Abstract:
PROBLEM TO BE SOLVED: To provide a method of producing resin for photoresist by which the resin for photoresist is efficiently separated from a slurry solution containing the resin for photoresist with high filtration speed. SOLUTION: The method of producing the resin for the photoresist by polymerizing a polymerizable compound in the presence of a solvent includes: (1) a resin solution preparation step of preparing a resin solution containing the resin for photoresist; (2) a purification step of purifying the solution by re-precipitation; (3) a cooling step of cooling the slurry solution containing the resin for photoresist after purification; and (4) a filtration step of separating the resin for photoresist by filtering the cooled slurry solution. COPYRIGHT: (C)2009,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To obtain a radiation sensitive resin composition which can acquire a sufficient spacer configuration even in the exposure of not more than 1,200 J/m 2 with high sensitivity and high resolution and also can form a spacer for a liquid crystal display element excellent in elastic recovery, rubbing resistance, adhesiveness with a transparent substrate, heat resistance, or the like. SOLUTION: The radiation sensitive resin composition comprises: a polymer which is obtained by reacting an isocyanate compound expressed by formula (1) (in formula (1), R 1 represents hydrogen atom or methyl group and R 2 represents an alkylene group) with a copolymer of (a1) an unsaturated carboxylic acid and/or an unsaturated carboxylic acid anhydride, (a2) an epoxy group-containing unsaturated compound, (a3) a hydroxyl group-containing unsaturated compound, and (a4) another unsaturated compound; a polymerizable unsaturated compound; and a radiation sensitive polymerization initiator. COPYRIGHT: (C)2006,JPO&NCIPI
Abstract:
PROBLEM TO BE SOLVED: To provide a composition for forming a tantalum oxide film capable of easily and efficiently forming a high quality tantalum oxide film having a large specific dielectric constant and a less leak current and being preservable for a long time under an atmospheric condition at a high humidity, a tantalum oxide film formed thereby, and its manufacturing method. SOLUTION: The composition for forming the tantalum oxide film contains a reaction product prepared from tantalum alkoxide and at least one or more kinds among carboxylic acids and carboxylic acid anhydrides and a solvent. The tantalum oxide film is formed by forming a coating film of the composition and then treating it with heat and/or light. COPYRIGHT: (C)2005,JPO&NCIPI
Abstract:
PROBLEM TO BE SOLVED: To provide a coating composition for producing films having high moistureproofness and good gas-barrier property, and to provide such films formed using the same. SOLUTION: The coating composition comprises a metal-containing product and a solvent. The metal-containing product is selected from the compounds [A1] and [A2]. The compound [A1] is a reaction product from a component (a1) and a component (a2). The component (a1) is at least one compound selected from (1) a metal alkoxide and (2) a reaction product from the metal alkoxide and at least one compound selected from the group consisting of β- diketone, β-ketoester, β-dicarboxylic ester, lactic acid, ethyl lactate and 1,5- cyclooctadiene, and the component (a2) is at least one compound selected from an amino alcohol and a compound having in the molecule two or more hydroxy groups (except the amino alcohol). The component [A2] is the hydrolyzate of the compound [A1]. COPYRIGHT: (C)2003,JPO
Abstract:
PROBLEM TO BE SOLVED: To provide a composition for easily and effectively forming a high quality tantalum oxide film with small leak current by a simple coating method and to provide a method for forming a tantalum oxide film. SOLUTION: This composition for forming a tantalum oxide film comprises [A] a reaction product of (a1) a tantalum alkoxide with (a2) at least a compound selected from among an amino alcohol, a compound having two or more hydroxy groups in the molecule (except the amino alcohol), β-diketone, β- ketoester, β-dicarboxylic ester, lactic acid, ethyl lactate and 1,5-cyclooctadiene, and [B] a solvent, characterized in that the conversion rate of an alkoxy group in the tantalum alkoxide is 50 mol% or more. This method for forming a tantalum oxide film is characterized by coating the above composition on a substrate in the atmosphere of less than 5.0 g/m humidity and treating with heat and/or light.
Abstract:
PROBLEM TO BE SOLVED: To provide a method of manufacturing a liquid crystal display device that is wide in viewing angle, high in the response speed of a liquid crystal molecule, and high in display characteristics and long-term reliability. SOLUTION: The method includes steps of forming coating films by coating conductive films of a pair of substrates having the conductive film with a polymer composition containing (A) a first polymer as polyorganosiloxane containing a (meth)acryloyl group and (B) a second polymer as one type selected from a group composed of a polyamic acid and a polyimide, forming a liquid crystal cell having a constitution where the coating films of the pair of substrates having the coating films are arranged via a liquid crystal layer as relatively oppositely, and irradiating the liquid crystal cell with light in a state that a voltage is applied between the conductive films included in the pair of substrates. COPYRIGHT: (C)2011,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a method of manufacturing a liquid crystal display device excellent in electrical characteristics while achieving high luminance and high-speed response.SOLUTION: In the method of manufacturing the liquid crystal display device, a nematic liquid crystal with negative dielectric anisotropy is interposed between respective films of two sheets of substrates with polymer films having a predetermined structure represented by a structure expressed by formula (I-1-2) formed thereon (in formula (I-1-2), Ris a hydrogen atom, a halogen atom, a cyano group, a nitro group or an NCS group, or a 1-12C alkyl group which is optionally substituted with fluorine, of which one or two nonadjacent -CH- groups are optionally substituted with oxygen atoms, -COO-, -OCO-, or -CO-, and of which the -CHCH- group is optionally substituted with -CH=CH-), and the manufacturing undergoes a step including irradiation of light in a state in which voltage is applied between respective transparent pixel electrodes of the two sheets of substrates so as to align the liquid crystal.
Abstract:
PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition having a high sensitivity and high resolution, capable of obtaining a sufficient pattern form even under ≥1,200 J/m 2 exposure, excellent in elastic recovery, rubbing resistance, close adhesion with a transparent substrate plate, heat resistance, etc., and further capable of forming a spacer for a liquid crystal-displaying element, sufficiently showing peeling liquid resistance on peeling its orientation membrane. SOLUTION: This radiation sensitive resin composition comprises [A] a polymer obtained by reacting an isocyanate compound expressed by formula (7) with a copolymer consisting of an unsaturated carboxylic acid and/or unsaturated carboxylic acid anhydride, hydroxy-containing unsaturated compound, oxetanyl group-containing unsaturated compound and other unsaturated compound other than the above mentioned unsaturated compounds, [B] a polymerizable unsaturated compound and [C] a radiation sensitive polymerization initiator. COPYRIGHT: (C)2007,JPO&INPIT
Abstract translation:要解决的问题:为了提供具有高灵敏度和高分辨率的辐射敏感性树脂组合物,即使在≥1,200J/ m 2 /曝光下也能获得足够的图案形式,弹性优异 恢复,耐摩擦性,与透明基板的紧密粘合性,耐热性等,并且还能够形成用于液晶显示元件的间隔件,在剥离其取向膜时充分显示剥离液体电阻。 解决方案:该辐射敏感性树脂组合物包含[A]通过使由式(7)表示的异氰酸酯化合物与由不饱和羧酸和/或不饱和羧酸酐组成的共聚物,含羟基的不饱和化合物 ,含有氧杂环丁烷基的不饱和化合物和其它不饱和化合物,[B]可聚合不饱和化合物和[C]辐射敏感聚合引发剂。 版权所有(C)2007,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition of high sensitivity and high resolution, and excellent in resilience, rubbing resistance, adhesivity to a transparent substrate and thermal resistance. SOLUTION: This radiation-sensitive resin composition comprises a copolymer having a weight-average molecular weight of 2,000-100,000, obtained by copolymerizing an unsaturated carboxylic acid and/or carboxylic acid anhydride, an unsaturated compound expressed by formula (1) and other unsaturated compounds, a polymerizable unsaturated compound and a radiation-sensitive polymerization initiator. COPYRIGHT: (C)2006,JPO&NCIPI
Abstract:
PROBLEM TO BE SOLVED: To provide a method for forming a film using a conductive film forming composition in which wiring or an electrode used suitably in an electronic device can be formed inexpensively. SOLUTION: In the method for forming wiring or an electrode, (A) a complex of an amine compound and a hydrogenated aluminium compound, (B) a compound or a complex containing a titanium compound, and (C) a composition containing metal particles are applied to a substrate and then subjected to heat and/or optical treatment. COPYRIGHT: (C)2005,JPO&NCIPI