公开(公告)号：WO2016183031A1

公开(公告)日：2016-11-17

申请号：PCT/US2016/031526

申请日：2016-05-09

Applicant: KLA-TENCOR CORPORATION

Inventor： SAPIENS, Noam ,  PETERLINZ, Kevin A. ,  BUETTNER, Alexander ,  PURRUCKER, Kerstin ,  SHCHEGROV, Andrei V.

IPC: G01N21/956

CPC classification number: G01B11/24 ,  G01B2210/56 ,  G01N21/956 ,  G01N2021/213 ,  G03F7/70625

Abstract: Methods and systems are presented to reduce the illumination spot size projected onto a measurement target and associated spillover onto area surrounding a measurement target. In one aspect, a spatial light modulator (SLM) is located in the illumination path between the illumination light source and the measurement sample. The SLM is configured to modulate amplitude, phase, or both, across the path of the illumination light to reduce wavefront errors. In some embodiments, the desired state of the SLM is based on wavefront measurements performed in an optical path of the metrology system. In another aspect, an illumination aperture having an image plane tilted at an oblique angle with respect to a beam of illumination light is employed to overcome defocusing effects in metrology systems that employ oblique illumination of the measurement sample. In some embodiments, the illumination aperture, objective lens, and specimen are aligned to satisfy the Scheimpflug condition.

Abstract translation: 呈现方法和系统以减少投影到测量目标上的照明光点尺寸和相关联的外溢到测量目标周围的区域。 在一个方面，空间光调制器（SLM）位于照明光源和测量样本之间的照明路径中。 SLM被配置为在照明光的路径上调制幅度，相位或两者以减少波前误差。 在一些实施例中，SLM的期望状态基于在计量系统的光路中执行的波前测量。 在另一方面，采用具有相对于照明光束倾斜倾斜角的图像平面的照明孔，以克服采用测量样品的倾斜照明的度量系统中的散焦效应。 在一些实施例中，照明孔径，物镜和样本被对准以满足Scheimpflug条件。

公开(公告)号：WO2015100364A1

公开(公告)日：2015-07-02

申请号：PCT/US2014/072241

申请日：2014-12-23

Applicant: KLA-TENCOR CORPORATION

Inventor： SHCHEGROV, Andrei V. ,  KRISHNAN, Shankar ,  PTERLINZ, Kevin ,  DZIURA, Thaddeus Gerard ,  SAPIENS, Noam ,  PANDEV, Stilian Ivanov

IPC: H01L21/66

CPC classification number: G01B11/272 ,  G01B2210/56 ,  G03F7/0002 ,  G03F7/70141 ,  G03F7/70625 ,  H01L22/12 ,  H01L22/30

Abstract: Methods and systems for evaluating the performance of multiple patterning processes are presented. Patterned structures are measured and one or more parameter values characterizing geometric errors induced by the multiple patterning process are determined. In some examples, a single patterned target and a multiple patterned target are measured, the collected data fit to a combined measurement model, and the value of a structural parameter indicative of a geometric error induced by the multiple patterning process is determined based on the fit. In some other examples, light having a diffraction order different from zero is collected and analyzed to determine the value of a structural parameter that is indicative of a geometric error induced by a multiple patterning process. In some embodiments, a single diffraction order different from zero is collected. In some examples, a metrology target is designed to enhance light diffracted at an order different from zero.

Abstract translation: 提出了评估多个图案化工艺性能的方法和系统。 测量图案化结构，并确定表征由多重图案化工艺引起的几何误差的一个或多个参数值。 在一些示例中，测量单个图案化靶和多个图案化靶，所收集的数据拟合到组合测量模型，并且基于拟合来确定指示由多次图案化工艺引起的几何误差的结构参数的值 。 在一些其他示例中，收集并分析具有不同于零的衍射级的光，并分析其结果参数的值，该结构参数指示由多重图案化工艺引起的几何误差。 在一些实施例中，收集不同于零的单个衍射级。 在一些示例中，度量目标被设计为增强以不同于零的顺序衍射的光。

公开(公告)号：WO2014062972A1

公开(公告)日：2014-04-24

申请号：PCT/US2013/065527

申请日：2013-10-17

Applicant: KLA-TENCOR CORPORATION

Inventor： BRINGOLTZ, Barak ,  KANDEL, Daniel ,  FELER, Yoel ,  SAPIENS, Noam ,  IRINA, Paykin ,  SVIZHER, Alexander ,  ALONI, Meir ,  BEN DOV, Guy ,  SHALMONI, Hadar ,  LEVINSKI, Vladimir

IPC: G01N21/47 ,  G01B9/02 ,  H01L21/66

CPC classification number: G01N21/01 ,  G01B11/272 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/956 ,  G01N2201/068 ,  G02B27/4255 ,  G02B27/4272 ,  G03F7/70633 ,  G03F7/70683

Abstract: Metrology methods, systems and targets are provided, which implement a side by side paradigm. Adjacent cells with periodic structures are used to extract the overlay error, e.g., by introducing controllable phase shifts or image shifts which enable algorithmic computation of the overlay. The periodic structures are designed to exhibit a rotational symmetry to support the computation and reduce errors.

Abstract translation: 提供了计量方法，系统和目标，实现了并行范例。 使用具有周期性结构的相邻小区来提取覆盖误差，例如通过引入可控相移或图像偏移，这使得能够进行覆盖的算法计算。 周期性结构被设计为展现旋转对称性以支持计算并减少误差。

公开(公告)号：WO2011011511A1

公开(公告)日：2011-01-27

申请号：PCT/US2010/042738

申请日：2010-07-21

Applicant: KLA-TENCOR CORPORATION ,  KANDEL, Daniel ,  LEVINSKI, Vladimir ,  SAPIENS, Noam

Inventor： KANDEL, Daniel ,  LEVINSKI, Vladimir ,  SAPIENS, Noam

IPC: G01J4/00

CPC classification number: G01N21/95607 ,  G01B11/14 ,  G01B11/24 ,  G01B2210/56 ,  G03F7/70633

Abstract: A method for determining an overlay offset may include, but is not limited to: obtaining a first anti-symmetric differential signal (ΔS 1 ) associated with a first scatterometry cell; obtaining a second anti-symmetric differential signal (ΔS 2 ) associated with a second scatterometry cell and computing an overlay offset from the first anti-symmetric differential (ΔS 1 ) signal associated with the first scatterometry cell and the second anti-symmetric differential signal (ΔS 2 ) associated with the second scatterometry cell.

Abstract translation: 用于确定覆盖偏移的方法可以包括但不限于：获得与第一散射测量单元相关联的第一反对称差分信号（ΔS1）; 获得与第二散射测量单元相关联的第二反对称差分信号（θS2），并计算与第一散射测量单元和第二反对称差分信号相关联的第一反对称差分（ΔS1）信号的叠加偏移（ βS2）与第二散射测量单元相关联。

公开(公告)号：EP2724361A2

公开(公告)日：2014-04-30

申请号：EP12803940.1

申请日：2012-06-07

Applicant: KLA-Tencor Corporation

Inventor： MANASSEN, Amnon ,  SELIGSON, Joel ,  SAPIENS, Noam

IPC: H01L21/027

CPC classification number: G01J1/4257 ,  G02B21/0016 ,  G02B21/082 ,  G02B21/365 ,  G02B26/0833 ,  G03F7/70633

Abstract: An optical system may include an objective, a source of illumination, an illumination system having illumination optics configured to direct the illumination onto the objective, and at least two dynamic optical array devices located at a pupil conjugate plane and a field conjugate plane, respectively in the illumination optics. The dynamic optical array devices are configured to control one or more properties of illumination coupled from the illumination system to the objective.

Abstract translation: 光学系统可以包括物镜，照明源，具有被配置为将照明引导到物镜上的照明光学器件的照明系统以及分别位于光瞳共轭平面和场共轭平面处的至少两个动态光学阵列装置 照明光学器件。 动态光学阵列装置被配置为控制从照明系统耦合到物镜的照明的一个或多个特性。

公开(公告)号：EP2694983A1

公开(公告)日：2014-02-12

申请号：EP12768608.7

申请日：2012-04-04

Applicant: KLA-Tencor Corporation

Inventor： KANDEL, Daniel ,  COHEN, Guy ,  KLEIN, Dana ,  LEVINSKI, Vladimir ,  SAPIENS, Noam ,  SHULMAN, Alex ,  KAMENETSKY, Vladimir ,  AMIT, Eran ,  VAKSHTEIN, Irina

IPC: G01N37/00

CPC classification number: G03F7/70633 ,  G01N2223/6116 ,  G03F1/48 ,  G03F7/70616

Abstract: The present invention may include acquiring a plurality of overlay metrology measurement signals from a plurality of metrology targets distributed across one or more fields of a wafer of a lot of wafers, determining a plurality of overlay estimates for each of the plurality of overlay metrology measurement signals using a plurality of overlay algorithms, generating a plurality of overlay estimate distributions, and generating a first plurality of quality metrics utilizing the generated plurality of overlay estimate distributions, wherein each quality metric corresponds with one overlay estimate distribution of the generated plurality of overlay estimate distributions, each quality metric a function of a width of a corresponding generated overlay estimate distribution, each quality metric further being a function of asymmetry present in an overlay metrology measurement signal from an associated metrology target.

公开(公告)号：WO2019027748A1

公开(公告)日：2019-02-07

申请号：PCT/US2018/043606

申请日：2018-07-25

Applicant: KLA-TENCOR CORPORATION

Inventor： HILL, Andrew, V. ,  SHCHEGROV, Andrei ,  MANASSEN, Amnon ,  SAPIENS, Noam

IPC: H01L21/66 ,  H01L23/544

Abstract: An overlay metrology system includes an overlay metrology tool configurable to generate overlay signals with a plurality of recipes and further directs an illumination beam to an overlay target and collects radiation emanating from the overlay target in response to the at least a portion of the illumination beam to generate the overlay signal with the particular recipe. The overlay metrology system further acquires two or more overlay signals for a first overlay target using two or more unique recipes, subsequently acquires two or more overlay signals for a second overlay target using the two or more unique recipes, determines candidate overlays for the first and second overlay targets based on the two or more overlay signals for each target, and determines output overlays for the first and second overlay targets based on the two or more candidate overlays for each target.

公开(公告)号：WO2018152382A1

公开(公告)日：2018-08-23

申请号：PCT/US2018/018457

申请日：2018-02-16

Applicant: KLA-TENCOR CORPORATION

Inventor： SAPIENS, Noam ,  KRISHNAN, Shankar ,  WANG, David Y. ,  BUETTNER, Alexander ,  PURRUCKER, Kerstin ,  PETERLINZ, Kevin A.

IPC: H01L21/66 ,  H01L21/67

Abstract: Methods and systems for performing spectroscopic measurements of semiconductor structures including ultraviolet, visible, and infrared wavelengths greater than two micrometers are presented herein. A spectroscopic measurement system includes a combined illumination source including a first illumination source that generates ultraviolet, visible, and near infrared wavelengths (wavelengths less than two micrometers) and a second illumination source that generates mid infrared and long infrared wavelengths (wavelengths of two micrometers and greater). Furthermore, the spectroscopic measurement system includes one or more measurement channels spanning the range of illumination wavelengths employed to perform measurements of semiconductor structures. In some embodiments, the one or more measurement channels simultaneously measure the sample throughout the wavelength range. In some other embodiments, the one or more measurement channels sequentially measure the sample throughout the wavelength range.

公开(公告)号：WO2016090349A1

公开(公告)日：2016-06-09

申请号：PCT/US2015/064150

申请日：2015-12-05

Applicant: KLA-TENCOR CORPORATION

Inventor： FU, Jiyou ,  SAPIENS, Noam

IPC: H01L21/66

CPC classification number: G01B11/002 ,  G01B11/24 ,  G01B2210/56 ,  G01N21/956 ,  G01N2021/213 ,  G03F7/00

Abstract: A spectroscopic beam profile metrology system simultaneously detects measurement signals over a large wavelength range and a large range of angles of incidence (AOI). In one aspect, a multiple wavelength illumination beam is reshaped to a narrow line shaped beam of light before projection onto a specimen by a high numerical aperture objective. After interaction with the specimen, the collected light is passes through a wavelength dispersive element that projects the range of AOIs along one direction and wavelength components along another direction of a two-dimensional detector. Thus, the measurement signals detected at each pixel of the detector each represent a scatterometry signal for a particular AOI and a particular wavelength. In another aspect, a hyperspectral detector is employed to simultaneously detect measurement signals over a large wavelength range, range of AOIs, and range of azimuth angles.

Abstract translation: 分光光束分布测量系统同时检测大波长范围和大范围入射角（AOI）的测量信号。 在一个方面，多波长照明光束在通过高数值孔径物镜投影到样本上之前重新成形为窄线形的光束。 在与样品相互作用后，所收集的光通过波长色散元件，其沿着一个方向投影AOI的范围并沿着二维检测器的另一方向波长成分。 因此，在检测器的每个像素处检测的测量信号各自表示用于特定AOI和特定波长的散射测量信号。 另一方面，采用高光谱检测器来同时检测大波长范围，AOI范围和方位角范围内的测量信号。

公开(公告)号：WO2016070155A1

公开(公告)日：2016-05-06

申请号：PCT/US2015/058519

申请日：2015-10-31

Applicant: KLA-TENCOR CORPORATION ,  FU, Jiyou ,  SAPIENS, Noam

Inventor： FU, Jiyou ,  SAPIENS, Noam

IPC: G01J1/02 ,  H01L21/66

CPC classification number: G01N21/8851 ,  G01B11/0616 ,  G01N21/8806 ,  G01N21/9501 ,  G01N2021/8848

Abstract: Methods and systems for simultaneous detection and linked processing of field signals and pupil signals are presented herein. In one aspect, estimates of one or more structural or process parameter values are based on field measurement signals, pupil measurement signals, or both. In addition, the quality of the measurements of the one or more structural or process parameter values is characterized based on the field measurement signals, pupil measurement signals, or both. In some embodiments, field measurement signals are processed to estimate one or more structural or process parameter values, and pupil measurement signals are processed to characterize the field measurement conditions. In some other embodiments, pupil measurement signals are processed to estimate one or more structural or process parameter values, and field measurement signals are processed to characterize the pupil measurement conditions.

Abstract translation: 本文介绍了场信号和瞳孔信号的同时检测和链接处理的方法和系统。 在一个方面，一个或多个结构或过程参数值的估计基于场测量信号，光瞳测量信号或两者。 此外，一个或多个结构或过程参数值的测量的质量基于场测量信号，光瞳测量信号或二者来表征。 在一些实施例中，处理场测量信号以估计一个或多个结构或过程参数值，并且处理瞳孔测量信号以表征场测量条件。 在一些其他实施例中，处理瞳孔测量信号以估计一个或多个结构或过程参数值，并且处理场测量信号以表征瞳孔测量条件。