Abstract:
PROBLEM TO BE SOLVED: To provide an aqueous dispersion for chemical mechanical polishing capable of achieving both a high-polishing speed and suppression of corrosion generation to an aluminum film and its alloy film at a semiconductor device manufacturing step, and of showing a good storage stability, and provide a chemical mechanical polishing method using the same.SOLUTION: An aqueous dispersion for chemical mechanical polishing contains: (A) 0.1 mass% or more and 10 mass% or less of abrasive grains; and (B) 0.01 mass% or more and 2 mass% or less of a phosphate ester compound having a 1-5C organic group. The pH is 1 or more and 4 or less.
Abstract:
PROBLEM TO BE SOLVED: To provide a packing structure having excellent holdability of an end face of a roll formed by winding a film for forming an electronic device member, capable of suppressing an offset of an end face due to impacts during transportation, and having excellent handling and packing ability of the roll. SOLUTION: The packing structure 1 includes a pedestal 2 and a lid body 3 provided to be attached to and detached from the pedestal 2. The packing structure 1 accommodates a roll which is formed by winding a film for forming an electronic device member around a core. The packing structure 1 includes on the inside thereof a pair of receiving parts 21 provided at the pedestal 2 so as to oppose to each other and supporting the end parts of the core of the roll, a clamper 22 detachably provided at the receiving parts 21 and clamping the end part of the core between the receiving parts 21, and fixture band configured to be attached to and detached from the core from the peripheral surface side of the core and securing the end face of the film for forming the electronic device member by pressing the end face. COPYRIGHT: (C)2009,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide an aqueous dispersion for chemical mechanical polishing capable of sufficiently increasing a polishing speed ratio of a silicon nitride film relative to a silicon oxide film or a polysilicon film without needing high polishing pressure and good in storage stability, and a chemical mechanical polishing method using the aqueous dispersion for chemical mechanical polishing.SOLUTION: An aqueous dispersion for chemical mechanical polishing according to the present invention contains (A) a silica particle having at least one functional group selected from the group consisting of a sulfo group and a salt thereof, and (B) a nonionic surfactant having a triple bond, and has a pH of 2 or more and 7 or less.
Abstract:
PROBLEM TO BE SOLVED: To provide a dispersion for chemical and mechanical polishing which satisfies all characteristics of the stability by which silica particles are not precipitated, the high polishing rate for an aluminum film and the low polishing rate of a silicon oxide film, and to provide a chemical and mechanical polishing method using the same.SOLUTION: The dispersion contains (A) the silica particle having at least one kind of a functional group selected from a group comprising sulfo group and its salt and (B) a water-soluble polymer including a repeating unit originating in at least one kind selected from a group comprising N-vinyl pyrrolidone and its derivative and has pH of ≥2 and ≤8.
Abstract:
PROBLEM TO BE SOLVED: To provide a photosensitive paste composition and a pattern forming method, which are suitably used to form a high-sensitivity and high-accuracy pattern in manufacturing of a display panel such as a flat panel display or a circuit board having a fine pattern of electrode or the like used for a high-density mounting material for electronic part and a solar battery material. SOLUTION: The photosensitive paste composition includes: (A) aluminum powder at least part of the surface of which is coated with at least one selected from silicon oxide, zirconium oxide and titanium oxide; (B) glass powder; (C) an alkali soluble resin; (D) a multifunctional (meth)acrylate; and (E) a photopolymerization initiator. COPYRIGHT: (C)2010,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide an inorganic powder-containing resin composition capable of forming a black matrix with good sensitivity, a transfer film having an inorganic powder-containing resin layer comprising the inorganic powder-containing resin composition, and a method for manufacturing a flat panel display capable of forming a black matrix which is flat and smooth, has no warpage, and has good patterning performance. SOLUTION: The transfer film having the inorganic powder-containing resin layer comprising the inorganic powder-containing resin composition of the present invention obtained by using a specific photoinitiator can provide the flat panel display capable of forming a black matrix which is flat and smooth, has no warpage, and has excellent patterning performance. COPYRIGHT: (C)2009,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide an inorganic powder-containing resin composition which achieves high solvent resistance of a pattern after development and can form a black matrix suitable for batch formation of a plurality of members; a transfer film having an inorganic powder-containing resin layer comprising the inorganic powder-containing resin composition; and a method for manufacturing a flat panel display in which a plurality of members including a black matrix are batch-formed. SOLUTION: The inorganic powder-containing resin composition comprises (A) (A-1) a black pigment and (A-2) glass powder as inorganic powder, (B) a binder resin, (C) a photopolymerizable monomer and (D) a photopolymerization initiator, wherein the binder resin (B) is a resin having a urethane bond and an unsaturated double bond in a side chain. COPYRIGHT: (C)2008,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide an inorganic powder contained resin composition capable of forming suitably a black matrix with low transmissivity, a transfer film having an inorganic powder contained resin layer consisting of the inorganic powder contained resin composition, and to provide a manufacturing method of a flat panel display to form a black matrix with low reflectance and transmissivity and superior in light shielding. SOLUTION: The inorganic powder-contained resin composition contains (A) (A-1) pigment and (A-2) glass powder as an inorganic powder, (B) a binder resin, (C) a photo-polymerizable monomer, and (D) a photo-polymerization initiator, and the ratio of the (A-2) glass powder occupied in the (A) inorganic powder is 70-95 mass%. COPYRIGHT: (C)2008,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a manufacturing method of an FPD capable of efficiently forming a plurality of elements (for example a black matrix and electrode pattern or the like) for structuring the flat panel display (FPD), and provide a transfer film suitably used in the manufacturing method. SOLUTION: The manufacturing method of the FPD includes a process of forming a laminated film, which contains a resin layer containing photosensitive inorganic powder abutting on a transparent substrate, on the transparent substrate, a process of pattern-exposing the transparent substrate with the laminated film formed thereon from a side of a transparent substrate surface and a side of a laminated film forming surface respectively, a process of forming a laminated film pattern by developing and etching the respective layers structuring the laminated film, and a process of burning the laminated film pattern. COPYRIGHT: (C)2008,JPO&INPIT