公开(公告)号：JP2017116657A

公开(公告)日：2017-06-29

申请号：JP2015250074

申请日：2015-12-22

Applicant: Jsr株式会社 ,  Jsr Corp ,  Jsr株式会社

Inventor： KINOSHITA YOSHINORI ,  KUDO KAZUO

IPC: G03F7/40

Abstract: 【課題】互いに平行配置された、断面形状が略矩形の複数の線状部材からなるラインパターンの製造方法において、現像残渣を低減でき、ラインパターンの解像性に優れた方法を提供する。【解決手段】互いに平行配置された複数の線状部材からなり、前記線状部材の断面形状が略矩形であるラインパターンと、前記線状部材の側面に形成された光反射面とを有する光制御部材における前記ラインパターンの製造方法であり、(a)感放射線性組成物を用いて膜を形成する工程と、(b)前記膜に放射線をラインパターン状に照射する工程と、(c)放射線照射後の前記膜を現像してパターンを形成する工程と、(d)前記パターンに気流を当てる工程とを有することを特徴とするラインパターンの製造方法。【選択図】なし

公开(公告)号：JP2012168289A

公开(公告)日：2012-09-06

申请号：JP2011027834

申请日：2011-02-10

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： KINOSHITA YOSHINORI ,  HANAMURA MASAAKI

IPC: G03F7/075 ,  C08G59/20 ,  C08G77/14 ,  G03F7/022 ,  G03F7/40

CPC classification number: C08G77/14 ,  C08G77/80 ,  C08L83/06 ,  C08L83/00

Abstract: PROBLEM TO BE SOLVED: To provide a positive radiation-sensitive resin composition having a sufficient sensitivity, to provide an interlayer insulating film that uses the positive radiation-sensitive resin composition, has a superior melt flow resistance, heat resistance, and solvent resistance and has a superior voltage holding ratio, and to provide a formation method thereof.SOLUTION: The positive radiation-sensitive resin composition according to the present invention includes: [A1] polyorganosiloxane in which a content ratio of an organic group having an epoxy group out of organic groups bonded to silicon atom at a carbon atom is equal to or greater than 0 mol% but less than 50 mol% and [A2] polyorganosiloxane in which the content ratio of the same is equal to or greater than 50 mol% but less than 100 mol%.

Abstract translation: 要解决的问题：为了提供具有足够灵敏度的正性辐射敏感性树脂组合物，提供使用正性辐射敏感性树脂组合物的层间绝缘膜，具有优异的熔体流动阻力，耐热性和溶剂 并且具有优异的电压保持率，并提供其形成方法。 ＆lt; P＆gt;解决方案：根据本发明的正性辐射敏感性树脂组合物包括：[A1]在碳原子上与硅原子键合的有机基团中具有环氧基的有机基团的含量比相等的聚有机硅氧烷 以上且0摩尔％以上且50摩尔％以下的含量比为50摩尔％以下且[A2]聚有机硅氧烷的含量比例为50摩尔％以上且小于100摩尔％。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012155226A

公开(公告)日：2012-08-16

申请号：JP2011015780

申请日：2011-01-27

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： KINOSHITA YOSHINORI ,  DOIMOTO MITSUNOBU

IPC: G03F7/075 ,  C08G77/28 ,  G02F1/1333 ,  G02F1/1343 ,  G03F7/023 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a polysiloxane based positive type radiation-sensitive composition with which a cured film for a display element, having excellent adhesion to an electrode such as an ITO film and excellent heat resistance, can be formed.SOLUTION: A positive type radiation-sensitive composition according to the invention contains [A] a polysiloxane having mercapto groups and [B] a quinonediazide compound. A content of the mercapto groups relative to Si atoms in [A] the polysiloxane having the mercapto groups is greater than 5 mol% and 60 mol% or less.

Abstract translation: 要解决的问题：提供一种聚硅氧烷基正型辐射敏感性组合物，通过该组合物可以形成对诸如ITO膜的电极具有优异粘合性和优异的耐热性的显示元件用固化膜。 解决方案：根据本发明的正型辐射敏感组合物含有[A]具有巯基的聚硅氧烷和[B]醌二叠氮化合物。 [A]具有巯基的聚硅氧烷中巯基相对于Si原子的含量大于5mol％和60mol％以下。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2008239778A

公开(公告)日：2008-10-09

申请号：JP2007081785

申请日：2007-03-27

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： KINOSHITA YOSHINORI ,  YOSHIDA TAKESHI ,  NODA MASAHIRO ,  IWAMOTO SATOSHI ,  ITANO TAKAFUMI

IPC: C08F2/44 ,  C08F2/50 ,  C08F290/08 ,  H01J11/44

Abstract: PROBLEM TO BE SOLVED: To provide an inorganic powder-containing resin composition capable of forming a black matrix with good sensitivity, a transfer film having an inorganic powder-containing resin layer comprising the inorganic powder-containing resin composition, and a method for manufacturing a flat panel display capable of forming a black matrix which is flat and smooth, has no warpage, and has good patterning performance.
SOLUTION: The transfer film having the inorganic powder-containing resin layer comprising the inorganic powder-containing resin composition of the present invention obtained by using a specific photoinitiator can provide the flat panel display capable of forming a black matrix which is flat and smooth, has no warpage, and has excellent patterning performance.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 待解决的问题：为了提供一种能够形成具有良好灵敏度的黑色矩阵的含无机粉末的树脂组合物，具有含有无机粉末的树脂组合物的无机粉末的树脂层的转移膜和方法 为了制造能够形成平坦光滑的黑矩阵的平板显示器，没有翘曲，并且具有良好的图案化性能。 解决方案：具有含无机粉末的树脂层的转移膜包含通过使用特定的光引发剂获得的本发明的含无机粉末的树脂组合物可以提供能够形成平坦的黑矩阵的平板显示器， 光滑，无翘曲，并具有优异的图案性能。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009223293A

公开(公告)日：2009-10-01

申请号：JP2009004674

申请日：2009-01-13

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： HANAMURA MASAAKI ,  YOSHIDA SHIN ,  ARITOME ISAO ,  KINOSHITA YOSHINORI

IPC: G03F7/075 ,  C08F290/06 ,  C08F299/08 ,  G02B5/20 ,  G02F1/1333 ,  G02F1/1335 ,  G03F7/004 ,  G03F7/023 ,  G03F7/20 ,  G03F7/40 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive composition having high radiation sensitivity and such a development margin as to form a good pattern shape even by development for over an optimum developing time in a developing step, the composition easily forming a patterned thin film excellent in adhesion and being suitable for forming an interlayer dielectric or microlenses. SOLUTION: The radiation-sensitive resin composition includes a polysiloxane having a polymerizable unsaturated bond and a 1,2-quinonediazide compound. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：为了提供具有高辐射敏感性和这种显影余量的辐射敏感组合物，即使在显影步骤中的最佳显影时间下通过显影形成良好图案形状，组合物容易形成 图案化的薄膜具有优异的粘附性并适于形成层间电介质或微透镜。 解决方案：辐射敏感性树脂组合物包括具有可聚合不饱和键的聚硅氧烷和1,2-醌二叠氮化合物。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2010008603A

公开(公告)日：2010-01-14

申请号：JP2008166500

申请日：2008-06-25

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： HANAMURA MASAAKI ,  KINOSHITA YOSHINORI

IPC: G03F7/075 ,  C08G77/14 ,  G02F1/1368 ,  G03F7/004 ,  G03F7/40 ,  G09F9/00 ,  G09F9/30 ,  H01L51/50

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition for forming wiring partitions having sufficient resolution, wide exposure margin, and excellent flattening performance, maintaining high transparency even when being passed through a high temperature heating process and hardly secularly deteriorating metal wiring.
SOLUTION: The radiation sensitive resin composition contains (A) polysiloxane obtained by poly-condensing (a-1) 50-99 wt.% of an alkoxy silane compound having an aryl group, (a-2) 1-45 wt.% of a silane compound having an alkyl group, and (a-3) 0-5 wt.% of the other alkoxy silane compound, and (B) a compound generating acid by receiving irradiation of radiation.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于形成具有足够的分辨率，宽的曝光裕度和优异的平坦化性能的布线隔板的辐射敏感性树脂组合物，即使当通过高温加热工艺并且几乎不会劣化金属时也保持高透明度 接线。 解决方案：辐射敏感性树脂组合物含有（A）通过聚缩合（a-1）50-99重量％的具有芳基的烷氧基硅烷化合物（a-2）1-45重量％ ％的具有烷基的硅烷化合物和（a-3）0-5重量％的其它烷氧基硅烷化合物，和（B）通过接收辐射辐射产生酸的化合物。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2010134422A

公开(公告)日：2010-06-17

申请号：JP2009195974

申请日：2009-08-26

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： KINOSHITA YOSHINORI ,  HANAMURA MASAAKI ,  DOI TAKASHI ,  TAKASE HIDEAKI

IPC: G03F7/023 ,  G02B1/04 ,  G02B3/00 ,  G03F7/004 ,  G03F7/40

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having high sensitivity to radiation and having such a development margin that desirable pattern configuration is formed even when the optimum development time is exceeded in the development step.
SOLUTION: The radiation-sensitive resin composition includes [A] an alkali-soluble resin, [B] a 1,2-quinonediazide compound, and [C] a compound having at least one ethylenically unsaturated bond per molecule and having a skeleton derived from trimethylolpropane or pentaerythritol or an isocyanurate skeleton. The alkali-soluble resin [A] may be a copolymer of unsaturated compounds including (a1) an unsaturated carboxylic acid and/or unsaturated carboxylic anhydride and (a2) an epoxy group-containing unsaturated compound.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供对辐射具有高灵敏度的辐射敏感性树脂组合物，并且具有即使在显影步骤中超过最佳显影时间时形成所需图案构型的显影余量。 解决方案：辐射敏感性树脂组合物包括[A]碱溶性树脂，[B] 1,2-醌二叠氮化合物和[C]每分子具有至少一个烯属不饱和键的化合物，并具有 衍生自三羟甲基丙烷或季戊四醇的骨架或异氰脲酸酯骨架。 碱溶性树脂[A]可以是包含（a1）不饱和羧酸和/或不饱和羧酸酐的不饱和化合物和（a2）含环氧基的不饱和化合物的共聚物。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2008242246A

公开(公告)日：2008-10-09

申请号：JP2007085065

申请日：2007-03-28

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YOSHIDA TAKESHI ,  KINOSHITA YOSHINORI

IPC: G03F7/033 ,  C08F2/44 ,  C08F265/06 ,  G03F7/004 ,  G03F7/075 ,  H01J9/02

Abstract: PROBLEM TO BE SOLVED: To provide a resin composition containing inorganic powder with which a black matrix, an insulating film, a barrier wall, a circuit material or the like for a flat panel display having favorable sensitivity can be formed. SOLUTION: The resin composition containing inorganic powder comprises: (A) an inorganic powder containing a pigment and a glass powder; (B) a binder resin containing an alkali-soluble resin having a structural unit derived from a compound expressed by formula (1); (C) a photopolymerizable monomer; and (D) a photopolymerization initiator. In formula (1), R 1 represents a hydrogen atom or a 1-5C monovalent hydrocarbon group; and R2 represents a divalent organic group. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种含有无机粉末的树脂组合物，可以形成具有良好灵敏度的平板显示器的黑色矩阵，绝缘膜，阻挡壁，电路材料等。 解决方案：含有无机粉末的树脂组合物包括：（A）含有颜料和玻璃粉末的无机粉末; （B）含有具有由式（1）表示的化合物衍生的结构单元的碱溶性树脂的粘合剂树脂; （C）可光聚合单体; 和（D）光聚合引发剂。 式（1）中，R“SP”表示氢原子或1-5C一价烃基; R2代表二价有机基团。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2010224067A

公开(公告)日：2010-10-07

申请号：JP2009069134

申请日：2009-03-19

Applicant: JSR CORP

Inventor： HAMAGUCHI HITOSHI ,  SUZUKI TAKAHISA ,  KINOSHITA YOSHINORI

IPC: G03F7/004 ,  C08F2/44 ,  C08F2/50 ,  C08F220/32 ,  G02F1/1339 ,  G02F1/1368 ,  G03F7/031 ,  G03F7/033 ,  G03F7/40 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition for forming an interlayer insulating film, a protective film and a spacer from a single kind of a radiation-sensitive resin composition, achieving high sensitivity, high flatness, high adhesion property and high transmittance in the interlayer insulating film and in the protective film, and achieving high resolution and high sensitivity in the spacer. SOLUTION: The radiation-sensitive resin composition includes (A) a copolymer, (B) a polymerizable compound, (C) a radiation-sensitive polymerization initiator, and (D) at least one compound selected from a group of compounds having a hindered phenol structure, a hindered amine structure, alkylphosphate structure or a thioether structure. COPYRIGHT: (C)2011,JPO&INPIT