: H01L27/105 , H01L27/115 , H01L27/12 , H01L29/78 , H01L29/786
Abstract: The transistor has an extension (6) in the direction of the surface (7) of the semiconductor body (3), perpendicular to the channel direction, exhibits an doping profile that increases in its depth from the surface of the semiconductor body before it reaching its maximum.